Invited talk

  1. M. Hori (INVITED )
    Radical Controlled Plasma Nano-Processing
    2nd Italy-Japan International Seminar on Advanced Plasma Processing, Nagoya University VBL Hall, Nagoya, Japan, January 30, 2006

  2. M. Hori (INVITED )
    Insight on Sticking of Radicals on Surfaces for Smart Plasma Nona-Processing
    4th International Workshop on Basic Aspects of Nonequilibrium Plasmas Interacting with Surfaces;-Negative Ions Their Function and Designability-4th EU-Japan Joint Symposium on Plasma Processes, Hotel Highland Resort, Fujiyoshida, Japan, January 31-February 1, 2006

  3. M. Hori (INVITED )
    Densities and Temperatures of Fluorocarbon Species in Nano/Micro Plasma Etching Processing,
    6th International Workshop on Fluorocarbon Plasmas, Villard-de-Lans, France, March 19-23, 2006. p. 7

  4. M. Hiramatsu, and M. Hori (INVITED )
    Growth of Carbon Nanowalls using Flurocarbon Plasma-Enhanced Chemical Vapor Deposition,
    6th International Workshop on Fluorocarbon Plasmas, Villard-de-Lans, France, March 19-23, 2006. p. 33

  5. M. Hori (INVITED )
    Diagnostics and Control of Radicals in ULSI Plasma Processing,
    3rd International Workshop on Advanced Plasma Processing and Diagnostics, Seoul, Korea, April 14-15, 2006. p. 2

  6. M. Hiramatsu, and M. Hori (INVITED )
    Formation of Carbon Nanostructures Employing Plasma Enhanced CVD,
    3rd International Workshop on Advanced Plasma Processing and Diagnostics, Seoul, Korea, April 14-15, 2006. p. 5

  7. M. Hori (INVITED )
    Radical Controlled Plasma Nano Processes
    Seminar on Plasma Diagnostics and Material Plasma Processing, University of Bari, Bari, Italy, June 9-12, 2006

  8. M. Hori (INVITED )
    Infrared Diode Laser Absorption Spectroscopy for Measurement of Fluorocarbon Radicals in 60MHz Capacitively Coupled Etching Plasma Process
    1st International Workshop on Infrared Plasma Spectroscopy (IPS 2006), INP Greifswald, Greifswald, Germany, June 14-16, 2006

  9. M. Hori, and M. Hiramatsu (INVITED )
    Fabrication of Carbon Nanowalls Using Novel Plasma Processing
    10th International Conference on Plasma Surface Engineering (PSE2006), Garmisch-Partenkirchen, Germany, September 10-15, 2006

  10. M. Hori (INVITED )
    Fabrication Carbon Nanowalls and Carbon Nanotubes Using Plasma Processing
    Plasma Seminar, Univ. of West Bohemia, Pilsen, Czech Republic, Septermber 16-18, 2006

  11. M. Hori, and M. Hiramatsu (INVITED )
    Nanofabrication Using Carbon Nanowalls and Challenge for New Functional Devices
    2006 International Microprocesses and Nanotechnology Conference (MNC 2006), Kamakura Prince Hotel, Kanagawa, Japan, October 24-27, 2006

  12. M . Ito, Y. Tachibana, T. Ohta, Y. Higashijama, H. Kano, S. Den, M. Hori (INVITED )
    Simultaneous measurements of absolute densities of metal atoms in magnetron sputtering employing micro-hollow cathode light array
    4th International Workshop on Advanced Plasma Processing and Diagnostics and Thin Film Technology for Electronic Materials, Green Hotel Sangane, Aichi, Japan, December 1-2, 2006



General

  1. S. Uchida, S. Takashima, K. Oshima, A. Ando, K. Nagahata, T. Tatsumi, and M. Hori.
    Fundamental Study of Low-k Film Etching Employing Ion Beams with Radical Infection,
    6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing, Hotel Taikanso, Matsushima, Japan, January 24-27, 2006. pp. 453-454 ( )

  2. T. Hayashi, M. Nagai, Y. Hayakawa, S. Okamoto, and M. Hori.
    Low-k Film Etching Process Employing a New Environmental-Friendship Fluorocarbon Gas,
    6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing, Hotel Taikanso, Matsushima, Japan, January 24-27, 2006. pp. 455-456 ( )

  3. T. Ohta, M. Ito, K. Takeda, and M. Hori.
    SiO2 Etching Using Compact Type Electron-Beam-Excited Plasma,
    6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing, Hotel Taikanso, Matsushima, Japan, January 24-27, 2006. pp. 457-458 ( )

  4. M. Ura, W. Nakamura, Y. Tokuda, , M. Hiramatsu, H. Kano, and M. Hori.
    The Growth of Carbon Nanowalls and Their Electric Properties,
    6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing, Hotel Taikanso, Matsushima, Japan, January 24-27, 2006. pp. 535-536 ( )

  5. S. Kondo, K. Yamakawa, S. Den, H. Kano, M. Hiramatsu, and M. Hori.
    Highly Reliable Growth Process of Carbon Nanowalls Using Radical Injection Plasma CVD,
    6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing, Hotel Taikanso, Matsushima, Japan, January 24-27, 2006. pp. 537-538 ( )

  6. K. Teii, K. Uchino, M. Hori, and T. Goto.
    Study on Surface Reaction Kinetics during Diamond Growth and Nucleation in Low-Pressure Plasmas,
    6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing, Hotel Taikanso, Matsushima, Japan, January 24-27, 2006. pp. 115-116 ( )

  7. K. Takeda, Y. Kubota, A. Serdyuchenko, S. Takashima, Y. Matsumi, and M. Hori.
    Diagnostics of Ground State and Excited O Atoms in O2 and Kr Mixture Plasma with Vacuum Ultraviolet Laser Absorption Spectroscopy,
    6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing, Hotel Taikanso, Matsushima, Japan, January 24-27, 2006. pp. 133-134 ( )

  8. M. Ebihara, S. Den, H. Kano, T. Maeda, M. Hiramatsu, S. Takashima, and M. Hori.
    Low Temperature Growth of Carbon Nanowalls on Glass Substrate,
    6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing, Hotel Taikanso, Matsushima, Japan, January 24-27, 2006. pp. 117-118 ( )

  9. M. Kimura, T. Masuda, M. Hiramatsu, Y. Ando, and M. Hori.
    Synthesis of Aligned Multi-Walled Carbon Nanotubes Using Microwave Excited Non-Equilibrium Atmospheric Pressure Plasma-Enhance CVD,
    6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing, Hotel Taikanso, Matsushima, Japan, January 24-27, 2006. pp. 607-608 ( )

  10. H. Nagao, M. Hiramatsu, T. Deguchi, H. Amano, and M. Hori.
    Fabrication of Dense, Aligned Single-Walled Carbon Nanotube Film Using Microwave Plasma-Enhanced Chemical Vapor Deposition,
    6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing, Hotel Taikanso, Matsushima, Japan, January 24-27, 2006. pp. 609-610 ( )

  11. T. Matsubara, K. Takeda, T. Ito, T. Mori, S. Tada, H. Hayakawa, and M. Hori.
    Low Temperature Formation of SiN Film on Organic Light Emitting Diodes Using Very High Frequency-Capacitively Coupled Plasma,
    6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing, Hotel Taikanso, Matsushima, Japan, January 24-27, 2006. pp. 679-680 ( )

  12. M. Iwasaki, M. Ito, T. Uehara, and M. Hori.
    Measurement of Spatial Distribution of CF2 Radical in Non-Equilibrium Atmospheric Pressure-Pulsed Plasma by Laser-Induced Fluorescence Spectroscopy,
    6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing, Hotel Taikanso, Matsushima, Japan, January 24-27, 2006. pp. 717-718 ( )

  13. S. Takashima, M. Hiramatsu, and M. Hori.
    Synthesis of Vertically Aligned Carbon Nanowalls using Plasma Enhanced Chemical Vapor Deposition with Radical Injection,
    4th International Symposium on Nanotechnology, Tokyo Big Sight Conference Tower, Tokyo, Japan, February 20-21, 2006. pp. 96-97 ( )

  14. S. Takashima, H. Kano, and M. Hori.
    Compact Radical Monitoring System for Plasma Nano Processing,
    3rd International Workshop on Advanced Plasma Processing and Diagnostics, Seoul, Korea, April 14-15, 2006. p. 7 ( )

  15. S. Kawai, S. Kondo, K. Yamakawa, H. Kano, M. Hiramatsu, and M. Hori.
    Study of Initial Growth Stages in the Carbon Nanowall Formation Employing Ellipsometry,
    3rd International Workshop on Advanced Plasma Processing and Diagnostics, Seoul, Korea, April 14-15, 2006. p. 8 ( )

  16. M. Ura, W. Nakamura, Y. Tokuda, M. Hiramatsu, H. Kano, and M. Hori.
    Electrical Characteristics in Carbon Nanowall Devices,
    3rd International Workshop on Advanced Plasma Processing and Diagnostics, Seoul, Korea, April 14-15, 2006. p. 10 ( )

  17. T. Deguchi, H. Nagao, M. Hiramatsu, and M. Hori.
    Single-Walled Carbon Nanotube Formation with Ultrahigh Growth Rate,
    3rd International Workshop on Advanced Plasma Processing and Diagnostics, Seoul, Korea, April 14-15, 2006. p. 11 ( )

  18. T. Masuda, M. Kimura, K. Yamakawa, M. Hiramatsu, and M. Hori.
    Carbon Nanotube and Nanowall Formations Employing Nonequilibrium Atmospheric Pressure Plasma CVD,
    3rd International Workshop on Advanced Plasma Processing and Diagnostics, Seoul, Korea, April 14-15, 2006. p. 12 ( )

  19. T. Mori, S Kato, M. Hiramatsu, K. Yamakawa, S. Den, H. Kano, and M. Hori.
    Formation of Carbon Nanaowalls Employing Radical Infected Plasma CVD and Its Diagnostics,
    3rd International Workshop on Advanced Plasma Processing and Diagnostics, Seoul, Korea, April 14-15, 2006. p. 13 ( )

  20. M. Ito, K. Takeda, T. Ohta, and M. Hori.
    Micro-nano Fabrications Employing Electron Beam Excited Plasma and their Diagnostics,
    3rd International Workshop on Advanced Plasma Processing and Diagnostics, Seoul, Korea, April 14-15, 2006. p. 23 ( )

  21. T. Ohta, M. Ito, and M. Hori.
    Radical Temperature Measurement Using Laser Absorption Spectroscopy in VHF SiH4 Plasma,
    3rd International Workshop on Advanced Plasma Processing and Diagnostics, Seoul, Korea, April 14-15, 2006. p. 24 ( )

  22. K. Takeda, S. Takashima, Y. Matsumi, and M. Hori.
    Laser Diagnostics of Ground and Excited States of Oxygen Atoms in 300 mmφWafer Surface Wave Plasma Processing,
    3rd International Workshop on Advanced Plasma Processing and Diagnostics, Seoul, Korea, April 14-15, 2006. p. 25 ( )

  23. S. Uchida, S. Takashima, and M. Hori.
    Study of the Fundamental Etching Reactions of Organic Low-k Films,
    3rd International Workshop on Advanced Plasma Processing and Diagnostics, Seoul, Korea, April 14-15, 2006. p. 26 ( )

  24. M. Iwasaki, M. Ito, T. Uehara, and M. Hori.
    Measurement of CF and CF2 Radicals in Non-equilibrium Atmospheric Pressure Pulsed C4F8/Ar Plasma,
    3rd International Workshop on Advanced Plasma Processing and Diagnostics, Seoul, Korea, April 14-15, 2006. p. 27 ( )

  25. W. Takeuchi, Y. Tokuda, H. Ueda, T. Kachi, and M. Hori.
    GaN Etching Employing ICP Plasma and Evaluation of Electrical Damages,
    3rd International Workshop on Advanced Plasma Processing and Diagnostics, Seoul, Korea, April 14-15, 2006. p. 28 ( )

  26. M. Hori, and M. Hiramatsu.
    Synthesis of Carbon Nanowall Employing Radical Controlled Plasma Enhanced Chemical Vapor Deposition,
    2nd International COE Forum on Plasma Science and Technology, Seminaris SeeHotel, Potsdam, Germany, May 3-6, 2006. p. 10 ( )

  27. Y. Hara, S. Takashima, S. Den, K. Yamakawa, H. Kano, and M. Hori.
    Development of Neutral Beam Source and Its Characteristic of Charge Exchange,
    2nd International COE Forum on Plasma Science and Technology, Seminaris SeeHotel, Potsdam, Germany, May 3-6, 2006. p. 26 ( )

  28. K. Takeda, S. Takashima, Y. Matsumi, and M. Hori.
    Diagnostics of Particles in O2/Kr Surface Wave Excited Plasma,
    2nd International COE Forum on Plasma Science and Technology, Seminaris SeeHotel, Potsdam, Germany, May 3-6, 2006. p. 34 ( )

  29. Y. Hara, S. Takashima, S. Den, K. Yamakawa, H. Kano, and M. Hori.
    Development of Neutral Beam Source and Its Characteristic of Charge Exchange
    Japanese-German Student Workshop on Plasma Science and Technology, IBA Ruhr University Bochum, Dusseldorf, Germany, May 7-8, 2006. ( )

  30. K. Takeda, S. Takashima, Y. Matsumi, and M. Hori.
    Diagnostics of Particles in O2/Kr Surface Wave Excited Plasma
    Japanese-German Student Workshop on Plasma Science and Technology, IBA Ruhr University Bochum, Dusseldorf, Germany, May 7-8, 2006. ( )

  31. M. Iwasaki, M. Ito, T. Uehara, and M. Hori.
    Measurement of 3D Distribution of CF2 Radical in Non-equilibrium Atmospheric Pressure Pulsed Micro-gap Plasma,
    3rd International Workshop on Microplasmas, Alfried Krupp Kolleg, Greifswald, Germany, May 9-11, 2006. pp. 40-43 ( )

  32. M. Hori, and M. Hiramatsu.
    Carbon Nanowalls Formation by Radical-Controlled Plasma Process
    International Conferences on Modern Materials and Technologies (CIMTEC 2006), Sicily, Italy, June 4-9, 2006. ( )

  33. S. Kondo, K. Yamakawa, S. Kawai, S. Den, H. Kano, M. Hiramatsu, and M. Hori.
    Morphology Control in the Growth Process of Carbon Nanowalls Using Radical Injection Plasma Enhanced CVD
    8th Asia-Pacific Conference on Plasma Science and Technology (APCPST), Novotel Palm Cove Resort, Cairns, Australia, July 2-5, 2006. ( )

  34. T. Ohta, S. Taneda, M. Ito, S. Takashima, H. Kano, S. Den, and M. Hori.
    Development of multi-micro hollow cathode lamp for metallic element-quantitative analysis
    8th Asia-Pacific Conference on Plasma Science and Technology (APCPST), Novotel Palm Cove Resort, Cairns, Australia, July 2-5, 2006. ( )

  35. M. Hiramatsu, T. Deguchi, H. Nagao, and M. Hori.
    Area-selective Growth of Aligned Single-walled Carbon Nanotube Films Using Microwave Plasma-enhanced CVD
    17th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, and Nitrides, Estoril, Portugal, September 3-8, 2006. ( )

  36. M. Hiramatsu, and M. Hori.
    Area-selective Growth of Dense, Aligned Single-walled Carbon Nanotube Film Using Microwave Plasma-enhanced Chemical Vapor Deposition
    10th International Conference on Plasma Surface Engineering (PSE2006), Garmisch-Partenkirchen, Germany, September 10-15, 2006. ( )

  37. M. Hiramatsu, T. Deguchi, H. Nagao, and M. Hori.
    Fabrication of Dense, Aligned Single-Walled Carbon Nanotube Film using Microwave Plasma-Enhanced Chemical Vapor Deposition
    10th International Conference on Plasma Surface Engineering (PSE2006), Garmisch-Partenkirchen, Germany, September 10-15, 2006. ( )

  38. M. Ura, W. Takeuchi, Y. Tokuda, M. Hiramatsu, H. Kano, and M. Hori.
    Electrical Characterization of Carbon Nanowalls,
    International Conference on Solid State Devices and Materials, Pacifico, Yokohama, Japan, September 13-15, 2006. pp. 726-727 ( )

  39. S. Uchida, S. Takashima, M. Fukasawa, K. Oshima, A. Ando, K. Ngahata, T. Tatatsumi, M. Hori.
    Damages due to Light, Radicals and Ions on Low-k Porous SiOCH Films in Plasma Etching Processes
    6th Korea-Japan Symposium on Plasma and Thin Film Technology, Haeundae Grand Hotel, Busan, Korea, October 20-21, 2006. ( )

  40. M. Iwasaki, M. Ito, T. Yara, T. Uehara, M. Hori.
    Diagnostics of Non-equilibrium Atmospheric-Pressure Pulsed Remote Plasma for SiO2 Etching
    6th Korea-Japan Symposium on Plasma and Thin Film Technology, Haeundae Grand Hotel, Busan, Korea, October 20-21, 2006. ( )

  41. Y. Hara, S. Takashima, K. Yamakawa, S. Den, H. Kano, M. Hori, H. Sugai.
    Development and Characteristics of Fast Radical Source
    6th Korea-Japan Symposium on Plasma and Thin Film Technology, Haeundae Grand Hotel, Busan, Korea, October 20-21, 2006. ( )

  42. S. Kondo, K. Yamakawa, S. Kawai, S. Den, H. Kano, M. Hiramatsu, and M. Hori.
    Initial Growth Process of Carbon Nanowalls Using Radical Injection Plasma Enhanced CVD
    2006 International Microprocesses and Nanotechnology Conference (MNC 2006), Kamakura Prince Hotel, Kanagawa, Japan, October 24-27, 2006. ( )

  43. S. Takashima, S. Uchida, N. Fukasawa, K. Oshima, K. Nagahata, T. Tasumi, M. Hori.
    Systematically evaluation of etching damage of light, radicals and ions on low-k porous SiOCH films
    53rd International Symposium American Vacuum Society (AVS), Moscone West, San Francisco, USA, November 12-17, 2006. ( )

  44. T. Ohta, S. Taneda, M. Ito, S. Takashima, H. Kanao, S. Den, M. Hori.
    Development of multi-micro cathode lamp with metallic-element-emission array
    53rd International Symposium American Vacuum Society (AVS), Moscone West, San Francisco, USA, November 12-17, 2006. ( )

  45. M. Fukasawa, T. Tatsumi, K. Ohshima, Y. Kiyonobu, S. Hibarino, K. Nagahata, K. Shinohara, S. Uchida, S. Takashima, M. Hori, and Y. Kamide.
    Surface Reactions during Low-k Etching Using N-H Plasma
    28th International Symposium on Dry Process (DPS2006), Will Aichi, Nagoya, Japan, November 29-30, 2006. ( )

  46. T. Machino, M. Nakamura, K. Yamakawa, H. Kano, M. Hiramatsu, M. Hori.
    Field Emission Properties of Carbon Nanowalls Decorated with Dispersed Platinum Nanoparticles
    28th International Symposium on Dry Process (DPS2006), Will Aichi, Nagoya, Japan, November 29-30, 2006. ( )

  47. K. Takeda, S. Takashima, T. Shiozawa, Y. Kabe, J. Kitagawa, T. Nakanishi, M. Hori.
    O(1D2) Atoms Detection in O2 and Rare Gas Mixture Surface Wave Plasmas for 200mm Si Wafer Oxidation Process on Production Level
    28th International Symposium on Dry Process (DPS2006), Will Aichi, Nagoya, Japan, November 29-30, 2006. ( )

  48. T. Masuda, M. Kimura, M. Hiramatsu, and M. Hori.
    Carbon Nanotube and Nanowall Formations Employing Non-equilibrium Atmospheric Pressure Plasma CVD
    28th International Symposium on Dry Process (DPS2006), Will Aichi, Nagoya, Japan, November 29-30, 2006. ( )

  49. H. Sasaki, S. Takashima, M. Hori.
    Development of Measurement Technique of Absolute Carbon Atom Densities in Reactive Plasma Processes Using Vacuum Ultraviolet Absorption Spectroscopy
    28th International Symposium on Dry Process (DPS2006), Will Aichi, Nagoya, Japan, November 29-30, 2006. ( )

  50. T. Matsubara, M. Li, H. Imaeda, K. Takeda, Y, Masumoto, T. Mori, M. Hori.
    Low Temperature Formation of SiN Films Using VHF Capacitively Coupled Plasma and Application to Passivation Films for Organic Devices
    28th International Symposium on Dry Process (DPS2006), Will Aichi, Nagoya, Japan, November 29-30, 2006. ( )

  51. Y. Ito, E. Takahashi, T. Chikyow, M. Hori.
    High Rate Deposition of Silicon Nanoparticles Using Pulse Modulated UHF SiH4/H2 Plasma
    28th International Symposium on Dry Process (DPS2006), Will Aichi, Nagoya, Japan, November 29-30, 2006. ( )

  52. S. Takashima, S. Takahashi, X. Jia, H. Kano, K. Yamakawa, S. Den, M. Hori.
    Ubiquitous Monitoring Probe for Atomic Radicals in Process Plasmas
    28th International Symposium on Dry Process (DPS2006), Will Aichi, Nagoya, Japan, November 29-30, 2006. ( )

  53. W. Takeuchi, K. Yamakawa, H. Kano, M. Hiramatsu, M. Hori.
    Formation of carbon nano-wall employing radical injection plasma CVD
    4th International Workshop on Advanced Plasma Processing and Diagnostics and Thin Film Technology for Electronic Materials, Green Hotel Sangane, Aichi, Japan, December 1-2, 2006. ( )

  54. Y. Ito, E. Takahashi, T. Chikyow, M. Hori.
    Fast deposition of Si nano-cluster using a remote plasma CVD
    4th International Workshop on Advanced Plasma Processing and Diagnostics and Thin Film Technology for Electronic Materials, Green Hotel Sangane, Aichi, Japan, December 1-2, 2006. ( )

  55. K. Takeda, S. Takashima, T. Shiozawa, Y. Kabe, J. Kitagawa, T. Nakanishi, M. Hori.
    Measurement of ground and meastable state oxygen species for Si Oxidation process
    4th International Workshop on Advanced Plasma Processing and Diagnostics and Thin Film Technology for Electronic Materials, Green Hotel Sangane, Aichi, Japan, December 1-2, 2006. ( )