T. Goto (INVITED
) Measurements of SiH3 and SiH2 Radical Densities in RF Silane Plasmas Using Laser Spectroscopic Techniques, Materials research society, San Francisco, USA, April, 1993. CA-A2. 1, pp. 11
T. Goto (INVITED
) Laser Absoption Techniques Using Infrared Diode Lasers for Plasma Diagnostics, Laser - aided plsma diagnostics (LAPD), Bar Harbor, Maine, USA, October, 1993. pp. 219-224
General
M. Hori, K. Takahashi, and T. Goto. CF，CF2 and CF3 Radical Densities in On-off Modulated ECR-CHF3 Plasma, 46th Annual Gaseous Electronics Conference (GEC), Monreal, Canada, October, 1993. DB-12, pp. 18 (ORAL
)
A. Kono, M. Endo, and T. Goto. Measurement of Electron and Negative Ion Densities in a RF SF6 Plasma, 46th Annual Gaseous Electronics Conference (GEC), Monreal, Canada, October, 1993. DA-8, pp. 13 (ORAL
)
S. Watanabe, M. Ito, K. Hane, and T. Goto. Two-Directional Dynamic Mode Force Microscopy, International conference on scanning tunneling microscopy, Beijing, China, August, 1993. PO/FO16, p. 158 (ORAL
)
H. Furuhashi, Y. Uchida, E. Fuwa, and T. Goto. Time-Resolved Density Measurements of Excited Components in an ArF Excimer Laser, Conference on lasers and electro-opticcs, Baltimore, Maryland, USA, May, 1993. pp. 298-299 (ORAL
)
M. Hiramatsu, M. Nawata, T. Tanaka, and T. Goto. Reaction Rate Constant of the Si(3p2 1D2) Atoms with SiH4 Molecules in the RF Silane Plasma, IOPs annual physics congress, plasma physics, Brighton, UK, April 2, 1993. pp. 59 (ORAL
)
E. Fuwa, T. Goto, H. Furuhashi, and Y. Uchida. Absorption measurements of excited components in an ArF excimer laser, China-Japan International workshop on plasma tecnologies and applications, Taiwan, March, 1993. EP-93-16, pp. 145-152 (ORAL
)