M. Hori, M. Sekine, H. Toyoda (INVITED
) Plasma innovation towards next generation Green Technology, 10th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop, Nagasaki University, Nagasaki, Japan, January 8-10, 2010.
K. Ishikawa (INVITED
) Nanoscale engineering for plasma ethching of future device fabrication, 10th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop, Nagasaki University, Nagasaki, Japan, January 8-10, 2010.
M. Hori (INVITED
) Fundamental Research on Plasma Nanoprocessing, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya, Japan, March 7-10, 2010. 8a-A02C, p. 60
M. Hori (KEYNOTE
) Controlled synthesis of carbon nanowalls based on plasma nanoscience 3rd International Leader Workshop on Plasma Nanoscience and Nanotechnology, Australia, March 23, 2010
Hiroki Kondo, Wakana Takeuchi, Mineo Hiramatsu, Masaru Hori (INVITED
) Controlled synthesis of carbon nanowalls for new functional devices, International Conference on Nanomaterials: Synthesis Characterization and Applications (ICN-2010), Mahatma Gandhi University, Kottayam, India, April 27-29, 2010.
M. Hori (INVITED
) Growth mechanisms and controlled synthesis of vertical-standing graphen sheets by PECVD, 62nd IUVSTA Workshop on PLASMA SYNTHESIS AND MODIFICATION OF NANOMATERIALS, Lake Bohinj, Slovenia, June 14-18, 2010.
M. Hori (PLENARY
) Challenge towards Smart Plasma Nano-process Employing Integrated Monitoring, APCPST and SPSM 2010, LOTTE Hotel Jeju, Korea, July 4-8, 2010.
H. Kondo (INVITED
) Self-organizing growth of carbon nanomaterials by plasma and its application to energy harvesting devices, 11th International workshop on Advanced Plasma Processing and Diagnostics, Pamada Jeju Hotel, Korea, July 8-9, 2010.
M. Hori (INVITED
) Plasma fundamental and processes for semiconductor, digital electronics and flexible electronics, Summer International Graduate School of Advanced Material Science and Engineering (AMSE), Sungkyunkwan Univ., Korea, August 24, 2010.
M. Hori (INVITED
) Advanced plasma and nanotechnology related programs in Tokai Region Knowledge Cluster Initiative, Plasma Convergence Technology Workshop, Convergence Plasma Research Center, Korea, September 10, 2010.
M. Hori (INVITED
) Plasma Surface Interactions for Low-k Material Etching, 57th International Symposium American Vacuum Society (AVS), Albuquerque CONVENTION CENTER, Albuquerque, USA, October 17-22, 2010.
T. Ohta, M. Ito, M. Hori (INVITED
) Novel Plasma Processing System for Nano-bio and Nano-medicine, BIT s 1st Annual World Congress of NanoMedicine Conference (NanoMedicine-2010), Beijing International Convention Center, Beijing, China, October 23-25, 2010.
H. Kondo, M. Hori, M. Hiramatsu (INVITED
) Control of Crystalline and Electronic Structures of Carbon Nanowalls for Their Device Applications, 2010 IEEE Region 10 Conference (TENCON2010), Fukuoka International Congress Center, Fukuoka, Japan, November 21-24, 2010.
M. Hori , K. Ishikawa, H. Kondo, K. Takeda, H. Yamamoto, M. Sekine (INVITED
) Plasma Induced Surface and/or Sub-Surface Interactions on Low-k Dielectrics, 2nd International Symposium on Plasma Nanoscience (iPlasmaNano-II), Murramarang Resort, New South Wales, Australia, December 12-15, 2010.
M. Hori, M. Sekine, C. Moon, T. Suzuki, Y. Setsuhara, M. Shiratani (INVITED
) Combinatorial plasma etching, 2nd International Symposium on Plasma Nanoscience (iPlasmaNano-II), Murramarang Resort, New South Wales, Australia, December 12-15, 2010.
General
Y. Setsuhara, M. Shiratani, M. Sekine, M Hori. Soft Materials Processing Technologies for Flexible Electronics, 10th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop, Nagasaki University, Nagasaki, Japan, January 8-10, 2010. (
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K. Takeda, M. Hori. Mechanism of plasma Oxidation Process, 10th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop, Nagasaki University, Nagasaki, Japan, January 8-10, 2010. (
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H. Kondo, S. Zaima. Pasma nitridation of high-k gate Ge thin films for next generation ULSI, 10th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop, Nagasaki University, Nagasaki, Japan, January 8-10, 2010. (
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A. Malinowski. Simulation of 3D gate fabrication by plasma etching for environment-friendly processing, 10th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop, Nagasaki University, Nagasaki, Japan, January 8-10, 2010. (
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S. Chen, H. Kondo, M. Sekine, M. Hori, H. Kano. Development of radical source and its application to GaN growth for LED, 10th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop, Nagasaki University, Nagasaki, Japan, January 8-10, 2010. (
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S. Kawashima, Y. Abe, H. Kondo, M. Sekine, M. Hori. Synthesis of μc-Si and diagnostics in a VHF capacitively coupled plasma employing SiH4/H2, 10th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop, Nagasaki University, Nagasaki, Japan, January 8-10, 2010. (
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T. Kino, H. Kondo, M. Sekine, M. Hori. Synthesis of carbon film employing radical injection PECVD, 10th International Workshop of Advanced Plasma Processing and Diagnostics Joint Workshop, Nagasaki University, Nagasaki, Japan, January 8-10, 2010. (
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T. Kino, S. Kondo, W. Takeuchi, H. Kondo, K. Ishikawa, M. Sekine, M. Hori. Fabrication of carbon nanomaterials synthesized by plasma enhanced chemical vapor deposition for solar cell applications, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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C. S. Moon, K. Takeda, M. Sekine, Y. Setsuhara, M. Shiratani, K. Ishikawa, H. Kondo, M. Hori. A Well-Established Compact Combinatorial Etching Process Employing Inductively Coupled H2/N2 Plasma, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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S. Chen, H. Kano, S. Den, K. Takeda, K. Ishikawa, H. Kondo, M. sekine, M. Hori. Radical Kinetics in N2-H2 Plasma Generated by Novel High Density Radical Source, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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W. Izumiya, M. Goeckner, J. G. Han, M. Hori, S. Hosaka, M. Sato, E. Schultheiss. Application Front of Advanced Plasma Science and Industry-Academia-Government Collaboration, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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T. Hiraoka, T. Kageyama, C. Koshimizu, T. Ohta, M. Ito, N. Nishizawa, M. Hori. Accurate Monitoring System for Silicon Wafer Temperature Using Super-Coniuum Light Source on Low-Conherence Interferometry, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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T. Kanae, M. Inoue, N. Takota, T. Ohta, M. Ito, Y. Higashijima, H. Kano, S. Den, M. Hori. Investigation of Formation Mechanism of Indium-Zinc-Oxide Film by RF Magnetron Sputtering, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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Y. Abe, C. S. Moon, S. Kawashima, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, and M. Hori. Surface Loss Probabilities of H Atom on Various Silicon Thin Films, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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H. Inui, Y. Matsudaira, N. Yoshida, N. Iwaki, T. Kawasumi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, and M. Hori. Measurement of H Radical Density in H2/Ar Nonequilibrium Atmospheric Pressure Plasma, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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A. Malinowski, M. Hori, M. Sekine, T. Suzuki, H. Yamamoto, H. Kondo, K. Ishikawa, A. Jakubowski, L. Lukasiak, and D. Tomaszewski. Modeling of Radical Tranformation under ‘PAPE’ Structure and Method of Estimation for Surface Loss Probabilities of Radicals, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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T. Yamaguchi, T. Kimura, K. Takeda, C. Koshimizu, M. Sekine, M. Hori. Behavior of Rotational Temperature in Dual Frequency Capacitively Coupled Plasma, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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T. Suzuki, H. Yamamoto, K. Takeda, M. Sekine, M. Hori. Study for Damage in Porous SiOCH Film with Air Exposure After H2 or N2 Plasma Treatment, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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E. Shibata, M. Sekine, K. Ishikawa, H. Kondo, H. Okamoto, M. Hori. Porous SiOCH Low-k Film Etch Process and its Surface Reactions Employing an Alternative Fluorocarbon Gas C5F10O, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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Y. Miyawaki, K. Takeda, A. Ito, M. Nakamura, H. Kondo, K. Ishikawa, M. Sekine, and M. Hori. SiO2 Cotact Hole Etch Mechanism Using Environment-Friendly New Gas, C5F7H, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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H. Yamamoto, K. Takeda, M. Sekine, M. Hori. Effect of CF Layer on Porous SiOCH Low-k Films During H2 or N2 Plasma Exposure, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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T. Takeuchi, M. Sekine, H. Toyoda, H. Kondo, K. Ishikawa, K. Takeda, S-Y. Kang, I. Sawada, M. Hori. Analysis of ArF Photoresist Modified by Fluorocarbon Ion Bombardment, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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S. Chen, Y. Nagoe, M. Nakai, K. Ishikawa, H. Kondo, H. Kano, K. Takeda, T. Tokuda, M. Sekine, M. Hori. Deep-Level Defect Passivation by High Density Hydrogen Radical Exposure on Ion Irradiated Si, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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H. Kuroda, H. Sugiura, H. Yamamoto, M. Ito, T. Ohta, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori. Measurement of Si Wafer Temperature with Metal Thin Film during Plasma Process Using Low-Coherence Interferometer, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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H. Watanabe, M. Hiramatsu, M. Hori. Control of Hydrophilic and Hydrophobic Properties of Carbon Nanowall by Plasma Surface Treatment, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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T. Nomura, M. Hiramatsu, M. Hori. Gas Flow Rate Ratio Denpendence of Deposition Profile of H-Assisited Plasma CVD Carbon Films in Trench Substrates, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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H. Shimoeda, Y. Miyawaki, K. Takeda, K. Ishikawa, H. Kondo, M. Hiramatsu, M. Sekine, M. Hori. Effect of Oxygen Etching on the Morphologies of Carbon Nanowalls, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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H. Mikuni, T. Kanda, S. Kondo, W. Takeuchi, K. Yamakawa, K. Takeda, K. Ishikawa, H. Kondo, M. Hiramastu, M. Sekine, M. Hori. Initial Nucleation in Carbon Nnowalls Growth on Si and SiO2 Surface, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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S. Kondo, K. Yasuda, H. Kondo, K. Ishikawa, M. Hiramatsu, M. Sekine, and M. Hori. Effect of Ion Irradiation on Carbon Nanowalls Growth, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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K. Mase, S. Mitsuguchi, S. Kondo, H. Kano, K. Ishikawa, H. Kondo, M. Hiramatsu, M. Sekine, M. Hori. Effect of Plasma Surface Treatments on Supporting of Platinum Nanoparticles to Graphite Materials in Supercritical Carbon Dioxide, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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S. Iseki, S. Uchida, S. Takashima, T. Ohta, M. Ito, Y. Higashijima, H. Kano, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori. Lpw-Temperature Treatment Using High-Density Non-Equilibrium Atmospheric of Pressure Plasma, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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Y. Matsudaira, H. Inui, H. Kano, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori. Synthesis of Amorphous Carbon Films using Nonequilibrium Atmosperic-Pressure Plasma, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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S. Kawashima, A. Yusuke, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori. Diagnostics in High Pressure SiH4/H2 Plasma for Deposition of Microcrystalline Si, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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K. Cho, K Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori. Hard X-ray Photoelectron Spectroscopy for Analysis of Plasma-Exposed Polymer Surface, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori. Combinatorial Analysis of Plasma Interactions with Soft Materials, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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K. Masuno, K. Tashiro, M. Hori, S. Kumagai, and M. Sasaki. Atmospheric Pressure Plasma for Localized Material Deposotion on IR Sensor, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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K. Ishikawa, K. Takeda, H. Kondo, M. Sekine, M. Hori. Siloxane Polymer Surface Modifications by Exposure of Plasma-Beams: A Vibrational Sum-Frequency Generation Spectroscopy (SFG) Study, 2nd International Symposium on Advance Plasma Science and its Application (ISPlasma2010), Meijo University, Nagoya Japan, March 7-10, 2010. (
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K. Yasuda, S. Kondo, K. Yamakawa, H. Kondo, M. Hiramatsu, M. Sekine, and M. Hori. In-situ Observations of growth processes of carbon nanowalls using spectroscopic ellipsometry, 3rd International Conference on PLAsma-Nano Technology and Science (IC-PLANTS2010), Meijo University, Nagoya Japan, March 11-12, 2010. (
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A. Malinowski, M. Hori, M. Sekine, H. Kondo, L. Lukasiak, A. Jakubowski, and D. Tomaszewski. Investigation of influence of Single Carbon Nano Wall structure on Field Effect Transistor electrical parameters and characteristics, 3rd International Conference on PLAsma-Nano Technology and Science (IC-PLANTS2010), Meijo University, Nagoya Japan, March 11-12, 2010. (
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H. Kondo, W. Takeuchi, S. Kondo, K. Yamakawa, M. Hiramatsu, M. Sekine, M. Hori. Synchrotron X-ray diffraction anlysis of carbon nanowalls synthesized by radical-injection plasma-enhanced chemical vapor deposition system, 3rd International Conference on PLAsma-Nano Technology and Science (IC-PLANTS2010), Meijo University, Nagoya Japan, March 11-12, 2010. (
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T. Hayashi, K. Ishikawa, M. Sekine, M. Hori, A. Kono, M. Suu. Dissociation channel of c-C4F8 to CF2 radical in reactive plasma, 3rd International Conference on PLAsma-Nano Technology and Science (IC-PLANTS2010), Meijo University, Nagoya Japan, March 11-12, 2010. (
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T. Kimura, T. Tamaguchi, K. Takeda, C. Koshimizu, M. Sekine, M. Hori. Investigation of VHF Capacitively Coupled Plasma with DC Bias for Low-k film, 3rd International Conference on PLAsma-Nano Technology and Science (IC-PLANTS2010), Meijo University, Nagoya Japan, March 11-12, 2010. (
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K. Ishikawa, N. Ebizuka, K. Takeda, H. Kondo, M. Sekine, M. Hori. Quasi-Bragg grating with sub-wavelength particles, 3rd International Conference on PLAsma-Nano Technology and Science (IC-PLANTS2010), Meijo University, Nagoya Japan, March 11-12, 2010. (
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K. Takenaka, Y. Setsuhara, K. Cho, M. Shiratani, M. Sekine, M. Hori. Analysis of Plasma Interactions with Soft Materials Using Combinatorial Plasma Process Analyzer, 3rd International Conference on PLAsma-Nano Technology and Science (IC-PLANTS2010), Meijo University, Nagoya Japan, March 11-12, 2010. (
)
C. S. Moon, K. Takeda, S. Takashima, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori. Surface Loss Probabilities of H, N Radicals in Afterglow Plasma, 3rd International Conference on PLAsma-Nano Technology and Science (IC-PLANTS2010), Meijo University, Nagoya Japan, March 11-12, 2010. (
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K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori. XPS Analysis of Plasma-Polymer Interactions for Organic-Inorganic Hybrid Materials, 3rd International Conference on PLAsma-Nano Technology and Science (IC-PLANTS2010), Meijo University, Nagoya Japan, March 11-12, 2010. (
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T. Nomura, Y. Korenaga, K. Koga, M. Shiratani, Y. Setsuhara, M. Sekine, M. Hori. Hα emission intensity measurements of H2+Ar+C7H8 plasmas in H-assisted plasma CVD reactor, 3rd International Conference on PLAsma-Nano Technology and Science (IC-PLANTS2010), Meijo University, Nagoya Japan, March 11-12, 2010. (
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Y. Setsuhara, K. Cho, K. Takenaka, M. Shiratani, M. Sekine, M. Hori. Combinatorial plasma-process analysis for research and development of nano devices, International Symposium on Technology Evolution for Silicon Nano-Electronics, Tokyo Institute of Technology, Tokyo, Japan, June 3-5, 2010. (
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T. Kino, H. Kondo, K. Ishikawa, M. Sekine, M. Hori. Control in optical properties of amorphous carbon films synthesized by plasma enhanced chemical vapor deposition for solar cell applications, International Symposium on Technology Evolution for Silicon Nano-Electronics, Tokyo Institute of Technology, Tokyo, Japan, June 3-5, 2010. (
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H. Shimoeda, Y. Miyawaki, K. Takeda, M. Hiramatsu, M. Sekine, M. Hori. Morphological modification of carbon nanowalls by oxygen plasma etching, International Symposium on Technology Evolution for Silicon Nano-Electronics, Tokyo Institute of Technology, Tokyo, Japan, June 3-5, 2010. (
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K. Yasuda, S. Kondo, K. Yamakawa, H. Kondo, M. Hiramatsu, M. Sekine, M. Hori. Real-time monitoring of vertical-growth of nanographenes by spectroscopic ellipsometry, International Symposium on Technology Evolution for Silicon Nano-Electronics, Tokyo Institute of Technology, Tokyo, Japan, June 3-5, 2010. (
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T. Kanda, H. Mikuni, K. Yamakawa, H. Kondo, M. Hiramatsu, M. Sekine, M. Hori. Bridging growth and electrical properties of single carbon nanowall, International Symposium on Technology Evolution for Silicon Nano-Electronics, Tokyo Institute of Technology, Tokyo, Japan, June 3-5, 2010. (
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M. Hori, H. Kondo, W. Takeuchi, K. Takeda, M. Hiramatsu. Controlled syntheses of carbon nanowalls for future electric device applications, International Symposium on Technology Evolution for Silicon Nano-Electronics, Tokyo Institute of Technology, Tokyo, Japan, June 3-5, 2010. (
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H. Kondo, W. Takeuchi, M. Hiramatsu, T. Kinoshita, T. Muro, S. Kimura, M. Hori. Analyses of crystalline and electronic structures of carbon nanowalls using synchrotron radiation light, International Symposium on Technology Evolution for Silicon Nano-Electronics, Tokyo Institute of Technology, Tokyo, Japan, June 3-5, 2010. (
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M. Hori. Surface Treatment of CFRP by an ultrahigh density low-temperature atmospheric pressure plasma, International Conference on Surface Treatments in the Aeronautical and Space Industries (SURFAIR), Casino Municipal, Biarritz, France, June 10-11, 2010. (
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T. Hiraoka, T. Ohta, M. Ito, N. Nishizawa, M. Hori. Measurement of silicon substrate temperature by optical lowcoherence interferometry using Super-Continuum light, 11th International Workshop on Advanced Plasma Processing and Diagnostics, Ramada Jeju Hotel, Jeju, Korea, July 8-9, 2010. (
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H. Yamamoto, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hori. Modification of Si-O-Si Structure in Porous SiOCH Films by O2 plasma, 11th International Workshop on Advanced Plasma Processing and Diagnostics, Ramada Jeju Hotel, Jeju, Korea, July 8-9, 2010. (
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H. Watanabe, K. Takeda, H. Kondo, M. Hiramatsu, M. Hori. Control of hydrophilic and hydrophobic properties of carbon nanowalls using plasma surface treatment, 11th International Workshop on Advanced Plasma Processing and Diagnostics, Ramada Jeju Hotel, Jeju, Korea, July 8-9, 2010. (
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M. Hori. Novel approach for the interpretation of etching characteristics based on internal parameters employing combinatorial plasma process, 20th ESCAMPIG, Master Congress Centre, Serbia, July 13-17, 2010. (
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A. Malinowski, W. Takeuchi, M. Sekine, K. Ishikawa, H. Kondo, T. Kanda, M. Hori, L. Lukasiak, A. Jakubowski. Performance Estimation of Carbon Nanowall-based Field Effect Transistor by 3D Simulation Study, 40th Solid-State Device Research Conference ESSDERC 2010, Seville, Spain, September 13-17, 2010. (
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A. Malinowski, L. Lukasiak, A. Jakubowski, D. Tomaszewski, M. Hori, M. Sekine, K. Ishikawa, H. Kondo, T. Suzuki. 3D TCAD Simulation Study of the Influence of Line-Width Roughness on FinFET Performance for the 22-nm technology node, 10th Conference "Electron Technology ELTE 2010", Wroclaw, Poland, September 22-25, 2010. (
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T. Kanda, H. Mikuni, K. Yamakawa, H. Kondo, M. Hiramatsu, M. Sekine, M. Hori. Bridging Growth and Electrical Properties of Single Carbon Nanowall, International Conference on Solid State Devices and Materials (SSDM), The University of Tokyo, Japan, September 23, 2010. (
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Shang Chen, Ryosuke Kometani, Kenji Ishikawa, Hiroki Kondo, Keigo Takeda, Hiroyuki Kano, Yutaka Tokuda, Makoto Sekine, Masaru Hori. Analysis of gallium nitride (GaN) surface interacted with chlorine etching plasma beams, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Keigo Takeda, Masaru Hori. Mechanism of Si Oxidation in H2/O2/Ar Surface Wave Plasma, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Hiroshi Yamamoto, Kohei Asano, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori. Modification of Si-O-Si Structure in Porous SiOCH Low-k Films with Ions, Radicals, and VUV Radiation in O2 Plasma, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Yusuke Abe, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Matoko Sekine, Masaru Hori. Measurement of surface loss probabilities of hydrogen radicals in plasma-enhanced Si CVD process for solar cell, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Hiroki Kondo, Wakana Takeuchi, Makoto Sekine, Masaru Hori, Mineo Hiramatsu, Ichio Hirosawa, Osami Sakata, Shigeru Sakata. Crystallographic analyses of carbon nanowalls using synchrotron X-ray, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Takehiro Hiraoka, Chishio Koshimizu, Takayuki Ohta, Masafumi Ito, Norihiko Nishizawa, Masaru Hori. High resolution measurement of silicon wafer temperature using super-continuum light on optical low-coherence interferometry, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Kenji Ishikawa, N. Sumi, A. Kono, H. Horibe, K. Takeda, H. Kondo, M. Sekine, M. Hori. In situ Electron Spin Resonance Study for Plasma-Surface interactions, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Fengdong Jia, Naoya Sumi, Kenji Ishikawa, Hiroyuki Kano, Hirotoshi Inui, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori. Time dependence measurement of electron density and temperature of a 60 Hz nonequilibrium atmospheric pressure plasma by laser Thomson scattering, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Masaru Hori, Hiroki Kondo, Shingo Kondo, Yudai Miyawaki, Hajime Sasaki, Mineo Hiramatsu. Morphological control of carbon nanowalls by reactive ion etching, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Takuya Takeuchi, Shinpei Amasaki, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda, Makoto Sekine, Masaru Hori, Ikuo Sawada, Song-Yun Kang. Study on modified surface layer of photoresist employing fluorocarbon ion beam and radicals, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori. Effects of Photoemissions in UV and VUV Regions on Nano-Surface Strucures of Soft Materials during Plasma Processes, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Yuichi Setsuhara, Ken Cho, Kosuke Takenaka, Masaharu Shiratani, Makoto Sekine, Masaru Hori. Investigation of Plasma Interactions with Soft Materials via Combinatorial Plasma-Process Analyzer for Plasma Nano Processes, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
)
Takayuki Ohta, Mari Inoue, Naoki Takota, Masufumi Ito, Masaru Hori. Formation mechanism of indium-zinc-oxide film using RF magnetron sputtering based on optical diagnostics of gas phase, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Minoru Sasaki, Hiroki Matsuyama, Shinya Kumagai, Masaru Hori. Atmospheric Pressure Micro Inductively Coupled Plasma Source with Floating Electrode, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Toshio Hayashi, K. Ishikawa, M. Sekine, M. Hori, A. Kono, K. Suu. Dissociation channels of c-C4F8 to CF2 radical in reactive plasma, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Takuya Nomura, Tatsuya Urakawa, Yuki Korenaga, Daisuke Yamashita, Hidefumi Matsuzaki, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, Masaru Hori. Plasma parameter measurements of Ar+H2+C7H8 plasmas in H-assisted plasma CVD reactor, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Mari Inoue, Takayuki Ohta, Naoki Takota, Masafumi Ito, Hiroyuki Kano, Koji Yamakawa, Masaru Hori. Density and translational temperature of Pb atom in the multi-Micro Hollow Cathode Lamp measured by diode laser absorption spectroscopy, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Takayuki Ohta, Takumi Mori, Masufumi Ito, Sachiko Iseki, Masaru Hori. Inactivation mechanism of \textit{Penicillium digitatum} spores by atmospheric pressure argon plasma, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Masaki Minami, Shigetaka Tomiya, Kenji Ishikawa, Ryosuke Matsumoto, Masanaga Fukasawa, Fumikatsu Uesawa, Masaru Hori, Tetsuya Tatsumi. Analysis of GaN damage induced by Cl2/SiCl4/Ar plasma, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Yohjiro Kawai, Yoshio Honda, Masahito Yamaguchi, Hiroshi Amano, Shang Chen, Hiroki Kondo, Mineo Hiramatsu, Masaru Hori. High growth rate of GaN homoepitaxy by molecular beam epitaxy using high density nitrogen radical source, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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Mineo Hiramatsu, Yuki Nihashi, Tomohiro Horaguchi, Masaru Hori. Growth of carbon nanowalls using inductively coupled plasma-enhanced chemical vapor deposition, 63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas, Paris, France, October 4-8, 2010. (
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S. Kawashima, A. Yusuke, T. Keigo, K. Ishikawa, H. Kondo, S. Makoto, M. Hori. High-speed growth and crystallinity control of microcrystalline silicon film employing hydrogen radical-injection plasma-enhanced chemical vapor deposition, 3rd International workshop on Thin Film Silicon Solar Cells, Nagasaki, Japan, October 11-14, 2010. (
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H. Yamamoto, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori, T. Imamura, H. Hayashi, I. Sakai, T. Ohiwa. Mechanism of Modification of in Si-O-Si Structure in Porous SiOCH Low-k Films by H2/N2 plasma, 57th International Symposium American Vacuum Society (AVS), Albuquerque CONVENTION CENTER, Albuquerque, USA, October 17-22, 2010. (
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T. Yamaguchi, K. Takeda, C. Koshimizu, H. Kondo, K. Ishikawa, M. Sekine, M. Hori. Highly selective etching of SiOCH over SiC films by Dual Frequency CCP with DC bias superimposed to upper electrode, 57th International Symposium American Vacuum Society (AVS), Albuquerque CONVENTION CENTER, Albuquerque, USA, October 17-22, 2010. (
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Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Kenji Ishikawa, Makoto Sekine, Hiroki Kondo, Azumi Ito, Masahiro Nakamura, and Masaru Hori. Mechanism of Highly Selective SiO2 Etching over Photoresist Using New Alternative Gas, C5HF7, 57th International Symposium American Vacuum Society (AVS), Albuquerque CONVENTION CENTER, Albuquerque, USA, October 17-22, 2010. (
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K. Ishikawa, K. Takeda, H. Kondo, M. Sekine, M. Hori. Polymer Surface Modification: Vibrational Sum Frequency Generation Study for Plasma Etching, 57th International Symposium American Vacuum Society (AVS), Albuquerque CONVENTION CENTER, Albuquerque, USA, October 17-22, 2010. (
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H. Yamamoto, Y. Miyawaki, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori, A. Ito, H. Matsumoto. Observation of 193-nm Photoresist Surface Exposed to Etching Plasma Employing C5HF7 Gas Chemistry, 32nd International Symposium on Dry Process (DPS), Tokyo Institute of Technology, Tokyo, Japan, November 11-12, 2010. (
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S. Amasaki, T. Takeuchi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, M. Hori, N. Sakurai, H. Hayashi, I. Sakai, T. Ohiwa. Investigation of Si Etch Reaction Induced by SF6/O2 Plasma, 32nd International Symposium on Dry Process (DPS), Tokyo Institute of Technology, Tokyo, Japan, November 11-12, 2010. (
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K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine, M. Hori. Effect of Photo-Irradiations in VUV and UV Regions on Chemical Bonding States of Polymers during Plasma Exposure, 32nd International Symposium on Dry Process (DPS), Tokyo Institute of Technology, Tokyo, Japan, November 11-12, 2010. (
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Y. Setsuhara, K. Takenaka, K. Cho, M. Shiratani, M. Sekine, M. Hori. Combinatiorial Analysis of Plasma-Polymer Interactions for Soft Material Processing, 32nd International Symposium on Dry Process (DPS), Tokyo Institute of Technology, Tokyo, Japan, November 11-12, 2010. (
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T. Horaguchi, Y. Nihashi, M. Hiramatsu, W. Takeuchi, T. Obayashi, H. Kondo, M. Hori. Enhancement of Electron Field Emission Properties of Carbon Nanowalls by N2 Plasma, 32nd International Symposium on Dry Process (DPS), Tokyo Institute of Technology, Tokyo, Japan, November 11-12, 2010. (
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T. Takeuchi, S. Amasaki, K. Takeda, K. Ishikawa, H. Kondo, H. Toyoda, M. Sekine, M. Hori, S. -Y. Kang, I. Sawada. Investigation of the Modified AeF Photoresist Surface during Fluorocarbon Plasma Etching Process, 32nd International Symposium on Dry Process (DPS), Tokyo Institute of Technology, Tokyo, Japan, November 11-12, 2010. (
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Y. Miyawaki, Y. Kondo, H. Yamamoto, A. Ito, H. Matsumoto, K. Takeda, H. Kondo, K. Ishikawa, T. Hayashi, M. Sekine, M. Hori. C5HF7 Chemistry for Highly Selective Etch of SiO2 over SiN and Si, 32nd International Symposium on Dry Process (DPS), Tokyo Institute of Technology, Tokyo, Japan, November 11-12, 2010. (
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Kenji Ishikawa, Makoto Sekine, Masaru Hori. In line Electron Spin Resonance Study of Plasma-Surface Interations for Plasma Etching, 3rd International Symposium of Plasma Center for Industrial Applications (PLACIA) and Plasma Application Monodzukuri(PLAM) on Activation of Manufacturing in Nagoya with Plasma Technology, Nagoya, Japan, November 17, 2010. (
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H. Kondo, M. Hori, M. Hiramatsu. Control Synthesis and Device Applications of Carbon Nanowalls Grown by Plasma-enhanced Chemical Vapor Deposition, 2010 KISE Fall Meetings and International Symposium, Korea, November 25-16, 2010. (
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