K. Yamada, S. Kato, M. Hiramatsu, M. Nawata, M. Hori, and T. Goto. Effects of OH, H and CH3 Radicals on Diamond Film Formation Using a Parallel-Plate RF Plasma, Symposium on Diamond Electronics Devices, Osaka, Japan, March, 1996. p. 48 (
)
M. Hori, M. Inayoshi, T. Goto, and M. Hiramatsu. Surface Reaction of CF2 Radical in Fluorocarbon Plasma Etching Process, 189th Spring Meeting of The Electrochemical Society (ECS), Los Angels, USA, May, 1996. p. 229 (
)
K. Miyata, M. Ito, M. Hori, T. Goto, Y. Hayashi, and Y. Sakamoto. CF and CF2 Radical Chemistry in the Gaseous Phase of a Compact Permanent Magnet ECR Plasma Source, 189th Spring Meeting of The Electrochemical Society (ECS), Los Angels, USA, May, 1996. p. 298 (
)
M. Ito, R. Nozawa, H. Takeda, M. Hori, and T. Goto. Effects of Ions on Surface Morphology and Structures of Polycrystalline Silicon Films Prepared by Electron Cyclotron Resonance Silane/Hydrogen Plasmas, 189th Spring Meeting of The Electrochemical Society (ECS), Los Angels, USA, May, 1996. p. 324 (
)
B. P. Singh, K. Ieda, R. Nomura, M. Mori, T. Goto, Y. Uchida, and A. Miyauchi. Performance Characteristics of Amplitude-Modulated Harmonically Mode-Locked Er3+ Doped Fiber Ring Laser, IEEE Instrumentation and Measurement Technology Conference , Brussels, Belgium, Jun., 1996. pp. 144-149 (
)
S. Den, T. Kuno, K. Miyata, M. Ito, M. Hori, T. Goto, Y. Hayashi, and T. Goto. Diagnostics of Fluorocarbon Radicals in a Compact Permanent Magnet ECR etching Plasma, Digest of Papers of 9th International Microprocess Conference , Kitakyushu, Japan, July, 1996. pp. 30-31 (
)
M. Inayoshi, M. Hori, T. Goto, and M. Hiramatsu. High-Aspect-Ratio Ablation of Polytetrafluoroethylene by Synchrotron Radiation Irradiation, Digest of Papers of 9th International Microprocess Conference , Kitakyushu, Japan, July, 1996. pp. 74-75 (
)
T. Goto, and M. Hori. Radical Behavior in Fluorocarbon Plasma and Control of Silicon Oxide Etching by Injection of Radical, Digest of Papers of 9th International Microprocess Conference , Kitakyushu, Japan, July, 1996. pp. 24-25 (
)
R. Nozawa, H. Takeda, M. Ito, M. Hori, and T. Goto. Ion Bombardment Effects on Polycrystalline Silicon Formation in Electron Cyclotron Resonance SiH4/H2 Plasma Enhanced Chemical Vapor Deposition 3rd Asia-Pacific Conference on Plasma Science and Technology, Tokyo, Japan, July, 1996. (
)
A. Kawasaki, K. Ikai, M. Mori, T. Goto, and A. Miyauchi. Gain Grating Method to Control Bragg Wavelengths of Fiber Gratings Formed in Er-Doped Fibers with Holographic Method Optoelectronics and Communications Conference, Chiba, Japan, July, 1996. (
)
B. P. Singh, K. Ieda, R. Nomura, M. Mori, and T. Goto. Characteristics of Amplitude Modulated Harmonically Mode-Locked Er3+ Doped Fiber Ring Laser Optoelectronics and Communications Conference, Chiba, Japan, July, 1996. (
)
N. Nishizawa, M. Mori, T. Goto, and A. Miyauchi. Quadrature Squeezed Light Generation with Phase Tunable PBS Fiber Loop Mirror Optoelectronics and Communications Conference, Chiba, Japan, July, 1996. (
)
N. Nishizawa, M. Mori, T. Goto, and A. Miyauchi. A Simulation of Pulsed Squeezing in Short Optical Fiber Loop Mirror 3rd International Conference on Quantum Communication and Measurement, Hakone, Japan, September, 1996. (
)
K. Miyata, T. Kuno, M. Hori, and T. Goto. CFx(x=1-3) Radical Densities During SiO2, Si3N4 and Si Etching Employing ECR-CHF3 Plasma 43rd National Symposium of American Vacuum Society (AVS), Philadelphia, PA, USA, October, 1996. (
)
S. Den, T. Kuno, M. Hori, M. Ito, and T. Goto. Diagnostics of a Newly Developed 300mm Homogeneous Permanent Magnet ECR Plasma 43rd National Symposium of American Vacuum Society (AVS), Philadelphia, PA, USA, October, 1996. (
)
M. Ito, K. Murata, H. Ito, M. Hori, and T. Goto. STM/STS Characterization of Diamond Films Prepared by RF Plasma CVD with OH Radical Injection 43rd National Symposium of American Vacuum Society (AVS), Philadelphia, PA, USA, October, 1996. (
)
M. Hori, R. Nozawa, H. Takeda, M. Ito, and T. Goto. The Effects of Radicals on the Crystallinity of Polycrystalline Silicon Films Formed by Using ECR SiH4/H2 Plasma 43rd National Symposium of American Vacuum Society (AVS), Philadelphia, PA, USA, October, 1996. (
)
T. Goto, and M. Hori. Behaviors of CFx Radicals in ECR Fluorocarbon Plasmas and Control of SiO2 Etching by Radical Injection 49th Gaseous Electronics Conference (GEC), Argonne, Ill, USA, October, 1996. (
)
M. Ikeda, M. Ito, M. Hori, T. Goto, and H. Ito. Carbon Radical Measurement in Inductively Coupled CO Plasma 49th Gaseous Electronics Conference (GEC), Argonne, Ill, USA, October, 1996. (
)
Y. Yamamoto, S. Suganuma, M. Ito, M. Hori, and T. Goto. Behaviors of Si Atoms and SiHx+(x+0-3) Ions in ECR SiH4 Plasma 49th Gaseous Electronics Conference (GEC), Argonne, Ill, USA, October, 1996. (
)
K. Miyata, H. Arai, M. Hori, and T. Goto. Dissociation Processes of Fluorocarbon in ECR Etching Plasmas 49th Gaseous Electronics Conference (GEC), Argonne, Ill, USA, October, 1996. (
)
M. Ito, R. Nozawa, K. Murata, M. Hori, and T. Goto. The Roles of Plasma Species on Polycrystalline Silicon Film Formation by ECR SiH4/H2 Plasma 49th Gaseous Electronics Conference (GEC), Argonne, Ill, USA, October, 1996. (
)
M. Hori, R. Nozawa, H. Takeda, M. Nakamura, M. Ito, and T. Goto. In-situ Surface Diagnostics of a-Si:H Films During ECR-H2 Plasma Annealing 49th Gaseous Electronics Conference (GEC), Argonne, Ill, USA, October, 1996. (
)
T. Fujii, T. Yokoi, M. Hiramatsu, M. Nawata, M. Hori, T. Goto, and S. Hattori. Oxygen Radical Assisted Laser Evapolation of Polysiloxane for Preparation of Insulating Films with Low Dielecric Constant 49th Gaseous Electronics Conference (GEC), Argonne, Ill, USA, October, 1996. (
)
A. Kono, T. Hayashi, S. Hirose, and T. Goto. Measurement of Negative Ions in a RF NF3/Ar Plasma 49th Gaseous Electronics Conference (GEC), Argonne, Ill, USA, October, 1996. (
)
T. Goto, and A. Kono. Radical Measurements for RF and ECR Silane Plasmas Plasma Forum 1996 at Cheju, Cheju, Korea, November, 1996. (
)
R. Goto, K. Matsui, M. Mori, T. Goto, and A. Miyauchi. Source Wavelength Dependence of Modulation Frequency Responses of 1.55-micrometer DSB LD's Measured with Active Layer Photomixing Technique International Conference on Fiber Optics and Photonics (Photonics-96), Madras, India, December, 1996. (
)
M. Mori. Quadrature Squeezed Light Generation with a Fiber Ring Reflector International Conference on Fiber Optics and Photonics (Photonics-96), Madras, India, December, 1996. (
)