H. Takeuchi, M. Arakawa, H. Ebisu, H. Tanaka, H. Abe. EPR Study of Gd3+ Complexes Formedin Layered and Cubic Perovskite Crystals, Proceeding of the First Asia-Pacidic EPR/ESR Symposium, City University of Hong Kong, Hong Kong, January, 1998. pp. 534-541 (
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M. Arakawa, H. Ebisu, H. Takeuchi, M. Mori. EPR Study of Trivalent Magnetic Ions in Hexagonal Rb2nF3 Crystals, Proceeding of the First Asia-Pacidic EPR/ESR Symposium, City University of Hong Kong, Hong Kong, January, 1998. pp. 445-452 (
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R. Goto, T. Goto, Y. Ohya, H. Kasuya, M. Mori, and K. Yamane. A Novel Method to Stabilize Lasing Spectra of Semiconductor Laser Diodes by Mutual Injection Locking, 3rd Optoelectronics and Communication Conference (OECC 98), Chiba, Japan, July, 1998. 14P-25, pp. 236-237 (
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N. Nishizawa, T. Horio, M. Mori, T. Goto, and K. Yamane. Characteristics of Spectral Filtering Squeezing of Optical Pulses Propagated in Optical Fibers, 3rd Optoelectronics and Communication Conference (OECC 98), Chiba, Japan, July, 1998. 14P-49, pp. 284-285 (
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T. Horio, M. Hashiura, N. Nishizawa, M. Mori, T. Goto, and K. Yamane. Generation of Quadrature Squeezed Light with Phase Tunable PBS Fiber Loop Mirror, 3rd Optoelectronics and Communication Conference (OECC 98), Chiba, Japan, July, 1998. 15C3-4, pp. 382-383 (
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K. Murata, R. Nozawa, M. Ito, M. Hori, and T. Goto. Effects of Charged Species on the Initial Growth in Low Temperature Poly- Si Formation, 11th Symposium on Plasma Science for Materials, 4th Asia-Pacific Conference on Plasma Science and Technology 11th Symposium on Plasma Science for Materials, Australia, July, 1998. pp. 43 (
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K. Murata, K. Kamiya, R. Nozawa, M. Ito, M. Hori, and T. Goto. Effect of Ion Bombardment on the Initial Growth in Low Temperature Poly-Si Formation, 4th International Conference on Reactive Plasmas and 16th Symposium on Plasma Processing, Maui, USA, October, 1998. EMP4.16, pp. 107-108 (
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H. Ohta, A. Nagashima, M. Ito, M. Hori, and T. Goto. Silicon Nitride Ultra Thin Film by ECR Plasma and It's Application to Gate-Insulator, 4th International Conference on Reactive Plasmas and 16th Symposium on Plasma Processing, Maui, USA, October, 1998. EMP4.21, pp. 115-116 (
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A. Kono, S. Hirose, and T. Goto. CW Laser-Indeced Fluorescence Study of SiH2+SiH4 Reaction: Evidence for Two-Body Reaction Channel, 4th International Conference on Reactive Plasmas and 16th Symposium on Plasma Processing, Maui, USA, October, 1998. EMP7.06, pp. 145-146 (
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S. Takashima, S. Arai, M. Ito, M. Hori, T. Goto, A. Kono, and K. Yoneda. Development of Incoherent-Light Absorption Spectroscopic Technique for Measuring Atomic Species in Process Plasmas, 4th International Conference on Reactive Plasmas and 16th Symposium on Plasma Processing, Maui, USA, October, 1998. JTP1.08, pp. 201-202 (
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H. Ito, M. Ishikawa, M. Ito, M. Hori, T. Takeo, T. Kato, and T. Goto. Behavior of Atomic C Species in Inductively Coupled Plasma, 4th International Conference on Reactive Plasmas and 16th Symposium on Plasma Processing, Maui, USA, October, 1998. JTP1.13, pp. 209-210 (
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K. Teii, M. Ito, M. Hori, T. Goto, and N. Ishii. Behaviors of CFx(x=1-3) and Polymeric Species in Electron Cyclotron Resonance Fluorocarbon Plasmas, 4th International Conference on Reactive Plasmas and 16th Symposium on Plasma Processing, Maui, USA, October, 1998. JTP5.02, pp. 241-242 (
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K. Fujita, S. Kobayashi, M. Ito, M. Hori, and T. Goto. Silicon Oxide Selective Etching and Chamber Cleaning Process for Preventing Global Warming, 4th International Conference on Reactive Plasmas and 16th Symposium on Plasma Processing, Maui, USA, October, 1998. KW3.07, pp. 285-286 (
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B. Mebarki, R. Yoshida, S. Sumiya, M. Ito, M. Hori, T. Goto, S. Samukawa, and T. Tsukada. High Deposition Rate of Poly-Silicon at Low Temperature using UHF Plasma System, 4th International Conference on Reactive Plasmas and 16th Symposium on Plasma Processing, Maui, USA, October, 1998. QR2.06, pp. 387-388 (
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M. Nakamura, H. Nakayama, M. Ito, M. Hori, A. Kono, T. Goto, and N. Ishii. Spatial Distribution Measurement of Absolute CFx Radical Densities in Electron Cyclotron Resonance C4F8 Plasma, 4th International Conference on Reactive Plasmas and 16th Symposium on Plasma Processing, Maui, USA, October, 1998. RR2.01, pp. 397-398 (
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M. Hori, K. Fujita, M. Ito, and T. Goto. Novel Etching Process Keeping Harmony with Enviroment by Radical Control International Workshop on Development of Thin Films for Future ULSIs and Nano- Scale Process Integration, Nagoya, Japan, 1998. (
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