T. Goto (INVITED
) Radical Measurements in Processing Plasmas Using IR Laser Absorption Spectroscopic Techniques, 韓国真空学会, Korea, July, 1994. IV-2, pp. 152-153
General
K. Maruyama, K. Ohkouchi, Y. Ohtsu, and T. Goto. CF3 CF2 and CF Radical Measurements in RF CHF3 Etching Plasma Using Infrared Diode Laser Absorption Spectroscopy, ICRP-2/SPP-11, Yokohama, Japan, January, 1994. I-4, pp. 17-20 (
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N. Koike, A. Kono, and T. Goto. Effect of Diluent Gases on the SiH2 Density in an RF SiH4 Plasma, ICRP-2/SPP-11, Yokohama, Japan, January, 1994. VIIb-1, pp. 147-150 (
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H. Nomura, A. Kono, and T. Goto. Effect of Diluent Gases on the SiH3 Radical Density in an RF SiH4 Plasma, ICRP-2/SPP-11, Yokohama, Japan, January, 1994. VIIb-2, pp. 151-154 (
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Y. Yamamoto, M. Hori, H. Nomura, T. Tanaka, M. Hiramatsu, and T. Goto. Measurements of Absolute Densities of Si, SiH and SiH3 in SiH4/H2 Electron Cyclotron Resonance Plasma, ICRP-2/SPP-11, Yokohama, Japan, January, 1994. VIIb-3, pp. 155-158 (
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T. Tanaka, M. Hiramatsu, M. Nawata, A. Kono, and T. Goto. Reaction Rate Constant of Si Atoms With SiH4 Molecules in an F SiH4 Plasma, ICRP-2/SPP-11, Yokohama, Japan, January, 1994. VIId-5, pp. 299-302 (
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S. Naito, N. Ito, T. Hattori, and T. Goto. Carbon Film Deposition in an RF CH4 Plasma with CH3 Radical Density Control by Xe Admixture, ICRP-2/SPP-11, Yokohama, Japan, January, 1994. VIIIb-2, pp. 375-378 (
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K. Takahashi, M. Hori, S. Kishimoto, and T. Goto. Fluorocarbon Radicals and Polymerization in On-Off Modulated CHF3 Electron Cyclotron Resonance Plasma, ICRP-2/SPP-11, Yokohama, Japan, January, 1994. Xb-2, pp. 585-588 (
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M. Endo, S. Kishimoto, A. Kono, and T. Goto. Photodetachment Study of Negative Ions in a Radio-Frequency SF6 Plasma, ICRP-2/SPP-11, Yokohama, Japan, January, 1994. Xb-7, pp. 605-608 (
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B. P. Singh, T. Tazaki, K. Ieda, M. Mori, T. Goto, and A. Miyauchi. Stable Harmonic Mode-Locking of Fiber Ring Lasers by AM Modulation of the Harmonic Signal, OEC 94, Chiba, Japan, July, 1994. 13B1-3, pp. 30-31 (
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N. Nishizawa, S. Kume, M. Mori, T. Goto, and A. Miyauchi. A New Scheme to Observe Guided Acoustic-Wave Brillouin Scattering in PANDA Fiber with Fiber Loop Mirror, OEC 94, Chiba, Japan, July, 1994. 14B2-3, pp. 138-139 (
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S. Singh, Y. Shikota, M. Mori, T. Goto, and A. Miyauchi. Observation of Refractive Index Change in Erbium Doped Fiber when Irradiated by 532 nm Light, OEC 94, Chiba, Japan, July, 1994. 14B2-4, pp. 140-141 (
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B. P. Singh, T. Tazaki, K. Ieda, M. Mori, T. Goto, and A. Miyauchi. Stable Harmonic Mode-looking of Fiber Ring Lasers, CEOP-94, New Delhi, India, July, 1994. pp. 265-268 (
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M. Hiramatsu, M. Inayoshi, K. Yamada, T. Nakahira, M. Nawata, M. Ikeda, M. Hori, and T. Goto. Plasma CVD Assisted by Selective Radical Source and its Application to Synthesis of Diamond, 19th International Symposium on Rarefied Gas Dynamics, Oxford, UK, July, 1994. none (
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Y. Yamamoto, M. Hori, M. Hiramatsu, and T. Goto. Effect of H2 and Ar Dilutions on Si and SiH3 Radical Densities in Electron Cyclotron Resonance Silane Plasma, APCPST 94, Daejeon, Korea, September, 1994. D1-4, pp. 131-134 (
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M. Hori, Y. Yamamoto, M. Hiramatsu, and T. Goto. Si and SiH3 Radicals in On-Off Modulated ECR SiH4 Plasma, 47th Annual Gaseous Electronics Conference (GEC), Gaithersburg, Maryland, USA, October, 1994. JA-2, p. 1465 (
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M. Inayoshi, K. Yamada, M. Hiramatsu, M. Nawata, M. Ikeda, M. Hori, and T. Goto. Formation of Fluorocarbon Thin Films Using Plasma CVD Assisted by Selective Radical Source, 47th Annual Gaseous Electronics Conference (GEC), Gaithersburg, Maryland, USA, October, 1994. JD-15, p. 1471 (
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K. Takahashi, K. Miyata, M. Hori, K. Kishimoto, and T. Goto. Gas Phase Reactions of Fluorocarbon Radicals in CHF3/H2 and CHF3/O2 ECR Downstream Plasmas, 47th Annual Gaseous Electronics Conference (GEC), Gaithersburg, Maryland, USA, October, 1994. JE-2, p. 1472 (
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