Invited talk

  1. M. Hori, T. Goto (INVITED )
    Silicon Oxide Selective Etching Process and its Plasma Chemistry Using Environmentally Benign Fluorocarbon Gases
    Proceedings of 4th International Workshop on Fluorocarbon Plasma, Col de Port, France, March, 2002

  2. M. Hori, K. Teii, T. Goto (INVITED )
    Diagnostics of Radicals and Formation of Microcrystalline Diamond in a Low-Pressure Inductively Coupled Plasma,
    Proceedings of the 9th International Symposium on Advanced Materials (ISAM), Tsukuba, Japan, March, 2002. pp. 39-40

  3. M. Hori (INVITED )
    Laser Diagnostics of Radical Density and Temperature in High-Density Processing Plasma
    International Workshop on State-of-the-art Plasma Diagnostics, Nagoya University, Nagoya, Japan, November, 2002



General

  1. H. Nagai, M. Hiramatsu, M. Hori, T. Goto.
    Behavior of Oxygen Atoms in High-Density Inductively Coupled O2 Plasma,
    Proceeding of Joint International Plasma Symposium of 6th APCPST, 15th SPSM, OS 2002 and 11th KAPRA, Jeju Lotte Hotel, Jeju Island, Korea, July 1-4, 2002. p. 155 ( )

  2. M. Hiramatsu, K. Kato, K. Ito, H. Nagai, M. Hori, T. Goto.
    C2 Radical Density in Microwave CH4/H2 Plasma Used for Diamond Growth,
    Proceeding of Joint International Plasma Symposium of 6th APCPST, 15th SPSM, OS 2002 and 11th KAPRA, Jeju Lotte Hotel, Jeju Island, Korea, July 1-4, 2002. p. 156 ( )

  3. M. Hori, H. Nagai, M. Hiramatsu, T. Goto.
    Gas Phase and Subsurface Reactions in Organic Low-k Films Etching and Insights into Etching Mechanism Using Mult i-Beams,
    Proceeding of ESCAMPIG 16th and ICRP 5th joint conference, World Trade Center, Grenoble, France, July 14-18, 2002. vol.1 p. 27 ( )

  4. T. Ohta, K. Hara. M. Hori, T. Goto, M. Ito, S. Kawakami, N. Ishii.
    Monitoring of F, Si, SiFx(x=1-2) and SiF4 molecule in RF60MHz parallel-plate capasitively coupled plasma employing SiF4,
    Proceeding of ESCAMPIG 16th and ICRP 5th joint conference, World Trade Center, Grenoble, France, July 14-18, 2002. vol.1 p. 115 ( )

  5. M. Hiramatsu, K. Ito, K. Kato, C. H. Lau, J. S. Foord, M. Hori, H. Nagai, T. Goto.
    Fabrication of Vertically Aligned Carbon Nanotubulated Fibers by Microwave Plasma-Enhanced Chemical Vapor Deposi tion with Acetylene/Hydrogen,
    Proceeding of ESCAMPIG 16th and ICRP 5th joint conference, World Trade Center, Grenoble, France, July 12-18, 2002. vol.1 p. 189 ( )

  6. M. Ito, T. Kawanabe, T. Shiina, Y. Okamura, H. Nagai, M. Hori, T. Goto .
    Silicon Oxide Etching Process Using Electron Beam Exited CF4/Ar Plasmas,
    Proceeding of ESCAMPIG 16th and ICRP 5th joint conference, World Trade Center, Grenoble, France, July 14-18, 2002. vol.1 p. 195 ( )

  7. D. Kikukawa, K. Honma, S. Den, M. Hori, T. Goto.
    Formation of Microcrystalline Silicon Thin Films in Low-Pressure Microwave Plasma Employing H2 Diluted SiH4 and SiF4 Gases,
    Proceeding of ESCAMPIG 16th and ICRP 5th joint conference, World Trade Center, Grenoble, France, July 14-18, 2002. vol.1 p. 203 ( )

  8. M. Hiramatsu, K. Kato, K. Ito, C. H. Lau, J. S. Forrd, M. Hori, T. Goto.
    Correlation between Nanocrystalline Diamond Growth and C2 Radical Density in Microwave CH4/H2 Plasma,
    Proceeding of ESCAMPIG 16th and ICRP 5th joint conference, World Trade Center, Grenoble, France, July 14-18, 2002. vol.2 p. 135 ( )

  9. K. Teii, H. Funakoshi, S. Takashima, M. Hori, T. Goto.
    Detection of H, CH3, and Ionic Species in a Low-Pressure Inductively Coupled Plasma for Diamond chemical-Vapor deposition,
    Proceeding of ESCAMPIG 16th and ICRP 5th joint conference, World Trade Center, Grenoble, France, July 14-18, 2002. vol.2 p. 161 ( )

  10. K. Teii, H. Funakoshi, S. Takashima, M. Hori, T. Goto.
    Detection of H, CH3 and Ionic Species in a Low-Pressure Plasma for Nanocrystalline Diamond Growth,
    13th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide, Granada Conference and Exhibition Centre, Granada, Spain, September 8-13, 2002. 0501 31 ( )

  11. H. Nagai, M. Hiramatsu, M. Hori, T. Goto.
    Etching of Organic Low k Dielectric, Their Gas Phase and Subsurface Reactions in Ultra High Frequency Plasma,
    Proceedings of the 2002 International Conference on Solid State Devices and Materials, Nagoya Congress C enter, Nagoya, Japan, September 17-19, 2002. p. 176 ( )

  12. M. Hori, M. Hiramatsu, T. Goto.
    Fabrication of Carbon Whisker, Pyramid and Steeple Using a Novel plasma CVD and Their Application to Field Elect ron Emitter,
    Proceedings of the 2002 International Conference on Solid State Devices and Materials, Nagoya Congress C enter, Nagoya, Japan, September 17-19, 2002. p. 560 ( )

  13. T. Ohta, T. Ishida, M. Hori, T. Goto, M. Ito, S. Kawakami, N. Ishii.
    Behaviors of Si, SiF, Capasitively Coupled SiF4 Plasma,
    24th International Symposium on Dry Process (DPS), Tokyo University, Tokyo, Japan, October 10-11, 2002. pp. 45-50 ( )

  14. H. Nagai, M. Hiramatsu, M. Hori, T. Goto.
    Detection of Oxygen Atom Density in Inductively Coupled Plasma by Vacuum Ultraviolet Absorption Spectroscopy,
    24th International Symposium on Dry Process (DPS), Tokyo University, Tokyo, Japan, October 10-11, 2002. pp. 51-56 ( )

  15. M. Hori, H. Nagai, M. Hiramatsu, T. Goto.
    Multi-Layered SiOCH Films with Low Dielectric Constant Fabricated Employing Layer-by-Layer Process of Plasma Enh anced Chemical Vapor Deposition and Oxidation,
    24th International Symposium on Dry Process (DPS), Tokyo University, Tokyo, Japan, October 10-11, 2002. pp. 119-124 ( )

  16. M. Nagai, A. Matsushita, K. Yamakawa, M. Hiramatsu, M. Hori, T. Goto.
    Development of cw Non-Equilibrium Microwave-Excited Atmospheric Discharge System and its Application to Carbon Nanostructure Fabrication,
    24th International Symposium on Dry Process (DPS), Tokyo University, Tokyo, Japan, October 10-11, 2002. pp. 233-238 ( )

  17. H. Shoyama, Y. Dake, T. Mori, H. Nagai, M. Hori, T. Hara.
    Surface Nitriding of a Tool Steel by Electron Beam Excited Plasma,
    24th International Symposium on Dry Process (DPS), Tokyo University, Tokyo, Japan, October 10-11, 2002. pp. 155-158 ( )

  18. M. Hori, T. Ohta, K. Hara, T. Goto, M. Ito, S. Kawakami, N. Ishii.
    Kinetics of SiFx(x=0-2) and SiF4 Molecule in RF 60MHz Parallel-plate Capacitively Coupled Plasma Employing SiF4
    55th Annual Gaseous Electronics Conference (GEC), University of Minnesota, Minneapolis, Minnesota, USA, October 15-18, 2002. ( )

  19. H. Nagai, M. Hori, T. Goto, M. Hiramatsu, S. Takashima.
    Diagnostics of O Atoms in Inductively Coupled O2 Plasma Employing Vacuum Ultraviolet Absorption Spectroscopy,
    55th Annual Gaseous Electronics Conference (GEC), University of Minnesota, Minneapolis, Minnesota, USA, October 15-18, 2002.   ( )

  20. M. Nagai, M. Hori, T. Goto.
    Silicon Oxide Highly Selective Etching Using Novel Solid Gas Sources
    49th International Symposium American Vacuum Society (AVS), Colorado Convention Center, Denver, Colorado, USA, November 3-8, 2002. ( )

  21. M. Hori, H. Nagai, M. Hiramatsu, T. Goto.
    Etching Reaction Mechanism of Organic Low-k Dielectric Employing High-Density Plasmas and Multi-Beams
    49th International Symposium American Vacuum Society (AVS), Colorado Convention Center, Denver, Colorado, USA, November 3-8, 2002. ( )

  22. M. Matsutani, N. Hori, M. Hori, T. Goto, T. Tsukada.
    Temporal Control of Radicals for High Crystallinity of Microcrystalline Silicon Films in UHF SiH4/H2 Pulse-Modulated Plasma CVD,
    Proceedings of 2002 International Microprocesses and Nanotechnology Conference, Tokyo Fashion Town, Tokyo, Japan, November 6-8, 2002. pp. 224-225 ( )

  23. A. Matsushita, M. Nagai, K. Yamakawa, M. Hori, T. Goto.
    Fabrication of Carbon Nanostructure Using Non-Equilibrium Microwave Excited Atmospheric Plasma,
    Proceedings of International Symposium on Microwave Science and Its Application to Related Fields, Naraken-Shinkokaido, Nara, Japan, November 21-23, 2002. pp. 126-127 ( )

  24. M. Nagai, K. Yamakawa, M. Hori, T. Goto, M. Ito.
    Fabrication of Carbon Micro-ball Using Non-Equilibrium Microwave Excited Atmospheric Plasma,
    Proceedings of International Symposium on Microwave Science and Its Application to Related Fields, Naraken-Shinkokaido, Nara, Japan, November 21-23, 2002. pp. 128-129 ( )

  25. M. Hori, M. Hiramatsu.
    Fabrication of Diamond Using Microwave Excited Plasma and Measurement of Radicals,
    Proceedings of International Symposium on Microwave Science and Its Application to Related Fields, Naraken-Shinkokaido, Nara, Japan, November 21-23, 2002. pp. 128-129 ( )

  26. D. Kikukawa, K. Honma, M. Yamamoto, M. Hori, T. Goto, M. Ito, S. Den.
    Generation of Low Pressure Microwave Excited Plasma and It s Application to Microcrystalline Silicon Thin Film F ormation,
    Proceedings of International Symposium on Microwave Science and Its Application to Related Fields, Naraken-Shinkokaido, Nara, Japan, November 21-23, 2002. pp. 136-137 ( )

  27. K. Yamakawa, M. Hori, T. Goto, S. Den, T. Katagiri.
    High-speed Etching Process Using Non-equilibrium Microwave Excited Atmospheric Plasma,
    Proceedings of International Symposium on Microwave Science and Its Application to Related Fields, Naraken-Shinkokaido, Nara, Japan, November 21-23, 2002. pp. 142-143 ( )