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2004

Invited talk

  1. M. Hori (INVITED )
    Ultrahigh Speed Processing Employing Microwave Excited Non-Equilibrium Atmospheric Pressure Plasma,
    Proceedings of International COE Forum on Plasma Science and Technology, 21st Century COE Program: Plasma-Nano, Nagoya University, Nagoya, April 5-7, 2004. pp. 47-48

  2. M. Hori, and T. Goto (INVITED )
    Smart Process for Organic Low k Dielectric Film Etching,
    FSISE 2004: The 2004 Joint Conference of The 7th International Conference on Advanced Surface Engineering (ASE 2004) and The 2nd International Conference on Surface and Interface Science and Engineering (SISE 2004), Guangzhou, China, May 14-16, 2004. p. 109

  3. M. Hori (INVITED )
    Deposition of Multi-Layered Low-k SiOCH Film Employing Layer-by-Layer Plasma Process,
    Nagasaki Workshop on Next Generation Semiconductor and Processing, Nagasaki University, Nagasaki, July 2-3, 2004. p. 10

  4. M. Hori (INVITED )
    Precise and High-rate Etching of Polymer Film and Its Surface Modification Using High-Density Plasma,
    3rd International Symposium on Advanced Plasma Surface Technology, Pusan National University, Pusan, Korea, November 4, 2004. pp. 53-63

  5. M. Hori, and M. Hiramatsu (INVITED )
    Synthesis of Vertically Aligned Carbon Nanowalls Using Capacitively Coupled Plasma Enhanced Chemical Vapor Deposition by Hydrogen Radical Injection,
    International Union of Materials Research Societies International Conference in Asia (IUMRS-ICA2004), Industrial Technology Research Institute, Hsinchu, Taiwan, November 16-18, 2004. p. 257


General

  1. M. Nagai, M. Hori, and T. Goto.
    Control of Gas Temperature in Non-Equilibrium Atmospheric Pressure Plasma,
    Proceedings of International COE Forum on Plasma Science and Technology/21st Century COE Program: Plasma-Nano, Nagoya University, Nagoya, April 5-7, 2004. pp. 71-72 ( )

  2. A. Suzuki, M. Hori, T. Goto, H. Kitahara, and M. Yuasa.
    Characterization of SiO2 Etching and Diagnostics of Radicals in Atmospheric Pressure Pulsed Plasma,
    Proceedings of International COE Forum on Plasma Science and Technology/21st Century COE Program: Plasma-Nano, Nagoya University, Nagoya, April 5-7, 2004. pp. 203-204 ( )

  3. K. Takada, Y. Tomekawa, M. Iwawaki, M. Ito, T. Ohta, K. Yamakawa、M. Hori, and T. Goto.
    Diagnostics of Pulsed-Modulated Electron-Beam-Excited Plasma for Silicon-Oxide Etching,
    Proceedings of International COE Forum on Plasma Science and Technology/21st Century COE Program: Plasma-Nano, Nagoya University, Nagoya, April 5-7, 2004. pp. 217-218 ( )

  4. Y. Kubota, D. Yamakawa, M. Hori, and T. Goto.
    Effect of Kr Gas Dilution on O Atom Density in Surface Wave Kr/O2 Plasma,
    Proceedings of International COE Forum on Plasma Science and Technology/21st Century COE Program: Plasma-Nano, Nagoya University, Nagoya, April 5-7, 2004. pp. 217-218 ( )

  5. A. Matsushita, K. Yamakawa, M. Hiramatsu, M. Hori, and T. Goto.
    Synthesis of Aligned Carbon Nanostructures by Non-Equilibrium microwave Excited Atmospheric Pressure Plasma CVD,
    Proceedings of International COE Forum on Plasma Science and Technology/21st Century COE Program: Plasma-Nano, Nagoya University, Nagoya, April 5-7, 2004. pp. 227-228 ( )

  6. M. Taniguchi, M. Hiramatsu, Y. Ando, and M. Hori.
    Fabrication of Aligned, Dense Carbon Nanotube Films Using Microwave Plasma-Enhanced Chemical Vapor Deposition,
    Proceedings of International COE Forum on Plasma Science and Technology/21st Century COE Program: Plasma-Nano, Nagoya University, Nagoya, April 5-7, 2004. pp. 231-232 ( )

  7. K. Yamakawa, M. Hori, T. Goto, S. Den, T. Katagiri, and H. Kano.
    High Speed Etching of SiO2 and Organic Films Using Non-Equilibrium Atmospheric Microwave Excited Plasma,
    FSISE 2004: The 2004 Joint Conference of The 7th International Conference on Advanced Surface Engineering (ASE 2004) and The 2nd International Conference on Surface and Interface Science and Engineering (SISE 2004), Guangzhou, China, May 14-16, 2004. p. 157 ( )

  8. M. Hiramatsu, M. Taniguchi, Y. Ando, and M. Hori.
    Fabrication of Aligned Carbon Nanotubes and Nanoflakes Using Microwave Plasma-Enhanced Chemical Vapor Deposition
    16th International Vacuum Congress, Venice, Italy, June 16, 2004. ( )

  9. M. Hiramatsu, K. Shiji, H. Amano, M. Hori.
    Fabrication of Carbon Nanowalls Using Rf Plasma-Enhanced Chemical Vapor Deposition
    16th International Vacuum Congress, Venice, Italy, June 16, 2004. ( )

  10. K. Yamakawa, M. Hori, T. Goto, S. Den, T. Katagiri, and H. Kano.
    Ultrahigh-Rate Etching Process in Microwave-Excited Non-Equilibrium Micro-Gap Atmospheric Pressure Plasma,
    7th APCPST and 17th SPSM: 7th Asia Pacific Conference on Plasma Science and Technology and 17th Symposium on Plasma Science for Materials, Fukuoka International Convention Center, Fukuoka, Japan, June 28-July 2, 2004. p. 49 ( )

  11. M. Hori, M. Nagai, and T. Goto.
    Environmentally Benign Etching System,
    7th APCPST and 17th SPSM: 7th Asia Pacific Conference on Plasma Science and Technology and 17th Symposium on Plasma Science for Materials, Fukuoka International Convention Center, Fukuoka, Japan, June 28-July 2, 2004. p. 65 ( )

  12. M. Taniguchi, M. Hiramatsu, H. Nagao, Y. Ando, and M. Hori.
    Preparation of Dense CNT Film Using Microwave Plasma-Enhanced CVD,
    7th APCPST and 17th SPSM: 7th Asia Pacific Conference on Plasma Science and Technology and 17th Symposium on Plasma Science for Materials, Fukuoka International Convention Center, Fukuoka, Japan, June 28-July 2, 2004. p. 133 ( )

  13. K. Shiji, M. Hiramatsu, A. Enomoto, M. Nakamura, H. Amano, and M. Hori.
    Effect of Carbon Source Gas on the Growth of Carbon Nanowalls Using RF Plasma CVD with h Radical Injection,
    7th APCPST and 17th SPSM: 7th Asia Pacific Conference on Plasma Science and Technology and 17th Symposium on Plasma Science for Materials, Fukuoka International Convention Center, Fukuoka, Japan, June 28-July 2, 2004. p. 137 ( )

  14. M. Kimura, M. Hiramatsu, Y. Ando, K. Yamakawa, and M. Hori.
    Aligned Nanotube Formation Using Microwave Excited Non-equilibrium Atmospheric Pressure Plasma,
    International Symposium on Microwave Science and Its Application to Related Fields, Sunport Hall Takamatsu, Takamatsu, Japan, July 27-30, 2004. pp. 323-325 ( )

  15. M. Nagai, M. Hori, and T. Goto.
    Measurement and Control of Gas Temperature in Non-equilibrium Atmospheric Pressure Plasma with Microwave Excitation,
    International Symposium on Microwave Science and Its Application to Related Fields, Sunport Hall Takamatsu, Takamatsu, Japan, July 27-30, 2004. pp. 334-337 ( )

  16. H. Nagao, M. Hiramatsu, M. Taniguchi, H. Amano, Y. Ando, and M. Hori.
    High-Rate Growth of Uniform Carbon Nanotube Films Using the Template Method,
    International Symposium on Microwave Science and Its Application to Related Fields, Sunport Hall Takamatsu, Takamatsu, Japan, July 27-30, 2004. pp. 519-521 ( )

  17. K. Takeda, M. Ito, T. Ohta, M. Hori, and C. Koshimizu.
    A Novel Temperature-Sensing System for Multi-Layered Substrate in Dry Etching Processes,
    IEEE/LEOS Optical Mems 2004 International Conference on Optical Mems and Their Applications, Kagawa International Conference Hall, Takamatsu, Japan, August 22-26, 2004. pp. 76-77 ( )

  18. T. Ohta, Y. Tomekawa, M. Ito, K. Takeda, M. Iwasaki, K. Yamakawa, M. Hori, and T. Goto.
    Micro-Machining Process for Optical Device Employing Pulse-Modulated Electron-Beam-Excited Plasma,
    IEEE/LEOS Optical Mems 2004 International Conference on Optical Mems and Their Applications, Kagawa International Conference Hall, Takamatsu, Japan, August 22-26, 2004. pp. 120-121 ( )

  19. M. Taniguchi, M. Hiramatsu, Y. Ando, and M. Hori.
    Fabrication of Dense Carbon Nanotube Film Using Microwave Plasma-Enhanced CVD
    15th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide, Riva del Garda, Italy, September 13, 2004. ( )

  20. K. Shiji, M. Hiramatsu, H. Amano, and M. Hori.
    Vertical Growth of Carbon Nanowalls Using rf Plasma-Enhanced Chemical Vapor Deposition
    15th European Conference on Diamond, Diamond-Like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide, Riva del Garda, Italy, September 13, 2004. ( )

  21. Y. Kubota, K. Yamakawa, and M. Hori.
    Effect of Kr Gas Dilution on O Atom Density in Surface Wave Excited Kr/O2 Plasma for Low-Temperature and Damage-Free Plasma Oxidation Processes,
    2004 International Conference on Solid State Devices and Materials, Tower Hall Funabori, Tokyo, Japan, September 15-17, 2004. pp. 206-207 ( )

  22. M. Hori.
    Evolution of Dielectric Etching toward Nano-Scale,
    2nd International School of Advanced Plasma Technology, Villa Monastero, Varenna, Italy, September 27-October 1, 2004. p. 39 ( )

  23. M. Hiramatsu, and M. Hori.
    Fabrication of Two-Dimensional Carbon Nanostructures Using Plasma-Enhanced Chemical Vapor Deposition,
    6th International Conference on Nanotechnology in Carbon: from Synthesis to Applications of Nanostructured Carbon and Related Materials (Nanotec 2004), Batz-sur-Mer, France, October 10-15, 2004. p. 28 ( )

  24. M. Nagai, and M. Hori.
    Gas and Electrode Temperatures in Non-equilibrium Atmospheric Pressure Plasma with Microwave Excitation,
    51st International Symposium American Vacuum Society (AVS), Anaheim Convention Center, Anaheim, CA, USA, November 14-19,2004. PS-ThM3 ( )

  25. Y. Mouri, M. Hori, T. Goto, A. Ando, and T. Tatsumi.
    Investigation of Fundamental Etching Reaction of Organic Low Dielectric Film Using Ion Beams with Radical Injection,
    51st International Symposium American Vacuum Society (AVS), Anaheim Convention Center, Anaheim, CA, USA, November 14-19, 2004. PS-1MoM2 ( )

  26. K. Takeda, Y. Tomekawa, T. Ohta, K. Yamakawa, M. Ito, and M. Hori.
    A Novel Etching Process Employing Pulse-Modulated Electron-Beam-Excited Plasma for Fabrication of Micro-Optical Devices,
    51st International Symposium American Vacuum Society (AVS), Anaheim Convention Center, Anaheim, CA, USA, November 14-19, 2004. PS-1-TuM5 ( )

  27. M. Iwasaki, M. Ito, M. Hori, H. Kitahata, and T. Uehara.
    SiO2 Etching and Diagnostics of Radicals in Atmospheric Pressure-Pulsed CF4/Ar Plasma with O2 Addition,
    26th International Symposium on Dry Process (DPS), The University of Tokyo, Tokyo, November 30-December 1, 2004. pp. 85-89 ( )

  28. K. Yamakawa, M. Hori, T. Goto, S. Den, T. Katagiri, and H. Kano (Commemorative Talk).
    New Etching of SiO2 with Ultrahigh Rate and Selectivity Using Microwave Excited Non-Equilibrium Atmospheric Pressure Plasma,
    26th International Symposium on Dry Process (DPS), The University of Tokyo, Tokyo, November 30- December 1, 2004. pp. 277-282 (ORAL )

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