M. Hori, and T. Goto (INVITED
) Etching Control and Clarification of Important Radical for Etching by Employing Radical Injection Method , SEMI Technology Symposium 95, Chiba, Japan, December 6-8, 1995. No.1-60, pp. 51-55
T. Goto (INVITED
) Measurements of CFx and SiHx Radical in ECR and RF Plasma Used for Material Processing , ISPC-12, Minneasota, USA, August 21-25, 1995. p. 323
General
N. Nisizawa, M. Mori, T. Goto, and A. Miyauchi. Spectrum Analysis of Guided Acoustic Wave Brillouin Scattering in Polarization Maintaining Fibers, CLEO/Pacific Rim 95, Chiba, Japan, July 10-14, 1995. P.42 (
)
B. P. Singh, K. Ieda, M. Mori,T. Goto, and A. Miyauchi. A Novel Method to Control Optical Spectral Width in Actively Mode-Locked Erbium Doped Fiber ring Laser, CLEO/Pacific Rim 95, Chiba, Japan, July 10-14, 1995. TuH5.1215 (
)
B. P. Singh, K. Ieda, M. Mori,T. Goto, and A. Miyauchi . Novel Method for Controlling Optical Pulse Width in an Actively-Mode-Locked Fiber Ring Laser, OFC 95, California, USA, 1995. No.WP7, p. 177 (
)
T. Goto. Diagnostics of Methyl Radical in RF and ECR Hydro-Carbon Plasmas Using Laser Absorption Spectroscopy, 7th Laser - aided plsma diagnostics (LAPD), Fukuoka, Japan, 1995. Session A-6, pp. 28-33 (
)
M. Ikeda, K. Aiso, M. Hori, and T. Goto. Effects of H, OH, and CH3 Radicals on Diamond Formation in a Capacitively Coupled RF Plasma, 42th National Symposium of American Vacuum Society (AVS), Minnesota, USA, 1995. TF-VM-ThA6, p. 107 (
)
M. Hori, K. Miyata, K. Takahashi, and T. Goto . Diagnostics of CFx(x:1-3) Radicals and F Atom in ECR Etching Plasmas Employing CF4, C2F6 and C4F8, 42th National Symposium of American Vacuum Society (AVS), Minnesota, USA, 1995. MS+PS-ThM2, p. 100 (
)
K. Takahashi, M. Hori, and T. Goto. Interaction of CF Radical with Wall Surfaces in ECR Etching Plasma Employing CHF3/H2, IUVSTA International Workshop on Plasma Sorace and Surface Interactions in Materials Processing, Fuji-Yoshida, Japan, 1995. No.G-4, p. 29 (
)
A. Kono, K. Ohata, and T. Goto. Negatine Ion Measurements for RF SF6 Plasma, IUVSTA International Workshop on Plasma Source and Surface Interactions in Materials Processing, Fuji-Yoshida, Japan, 1995. No.PII-8, p. 80 (
)
M. Ikeda, K. Aiso, M. Hori, and T. Goto . Measurement of CH3 Radical Density in ECR and Parellel-Plate RF Plasmas, 48th Annual Gaseous Electronics Conference (GEC), Clifornia, USA, 1995. Vol.40, No.9, PA-6, p. 1584 (
)
S. Den, T. Kuno, K. Takahashi, M. Ito, M. Hori, Y. Hayashi, Y. Sakamoto, and T. Goto. Measurement of Radical Densities Associated with C4F8 Plasma from a Large Area ECR Plasma Source, 48th Annual Gaseous Electronics Conference (GEC), Clifornia, USA, 1995. Vol.40, No.9, NB-3, p. 1580 (
)
M. Hori, K. Takahashi, and T. Goto . Influence of Wall Surface on CFx(x=1-3) Radicals and Film Deposition in CHF3/H2 ECR Etching Plasma, 48th Annual Gaseous Electronics Conference (GEC), Clifornia, USA, 1995. Vol.40, No.9, NB-2, p. 1580 (
)
H. Nomura, K. Akimoto, A. Kono, and T. Goto . Production and Loss of SiHx Radicals in Low-Pressure RF SiH4 Plasma, 48th Annual Gaseous Electronics Conference (GEC), Clifornia, USA, 1995. Vol.40, No.9, NA-8, p. 1579 (
)
H. Nomura, A. Kono, and T. Goto . Electron Density and Temperature in Low-Pres sure RF SiH4 Plasmas Diluted with H2,He, Ar and Xe, 48th Annual Gaseous Electronics Conference (GEC), Clifornia, USA, 1995. Vol.40, No.9, NA-7, p. 1579 (
)
K. Yamada, E. Mizuno,S. Kato, M. Hiramatsu, M. Nawata, M. Ikeda, M. Hori, and T. Goto . Effect of Carbon Source Gases on Diamond Thin Film Formation Using RF Plasma CVD Assisted by Microwave Plasma, 48th Annual Gaseous Electronics Conference (GEC), Clifornia, USA, 1995. Vol.40, No.9, NA-5, p. 1578 (
)
E. Mizuno, K. Yamada, S. Kato, M. Hiramatsu, M. Nawata, M. Ikeda, M. Hori, T. Goto . Diamond Film Formation by RF Plasma CVD with Radical Source Employing H2 and H2O Gases, 48th Annual Gaseous Electronics Conference (GEC), Clifornia, USA, 1995. Vol.40, No.9, DC-5, p. 1553 (
)
M. Hiramatsu, M. Inayoshi, K. Yamada, T. Takahara, M. Nawata, M. Ikeda, M. Hori, T. Goto. Plasma CVD Assisted by Selective Radical Souce and its Application to Synthesis of Diamond, 19th International Rarefied Gas Dynamics, Oxford, UK, 1995. pp. 671-677 (
)
M. Ikeda, M. Hori, T. Goto, K. Yamada, E. Mizuno, M. Hiramatsu, M. Nawata . Diamond Thin Film Formetion Using RF CH3OH Plasma Assisted by H and OH Radicals, 3th ISSP, Tokyo, Japan, 1995. pp. 201-206 (
)