Diagnostic and analytical study on a low-pressure limit of diamond chemical vapor deposition in inductively coupled CO-CH4-H2plasmas Virtual Journal of Nanoscale Science & Technology, Vol. 9, Issue 14, The American Institute of Physics and the American Physical Society, April 12, 2004 K. Teii, M. Hori, and T. Goto
Fabrication of Vertically Aligned Carbon Nanowalls Using Capacitively Coupled Plasma-Enhanced Chemical Vapor Deposition Assisted by Hydrogen Radical Infection Virtual Journal of Nanoscale Science & Technology, Vol. 9, Issue 21, The American Institute of Physics and the American Physical Society, May 31, 2004 M. Hiramatsu, K. Shiji, H. Amano, and M. Hori
Fabrication of Vertically Aligned Carbon Nanowalls Using Capacitively Coupled Plasma-Enhanced Chemical Vapor Deposition Assisted by Hydrogen Radical Infection MINNESOTA NANOTECHNOLOGY, Science & Engineering Library, University of Minnesota, June 28, 2004 M. Hiramatsu, K. Shiji, H. Amano, and M. Hori