M. Hori (INVITED
) Strategy of Cluster Knowledge Program for Flexible Electronics, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009.
M. Hori (INVITED
) Advanced Plasma Fundamental Nanotechnology, 1st International Symposium on Advance Plasma Science and its Application (ISPlasma2009), Nagoya University, Nagoya, Japan, March 8-11, 2009. pp. 5-8
M. Hori (INVITED
) Application of Advanced Plasma Technology for the Development of Autonomic MBE System, 1st International Symposium on Advance Plasma Science and its Application (ISPlasma2009), Nagoya University, Nagoya, Japan, March 8-11, 2009. pp. 49-51
M. Hori (INVITED
) A New Approach for Establishment of Plasma Nano-Science, Memorial Symposium for the Retirement of Professor Tachibana (ISPC-19 Pre-Symposium in Japan), Kyoto University, Kyoto, Japan,, May 30, 2009.
M. Hori (INVITED
) Plasma processes for flexible electronics, Summer International Graduate School, Sungkyunkwan University, Seoul, Korea, July 2, 2009.
M. Hori (INVITED
) Advanced Plasma Diagnostics, 9th Korea-Japan Workshop of Thin Film and Plasma Process for Green Plasma Technology Advanced Plasma Diagnostics for Plasma-Nano Processing, Kwangwoon University, Seoul, Korea, July 9-11, 2009.
Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, and M. Hori (INVITED
) Analyses of Plasma-Materials Interactions for Development of Advanced Devices, 9th Korea-Japan Workshop of Thin Film and Plasma Process for Green Plasma Technology Advanced Plasma Diagnostics for Plasma-Nano Processing, Kwangwoon University, Seoul, Korea, July 9-11, 2009.
T. Ohta, N. Takota, M. Ito, Y. Higashijima, H. Kano, K. Yamakawa, S. Den, and M. Hori (INVITED
) Simultaneous Monitoring of Multi-Metal Atoms in Magnetron Sputtering Plasma for Synthesizing TCO Films, 9th Korea-Japan Workshop of Thin Film and Plasma Process for Green Plasma Technology Advanced Plasma Diagnostics for Plasma-Nano Processing, Kwangwoon University, Seoul, Korea, July 9-11, 2009.
Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori (INVITED
) Low-Damage Plasma Processing of Thin Films on Polymers For Flexible Device Fabrications, International Conference on PROCESSING and MANUFACTURING OF ADVANCED MATERIALS, Berlin, Germany, August 25-29, 2009.
M. Hiramatsu, M. Hori (INVITED
) Fabrication of Carbon Nanowalls and Their Application For New Functional Devices, International Conference on Processing and Manufacturing of Advanced Materials (THERMEC 2009), MARITIM Hotel, Berlin, Germany, August 29, 2009.
M. Hiramatsu, M. Hori (INVITED
) Self-organized growth of monolithic carbon nano-graphene sheets and controlling of their semiconductor like behavior, IUVSTA Workshop on Surface Engineering and Thin Film Divisions, Novotel Ambassador Busan, Busan, Korea, September 17, 2009.
M. Hori (INVITED
) Next Generation Plasma Nano Processing by Integrated Radical Control, International Conference on Plasma Surface Engineering (AEPSE2009), BEXCO Convention Center, Busan, Korea, September 20-25, 2009. p. 6
Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, and M. Hori (INVITED
) Advanced Research and Development for Plasma Processing of Polymers with Combinatorial Plasma-Process Analyzer, 2nd International Conference on Microelectronics and Plasma Technology (ICMAP 2009), BEXCO Convention Center, Busan, Korea, September 22-25, 2009.
General
K. Ando, T. Yamaguchi, T. Kimura, K. Takeda, K. Kubota, C. Koshimizu, A. Kono, M. Sekine, and M. Hori. Laser Thomson Scattering Approach for Electron Density and Temperature in Dual Frequency Plasma Processing, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009. (
)
Y. Matsudaira, H. Inui, H. Kano, K. Takeda, M. Sekine, and M. Hori. Surface Cleaning for Flexible Electronics Employing Atmospheric Pressure Plasma, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009. (
)
T. Takeuchi, M. Sekine, H. Toyoda, K. Takeda, and M. Hori. Fundamental Etching Studies Employing Selective Ion Beam, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009. (
)
K. Mase, T. Machino, H. Kano, M. Hiramatsu, M. Sekine, and M. Hori. Supercritical Fluid Process of Pt Nanoparticles Formation on Nano-Carbons Grown by PECVD, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009. (
)
T. Kimura, K. Ando, T. Yamaguchi, K. Takeda, A. Kono, M. Sekine, and M. Hori . Fluorocarbon Species Measured by LIF in Dual Frequency Plasma Processing, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009. (
)
H. Mikuni, W. Takeuchi, K. Takeda, M. Hiramatsu, H. Kano, Y. Tokuda, and M. Hori. Fabrication of Single Wall Carbon Nanowall Employing Electron Beam Excited Plasma, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009 . (
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H. Kuroda, H. Yamamoto, M. Ito, T. Ohta, K. Takeda, M. Sekine, and M. Hori. A Real Time Controlling of Surface Temperature and Radicals in ULSIs, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009. (
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M. Kashihara, W. Takeuchi, Y. Tokuda, H. Kano, M. Hiramatsu, and M. Hori. Synthesis of Carbon Nanowalls and Their Applications to Electrical Devices, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009 . (
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Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, and M. Hori. Low Energetic Ion bombardment on Polymer Surfacees for Flexible Electronics, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009 . (
)
H. Watanabe, T. Masuda, M. Hiramatsu, M. Hori, and K. Yamakawa. Growth of Carbon Nanostructures Using Non-Equilibrium Atomospheric Pressure Plasma CVD, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009 . (
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H. Yamamoto, K. Takeda, M. sekine, and M. Hori. Porous SiOCH Film Damages after Etching in ULSI, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009 . (
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S. Takashima, K. Takeda, and M. Hori. Sticking Coefficients of Atomic Radicals for Flexible Electronics, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009. (
)
E. Shibata, H. Okamoto, M. Sekine, and M. Hori. Low-k Film Etching Process Employing Novel Fluorocarbon Gas in Dual Frequency Plasma, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009 . (
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T. Ohta, N. Takota, M. Ito, Y. Higashijima, H. Kano, K. Yamakawa, S. Den, and M. Hori. Measurement of Atoms in Sputtering System Employing Micro-plasma, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009. (
)
Y. Miyawaki, K. Takeda, S. Takashima, M. Sekine, and M. Hori. Evaluating Damages on Organic Low-k Films due to VUV, UV Radiation, Radical and Ion in Dual Frequency Capacitively Coupled Plasma, 8th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop with Plasma Application Monodzukuri（PLAM), Techno Plaza, Gifu, Japan, January 20-21, 2009. (
)
M. Shiratani, J. Umetsu, T. Nomura, K. Inoue, K. Koga, Y. Setsuhara, M. Sekine, and M. Hori. Measurements of Electron Energy Distribution Function in Dual Frequency Capacitively Coupled Plasma Using Laser Thomson Scattering, 2nd International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, January 22-23, 2009. (
)
K. Ando, T. Kimura, T. Yamaguchi, K. Takeda, K. Kubota, C. Koshimizu, A. Kono, M. Sekine, and M. Hori. Measurements of Electron Energy Distribution Function in Dual Frequency Capacitively Coupled Plasma Using Laser Thomson Scattering, 2nd International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, January 22-23, 2009. (
)
K. Mase, T. Machino, H. Kano, M. Hiramatsu, M. Sekine, and M. Hori . Synthesis of Platinum Nanoparticles on Carbon Nanowalls by Using Supercritical Fluid, 2nd International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, January 22-23, 2009. p. 31 (
)
Y. Abe, K. Takeda, M. Sekine, and M. Hori. Measurements of Absolute Density and Translational Temperature of Hydrogen Atoms in the High Prssure VHF Capasitively Coupled Plasma, 2nd International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, January 22-23, 2009 . p. 44 (
)
H. Mikuni, W. Takeuchi, K. Takeda, M. Hiramatsu, H. Kano, Y. Tokuda, and M. Hori. Fabrication of Single Carbon Nanowall Using Electron Beam Excited Plasma Enhanced CVD, 2nd International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, January 22-23, 2009. (
)
H. Kuroda, H. Yamamoto, M. Ito, T. Ohta, K. Takeda, M. Sekine, and M. Hori. Precise Etching of Organic Low-k Film by Real-time Controlling Radical Density Ratio and Substrate Temperature, 2nd International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, January 22-23, 2009 . p. 51 (
)
H. Watanabe, M. Hiramatsu, and M. Hori. Formation of Carbon Nanowall by using Radical Injection Plasma Enhanced Chemical Vapor Deposition and Its Electrochemical Evaluation, 2nd International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, January 22-23, 2009 . (
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S. Kondo, Y. Itani, K. Yamakawa, S. Den, M. Hiramatsu, M. Sekine, and M. Hori. Effects of H Radical Irradiation on Synthesis of Carbon Nanowalls, 2nd International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, January 22-23, 2009. p. 47 (
)
C. S. Moon, K. Takeda, M. Sekine, Y. Setsuhara, M. Shiratani, and M. Hori. Combinatorial Plasma Etching Process based on Plasma Nano-Science, 2nd International Conference on Plasma-Nano Technology and Science, Nagoya University, Nagoya, Japan, January 22-23, 2009. p. 49 (
)
E. Shibata, H. Okamoto, M. Sekine, and M. Hori. Effects of Oxygen on Etching Damage of Low-k Film Etching Process Employing Novel Fluorocarbon Gas of C5F10O, 2nd International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, January 22-23, 2009 . p. 52 (
)
Y. Matsudaira, H. Inui, T. Kino, H. Kano, M. Sekine, and M. Hori. Fabrication of Amorphous Carbon Films Using Nonequilibrium Atmospheric Pressure Plasma with Ultrahigh Electron Density, 2nd International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, January 22-23, 2009. p. 21 (
)
Y. Miyawaki, K. Takeda, M. Fukasawa, K. Oshima, K. Nagahata, T. Tatsumi, S. Takashima, M. Sekine, and M. Hori. Damages on Low-k Films due to VUV, UV Radiation, Radical and Ion in Low-k Films Etching Employing H2 / N2 Plasma , 2nd International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, March 8-11, 2009. p. 52 (
)
Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, and M. Hori. Production and Control of Low-Damage Large-Area Plasmas for Advanced Processing of Next-Generation Devices, 1st International Symposium on Advanced Plasma Science and its Applications (ISPlasma2009), Nagoya University, Nagoya Japan, March 8-11, 2009. pp. 99-102 (
)
Y. Matsudaira, H. Inui, T. Kino, H. Kano, K. Takeda, M. Sekine, and M. Hori. Plasma-Enhanced Chemical Vapor Deposition of Amorphous Carbon, 1st International Symposium on Advanced Plasma Science and its Applications (ISPlasma2009), Nagoya University, Nagoya, Japan, March 8-11, 2009 . Mo-1, p. 133 (
)
S. Chen, H. Kano, S. Den, S. Takashima, K. Takeda, and M. Hori. Development of High Density Nitrogen Radical Source and Behaviors of Atomic Radicals, 1st International Symposium on Advanced Plasma Science and its Applications (ISPlasma2009), Nagoya University, Nagoya, Japan, March 8-11, 2009 . Mo-3, p. 134 (
)
W. Takeuchi, M. Hiramatsu, H. Kano, Y. Tokuda, and M. Hori. Growth of Carbon Nanowalls of High Graphitization Employing PECVD, 1st International Symposium on Advanced Plasma Science and its Applications (ISPlasma2009), Nagoya University, Nagoya, Japan, March 8-11, 2009 . Mo-4, p. 134 (
)
Y. Abe, S. Kawashima, K. Takeda, M. Sekine, and M. Hori. Absolute Density of Hydrogen Atoms in the High Pressure VHF Capacitively Couples Plasma for Solar Cell Devices, 1st International Symposium on Advanced Plasma Science and its Applications (ISPlasma2009), Nagoya University, Nagoya, Japan, March 8-11, 2009 . Mo-5, p. 135 (
)
T. Ohta, N. Takota, M. Ito, Y. Higashijima, H. Kano, and M. Hori. Diagnostics of RF Magnetron Sputtering plasma for Synthesizing Indium-Zinc-Oxide Film, 1st International Symposium on Advanced Plasma Science and its Applications (ISPlasma2009), Nagoya University, Nagoya, Japan, March 8-11, 2009. Mo-8, p. 136 (
)
S. Iseki, T. Ohta, M. Ito, Y. Higashijima, H. Kano, and M. Hori. Diagnostics of Non-equilibrium Atmospheric Pressure Plasma for Penicillium Digitatum Disinfection, 1st International Symposium on Advanced Plasma Science and its Applications (ISPlasma2009), Nagoya University, Nagoya, Japan, March 8-11, 2009. Mo-9, p. 137 (
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F. Hori, and M. Hori. Aerosol Plasma (Plasma Processor for Aerosol Powder), 1st International Symposium on Advanced Plasma Science and its Applications (ISPlasma2009), Nagoya University, Nagoya, Japan, March 8-11, 2009 . Mo-15, p. 140 (
)
H. Kuroda, H. Yamamoto, M. Ito, T. Ohta, K. Takeda, M. Sekine, and M. Hori. Control of plasma etching process based on real-time monitoring of substrate temperature, Memorial Symposium for the Retirement of Professor Tachibana (ISPC-19 Pre-Symposium in Japan), Kyoto University, Kyoto, Japan, May 30, 2009 . (
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Y. Abe, S. Kawashima, K. Takeda, M. Sekine, and M. Hori. Behaviors of hydrogen atoms in SiH4/H2 plasma for solar cell devices, Memorial Symposium for the Retirement of Professor Tachibana (ISPC-19 Pre-Symposium in Japan), Kyoto University, Kyoto, Japan, May 30, 2009. (
)
W. Takeuchi, M. Hiramatsu, Y. Tokuda, H. Kano, and M. Hori. Semiconductor Behavior of Carbon Nanowalls Grown by Plasma-Enhanced Chemical Vapor Deposition, New Diamond and Nano Carbons Conference 2009, Grand Traverse Resort And Spa, Michigan, USA, June 8, 2009 . B1.2 p. 46 (
)
S. Kondo, Y. Itani, M. Hiramatsu, M. Sekine, and M. Hori. Initial Growth Process of Carbon Nanowalls, New Diamond and Nano Carbons Conference 2009, Grand Traverse Resort And Spa, Michigan USA, June 10, 2009. C3.3 p. 52 (
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A. Malinowski, M. Sekine, M. Hori, A. Jakubowski, L. Lukasiak, D. Tomaszewski . Analysis of dispersion of electrical parameters and characteristics of FinFET devices, 8th Symposium Diagnostics and Yield Advanced Silicon Devices and Technologies for ULSI Era, Warsaw, Poland, June 22-24, 2009 . (
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Y. Miyawaki, K. Takeda, M. Sekine, and M. Hori. Damage-Free Ashing on Low-k Film Using Dual Frequency Capacitively Coupled Ar/O2 Plasma, 9th Korea-Japan Workshop on Thin Film and Plasma Process for Green Technology Advanced Plasma Diagnostics for Plasma-Nano Processing, Kwangwoon University, Seoul, Japan, July 9-11, 2009. (
)
T. Takeuchi, M. Sekine, H. Toyoda, K. Takeda, and M. Hori. Study of photoresist surface modified layer employing selective ion beam, 9th Korea-Japan Workshop on Thin Film and Plasma Process for Green Technology Advanced Plasma Diagnostics for Plasma-Nano Processing, Kwangwoon University, Seoul, Japan, July 9-11, 2009 . (
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T. Hiraoka, T. Kageyama, T. Ohta, K. Takeda, M. Ito, and M. Hori. Non-Contact Measurement of Substrate Temperature Using Optical Low-Coherence Interferometry, 9th Korea-Japan Workshop on Thin Film and Plasma Process for Green Technology Advanced Plasma Diagnostics for Plasma-Nano Processing, Kwangwoon University, Seoul, Japan, July 9-11, 2009 . (
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H. Yamamoto, K. Takeda, M. Sekine, and M. Hori. Plasma Damage Mechanism of Porous SiOCH Films Evaluated by In-situ Measurement System for Film Properties and Absolute Radical-Density, XXIX International Conference on Phenomena in Ionized Gases, Convention Center, Cancun, Mexico, July 12-17, 2009. PA13-8 (
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M. Hiramatsu, S. Kondo, K. Yamakawa, K. Takeda, and M. Hori. Growth mechanism of graphene sheets in initial phase, 19th International Symposium on Plasma Chemistry, Ruhr-University Bochum, Bochum, Germany, July 27, 2009. P1.8.37 (
)
K. Takeda, H. Inui, Y. Matsudaira, T. Yara, T. Uehara, M. Sekine, and M. Hori. Surface modification process for organic material and glass in nanequilibrium atmospheric-pressure pulsed remote plasma, 19th International Symposium on Plasma Chemistry, Ruhr-University Bochum, Bochum, Germany, July 27, 2009. P1.3.23 (
)
T. Ohta, S. Iseki, M. Ito, H. Kano, Y. Higashijima, and M. Hori. Spectroscopic characteristics in non-equilibrium atmospheric pressure plasma for inactivation of micro-organism, 19th International Symposium on Plasma Chemistry, Ruhr-University Bochum, Bochum, Germany, July 30, 2009. O3.13.28 (
)
Y. Setsuhara, K. Takenaka, M. Shiratani, M. Sekine, and M. Hori. Development of Combinatorial Plasma-Process Analyzer for Advanced R&D of Plasma Nano Processes, 19th International Symposium on Plasma Chemistry, Ruhr-University Bochum, Bochum, Germany, July 30, 2009. P3.6.7 (
)
M. Hori, H. Kuroda, M. Ito, T. Ohta, K. Takeda, and M. Sekine. Development of Novel Etching Process based on Real-time Monitoring of Substrate Temperature, 19th International Symposium on Plasma Chemistry, Ruhr-University Bochum, Bochum, Germany, July 30, 2009. O6.1 (
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A. Malinowski, L. Lukasiak, A. Jakubowski, D. Tomaszewski, M. Hori, M. Sekine, M. Korwin-Pawlowski. FinFET scaling - analysis of electrical parameters and characteristics Nano and Giga Challenges in Electronics, Photonics and Renewable Energy, Ontario, Canada, August 10-14, 2009. (
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H. Kuroda, H. Yamamoto, M. Ito, T. Ohta, K. Takeda, M. Sekine, and M. Hori. Measurement of Si Wafer Temperature Using Low-coherence Interferometer during Plasma Etching Processes, International Conference on Plasma Surface Engineering (AEPSE2009), BEXCO Convention Center, Busan, Korea, Sep. 20-25, 2009. OAC01 p. 161 (
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K. Mase, S. Kondo, T. Machino, H. Kano, M. Hiramatsu, M. Sekine, and M. Hori. Supporting Platinum Nanoparticles on Carbon Nano Materials by Using Supercritical Fluid, International Conference on Plasma Surface Engineering (AEPSE2009), BEXCO Convention Center, Busan, Korea, Sep. 20-25, 2009 . OA31 p. 111 (
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Masaharu Shiratani, Takuya Nomura, Yuki Korenaga, Jun Umetsu, Kazunori Koga, Yuichi Setsuhara, Makoto Sekine, and Masaru Hori. Aspect ratio dependence of deposition profile of plasma CVD carbon films on trenched substrates, International Conference on Plasma Surface Engineering (AEPSE2009), BEXCO Convention Center, Busan, Korea, Sep. 25, 2009 . PA405 (
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Chang S. Moon, K. Takeda, M. Sekine, Y. Setsuhara, M. Shiratani, and M. Hori. New Approach of Etching Analysis based on Internal Parameters in Combinatorial Plasma Process, 31th International Symposium on Dry Process (DPS), BEXCO Convention Center, Busan, Korea, Sep. 24-25, 2009. 5-002 p. 13 (
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Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, and M. Hori. Combinatorial analysis of plasma-materials interactions for advanced R&D of future nano devices, 31th International Symposium on Dry Process (DPS), BEXCO Convention Center, Busan, Korea, September 24-25, 2009. 2-P11 (
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Y. Miyawaki, K. Takeda, M. Sekine, and M. Hori. Damage-free Resist Ashing on Low-k Film Using Dual Frequency Capacitively Coupled Ar/O2 Plasma, 31th International Symposium on Dry Process (DPS), BEXCO Convention Center, Busan, Korea, September 24-25, 2009. 5-P07 (
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Y. Setsuhara, K. Cho, M. Shiratani, M. Sekine, M. Hori, E. Ikeitaga, O. Nakatsuka, S. ZaimaPhotoelectron Spectroscopy. Nano-Surface Chemical Bonding States Analysis of Plasma-Exposed Polymers with Hard X-Ray, 31th International Symposium on Dry Process (DPS), BEXCO Convention Center, Busan, Korea, September 24-25, 2009 . 5-P07 (
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Takuya Nomura, Yuki Korenaga, Jun Umetsu, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, and Masaru Hori. Pressure and aspect ratio dependence of deposition profile of carbon films on trench substrates deposited by plasma CVD, 31th International Symposium on Dry Process (DPS), BEXCO Convention Center, Busan, Korea, September 24-25, 2009 . 2-P47 p. 101 (
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H. Yamamoto, K. Takeda, M. Sekine, M. Hori, T. Kaminatsui, K. Yamamoto, H. Hayashi, I. Sakai, T. Ohiwa. In-situ Evaluation of H2 Plasma Damage on Porous SiOCH Low-k Films, 31th International Symposium on Dry Process (DPS), BEXCO Convention Center, Busan, Korea, September 24-25, 2009 . 4-2 pp. 129-130 (
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T. Takeuchi, M. Sekine, H. Toyoda, K. Takeda, S-Y. Kang, I. Sawada, and M. Hori. Investigation of Photoresist Surface Modified Layer by Fluorocarbon Ion Bombardment, 31th International Symposium on Dry Process (DPS), BEXCO Convention Center, Busan, Korea, September 24-25, 2009 . 2-P10 p. 27 (
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M. Hori, and M. Horamatsu. Self-organization Growth of Monolithic Carbon Nanowalls Employing Low-temperture Plasmas, 2nd International Conference on Advanced Plasma Technologies with 1st International Plasma Nanoscience Symposium (ICAPT2009), Hotel Barbara, Plan, Slovenia, October 1, 2009 . pp. 65-68 (
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M. Hiramatsu, M. Hori. Preparation of Dispersed Pt Nanoparticles on Carbon Nanostructure Surface by Metal Organic Chemical Fluid Deposition Employing Supercritical Carbon Dioxide, 4th International Conference on Surfaces Coatings and Nanostructured Materials (NanoSMat2009), Crowne Plaza Hotel, Rome, Italy, October 21, 2009. (
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Ch. S. Moon, K. Takeda, S. Takashima, M. Sekine, Y. Setsuhara, M. Shiratani, and M. Hori. Investigation of Surface Loss Probabilities of H, N Radicals in Afterglow Discharge employing Vacuum Ultra-Violet Absorption Spectroscopy, International Conference on Micro and Nano Engineering (MNE2009), ICC Ghent, Ghent, Belgium, September 28-October 1, 2009. P-NANO, p. 76 (
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W. Takeuchi, M. Hiramatsu, Y. Tokuda, H. Kano, T. Kinoshita, Y. Kato, T. Muro, S. Kimura, and M. Hori. Electronic Structure of Carbon Nanowalls using Resonant Soft-X-Ray Emission Spectroscopy, International Conference on Solid State Devices and Materials (SSDM), Sendai Kokusai Hotel, Miyagi, Japan, October 7, 2009 . H-2-5, p. 37 (
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Y. Abe, S. Kawashima, K. Takeda, M. Sekine, M. Hori. Behavior of hydrogen atoms in plasma enhanced chemical vapor deposition of microcrystalline silicon film, 62nd Annual Gaseous Electronics Conference (GEC), Saratoga Springs, New York, USA, October 20-23, 2009. GT3.6 (
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Y. Miyawaki, K. Takeda, A. Ito, M. Nakamura, M. Sekine, M. Hori. SiO2 Film Etching Process Using Environment-Friendly New Gas C5F7, 62nd Annual Gaseous Electronics Conference (GEC), Saratoga Springs, New York, USA, October 20-23, 2009 . SR3.3 (
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T. Takeuchi, M. Sekine, H. Toyoda, K. Takeda, M. Hori, S. Kang, I. Sawada. Analysis of the surface reactions of ArF photoresist during fluorocarbon plasma etching by XPS, 62nd Annual Gaseous Electronics Conference (GEC), Saratoga Springs, New York, USA, October 20-23, 2009. SR3.5 (
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T. Ohta, M. Inoue, N. Takota, M. Ito, Y. Higashijima, H. Kano, M. Hori. Diagnostics of RF magnetron sputtering plasma for synthesizing transparent conductive Indium-Zinc-Oxide film, 62nd Annual Gaseous Electronics Conference (GEC), Saratoga Springs, New York, USA, October 20-23, 2009 . GT3.4 (
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Shang Chen, Hiroyuki Kano, Shoji Den, Keigo Takeda, Seigo Takashima, Makoto Sekine, Masaru Hori. Development of high density radical source and the behaviors of radicals in N2-H2 mixture plasma, 56th International Symposium American Vacuum Society (AVS), San Jose McEnery Convention Center, November 8-13, 2009. PS1-WeM11, p. 112 (
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T. Nomura, J. Umetsu, Y. Korenaga, H. Matsuzaki, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori. Deposition Profile of Carbon Films in Submicron Wide Trenches using H-assisted Plasma CVD, 56th International Symposium American Vacuum Society (AVS), San Jose McENERY CONVENTION CENTER, November 8-13, 2009. PS-TuP20, p. 104 (
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H. Yamamoto, K. Takeda, M. Sekine, M. Hori, T. Kaminatsui, K. Yamamoto, H. Hayashi, I. Sakai, T. Ohiwa. Evaluation of Ashing Plasma Damages on Porous SiOCH Films Due to Ions, Radicals, and Radiation, 56th International Symposium American Vacuum Society (AVS), San Jose McENERY CONVENTION CENTER, November 8-13, 2009. PS-TuP7, p. 104 (
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Chang S. Moon, K. Takeda, M. Sekine and M. Hori, Y. Setsuhara, M. Shiratani. HIGH PERFORMANCE OF COMPACT COMBINATORIAL ETCHING PROCESS FOR NEXT GENERATION PLAMA NANO-PROCESS 56th International Symposium American Vacuum Society (AVS), San Jose McENERY CONVENTION CENTER, Nov. 8-13, 2009. (
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N. Ebizuka, K. Nakajima, K. Kodate, T. Ichikawa, T. Yamada, K. Kawabata, T. Hattori, I. Tanaka, M. Iye, H. Tokoro, Y. Hirahara, S. Sato, and M. Hori. Gratings for the Subaru Telescope and for Plasma Diagnoses, International Symposium on "Application of Spectroscopy to Research and Development", Tokyo institute of Technology, Japan, November 16-17, 2009. (
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K. Takeda, and M. Hori. Development of process technology based on advanced plasma nano science The 2nd International Symposium of Plasma Center for Industrial Applications, 2nd International Symposium of Plasma Center for Industrial Application (PLACIA) and Plasma Application Monodzukuri (PLAM) on Reactivation of Manufacturing in Japan by Plasma-Nano Technology, Science Exchange Plaza, Nagoya Science Park, Nagoya, Japan, November 18, 2009. (
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