M. Hori (INVITED
) Development of a New Etching System with PFC Zero-Emission Using Solid Source of PFC and Atmospheric plasma-Synthesis of PFC in Exhaust Gases EU-JPN Joint Symposium on Plasma Processing, Stockholm, Sweden, July, 2003
M. Hori (INVITED
) Gas Phase and Subsurface Reactions of Radicals for Smart Nanoprocessing, 4th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2003), Jeju, Korea, September-October, 2003. p. 41
M. Hori, T. Goto, and M. Hiramatsu (INVITED
) Smart Nanoprocess for Plasma Induced Nanofabrication, 8th IUMRS International Conference on Advanced Materials, Yokohama, Japan, October, 2003. p. 49
M. Hori (INVITED
) Smart Nanoprocess for Organic Low-k Film Etching 50th International Symposium American Vacuum Society (AVS), Baltimore, USA, November, 2003
General
K. Yamakawa, M. Hori, T. Goto, S. Den, and Toshiro Katagiri. SiO2 Dry Etching Using Non-Equilibrium Atmospheric Pressure Micro-Plasma, Proceedings of the 3rd International Workshop on Basic Aspect of Non-Equilibrium Plasma Interacting with Surface (BANPIS-2003), Awajishima, Hyogo, Japan, February, 2003. p. 45 (
)
M. Hori, S. Ikuma, Hisao Nagai, M. Ito, and T. Goto. Measurement of Absolute Densities of H, N and O Radicals Employing Vacuum Ultraviolet Absorption Spectroscopy with Micro-Plasma as a Light Source, Proceedings of the 3rd International Workshop on Basic Aspect of Non-Equilibrium Plasma Interacting with Surface (BANPIS-2003), Awajishima, Hyogo, Japan, February, 2003. p. 44 (
)
Akio Matsushita, Mikio Nagai, K. Yamakawa M. Hiramatsu, Akira Sakai, M. Hori, and T. Goto. Synthesis of Carbon Nanostructure Using Microwave Excited Non-Equilibrium Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition, Proceedings of 16th International Symposium on Plasma Chemistry, Taormina, Italy, June, 2003. p. 809 (
)
Mikio Nagai, K. Yamakawa M. Ito, M. Hori, and T. Goto. Novel Abatement of PPFCs Using Microwave Excited Non-Equilibrium Atmospheric Pressure Plasma, Proceedings of 16th International Symposium on Plasma Chemistry, Taormina, Italy, June, 2003. p. 813 (
)
K. Yamakawa, S. Den, T. Katagiri, and Tosho Goto. Ultrahigh Rate Etching of SiO2 Film Employing Microwave Excited Non-Equilibrium Atmospheric Pressure Plasma, Proceedings of 16th International Symposium on Plasma Chemistry, Taormina, Italy, June, 2003. p. 832 (
)
M. Ito, Takayuki Kawabe, Tatsuo Shiina, Yasuyuki Okamura, Hisao Nagai, M. Hori, and T. Goto. Diagnostics of Electron Beam Excited CF4/Ar Plasmas for Silicon Oxide Etching, Proceedings of 16th International Symposium on Plasma Chemistry, Taormina, Italy, June, 2003. p. 367 (
)
Takayuki Ohta, Tetsuro Ishida, M. Hori, T. Goto, M. Ito, Satoshi Kawami, and Nobuo Ishii. The Behavior of Si Atom in Capacitively Coupled VHF Plasma Employing SiF4, Proceedings of XXVI International Conference on Phenomena in Ionized Gases, Greifswald, Germany, July, 2003. Vol. 3, pp. 171-172 (
)
M. Hiramatsu, Kenichi Shiji, Hiroshi Amano, and M. Hori. Carbon Nanowalls Grown Using RF Fluorocarbon Plasma with H Radical injection Nanotechnology in Carbon Related Materials, Brighton, UK, August, 2003. (
)
M. Hiramatsu, Masaki Taniguchi , Yoshinori Ando, and M. Hori. Fabrication of Aligned Carbon Nanotubes and Nanofibers Using Microwave Plasma-Enhanced CVD 14th European Conference on Diamond, Diamond-like Materials, Carbon Nanotubes, Nitrides and Silicon Carbide, Salzburg, Austria, September, 2003. (
)
M. Hiramatsu, Kenichi Shiji, Hiroshi Amano, and M. Hori . Vertical Growth of Carbon Nanowalls Using RF Plasma CVD Assisted by H Radical Injection 37th IUVSTA Workshop on Plasma Deposition of Advanced Materials, Kerkrade, the Netherlands, September, 2003. (
)
M. Hiramatsu, Kenichi Shiji, Hiroshi Amano, Yoshinori Ando, and M. Hori. Fabrication of Two-Dimensional Carbon Nanostructure Using Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition, International Conference on Solid State Devices and Materials, Tokyo, Japan, September, 2003. pp. 842-843 (
)
M. Hori, and Haroon Ahmed. Surface Assemblies of Gold Nanodots Using Retarding-Field Ion Beam Deposition, 8th IUMRS International Conference on Advanced Materials, Yokohama, Japan, October, 2003. p. 46 (
)
KoI. Honma, Masahiro Yamamoto, M. Hori, and T. Goto. Precisely Controlling of Crystalline Orientation in Microcrystalline Silicon Thin Film by Pulse Modulated Microwave Plasma with SiF4 Addition, 8th IUMRS International Conference on Advanced Materials, Yokohama, Japan, October, 2003. p. 52 (
)
Mikio Nagai, M. Hori, and T. Goto. Fabrication of Spherical-Shaped Particles Using Atmospheric Micro-Gap Plasma with Microwave Excitation, 8th IUMRS International Conference on Advanced Materials, Yokohama, Japan, October, 2003. p. 46 (
)
M. Hori, S. Ikuma, and T. Goto. Effect of Kr Gas Dilution on O Atom Density in Inductively Coupled Kr/O2 Plasma 56th Annual Gaseous Electronics Conference (GEC), San Francisco, USA, October, 2003. (
)
KoI. Honma, Masahiro Yamamoto, M. Hori, and T. Goto. Microcrystalline Silicon Thin Film Formation Using Pulse Modulated Microwave Plasma 2003 International Microprocess and Nanotechnology Conference, Tokyo, Japan, October-November, 2003. (
)
M. Ito, K. Takeda, Y. Tomekawa, M. Iwaki, T. Shiina, Y. Okamura, K. Yamakawa, M. Hori, and T. Goto. Silicon Dioxide Etching Process Employing Electron Beam Excited plasmas 50th International Symposium American Vacuum Society (AVS), Baltimore, USA, November, 2003. (
)
K. Shiji, M. Hiramatsu, T. Kadoya, H. Amano, Y. Ando, and M. Hori. Fabrication of Carbon Nanowalls Using RF Plasma-Enhancement Chemical Vapor Deposition Assisted by Hydrogen Radical Injection 50th International Symposium American Vacuum Society (AVS), Baltimore, USA, November, 2003. (
)
M. Taniguchi, M. Hiramatsu, Y. Ando, and M. Hori. Preparation of Self-Assembled Carbon Nano-Ropes and Carbon Nanotubes Using Microwave Plasma-Enhanced Chemical Vapor Deposition 50th International Symposium American Vacuum Society (AVS), Baltimore, USA, November, 2003. (
)