Invited talk

  1. Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroaki Kajiyama, Shinya Toyokuni, and Masaru Hori (KEYNOTE )
    Low-temperature plasma technology for the next-generation biological applications
    The 2nd Global Forum and International Conference on Industrial Plasma Processes and Diagnostics 2025 (IPPD 2025), Delhi, India, 2025.05.19

  2. Kenji Ishikawa (PLENARY )
    Plasma-driven Sciences: Dynamics and transports of biochemically reactive species
    5th International Workshop on Plasma Agriculture Ensuring Productivity, Food Safety & Environmental Sustainability, Pennsylvania, USA, 2025.06.11

  3. Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori, Kenji Ishikawa (INVITED )
    In-Situ Observation of Surface Reaction and Advanced Process for Damage-Less Atomic Layer Etching
    AVS 25th International Conference on Atomic Layer Deposition (ALD 2025), Jeju-do, South Korea, 2025.06.25

  4. Hori, Ito, Miron, Tanaka (INVITED )
    Challenge in the Creation of Non-equilibrium Medicinal Chemistry
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.27

  5. Shih-Nan Hsiao, Masaru Hori (INVITED )
    Novel Synergistic Reactions during Cryogenic HF plasma Etching for Advanced Semiconductor Device Processing
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.26

  6. Nikolay Britun (INVITED )
    Short Course: Plasma Diagnostics and in-situ Surface Characterizations (Non-intrusive spectroscopy for low-temperature plasma characterization)
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.25

  7. Shih-Nan Hsiao (INVITED )
    Short Course: Plasma Diagnostics and in-situ Surface Characterizations
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.25

  8. Noriyasu Ohno, Hirohiko Tanaka, Ryoji Mano, Yuta Uematsu, Hinata Akaho, Hiroki Natsume, Shin Kajita, Keiji Sawada (KEYNOTE )
    Investigation of Spatiotemporal Behaviors in Detached Recombing Plasmas Using a Linear High-Density Plasma Simulator
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.28

  9. Camelia Miron, Luminita Marin, Taishi Yamakawa, Ryo Wakatsukasa, Koki Ono, Kotaro Sato, Shinya Toyokuni, Masaru Hori, Hiromasa Tanaka (INVITED )
    Cold atmospheric pressure plasma-treated liquids and formulations for cancer treatment
    APiP2025, Tokyo, Japan, 2025.07.23

  10. S. Nunomura, T. TsutsumiandM. Hori (INVITED )
    Radical, ion, and photon’s effects on material damage in plasma etching
    9th Asia-Pacific Conference on Plasma Physics, Fukuoka, Japan, 2025.09.23

  11. Kenji Ishikawa (KEYNOTE )
    Advancing Earth resilience through plasma-driven science : Exploring new frontiers in biochemistry and agricultural Innovation
    ISPB2025, Jeju, Korea, 2025.08.23

  12. Nikolay BRITUN (INVITED )
    Emission and absorption-based plasma diagnostic techniques for number density detection: Basics and Examples
    9th Asia-Pacific Conference on Plasma Physics, Fukuoka, Japan, 2025.09.23

  13. Hiromasa Tanaka, and Masaru Hori (KEYNOTE )
    Development of Plasma-Activated Solutions for Future Medicine
    18th International Conference on Plasma Science and Applications (ICPSA 2025), Xi’an, Shaanxi, China, 2025.10.17

  14. T. Kondo, K. Yasuda, J. Kumagai#, K. Inoue, H. Hashizume, H. Tanaka, K. Ishikawa, and M. Hori (PLENARY )
    Free Radical Formation Induced by Ultrasound. Comparisons with Low-temperature Plasma and Ionizing Radiation
    6th Meeting of the Asia-Oceania Sonochemical Society (AOSS-6, 2025) in conjunction with 34th Annual Meeting of the Japan Society of Sonochemistry (2nd Circular), Kawasaki, Japan, 2025.12.05

  15. Kenji Ishikawa, Tran Trung Nguyen, Kazunori Miwa, Kenichi Inoue, Takayoshi TsutsumiandThi-Thuy-Nga Nguyen (INVITED )
    Science-based, data-driven developments in atomically scale controls of plasma processing technologies
    iPlasmaNano2025, Karatsu, Japan, 2025.09.17

  16. T. Tsutsumi, T. Kurushima, M. Sekine, M. Hori, and K. Ishikawa (INVITED )
    Transport mechanism of active species in high-aspect-ratio hole during plasma etching
    9th Asia-Pacific Conference on Plasma Physics, Fukuoka, Japan, 2025.09.23

  17. Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Camelia Miron, Kae Nakamura, Hiroshi Hashizume, Hiroaki Kajiyama, Shinya Toyokuni, and Masaru Hori (INVITED )
    Unraveling the Biological Effects of Plasma-Activated Solutions: From Basic Science to Applications
    9th Asia-Pacific Conference on Plasma Physics, Fukuoka, Japan, 2025.09.23

  18. Hori (KEYNOTE )
    Exploring Plasma Science through Thin Film Technology and Manufacturing Innovation
    TACT2025, Taipei, Taiwan, 2025.10.27

  19. Kenji Ishikawa (INVITED )
    Leading edge semiconductor plasma processing with energy-efficient, environmentally benign, evolutionary, and educational (E4) assurance
    TACT2025, Taipei, Taiwan, 2025.10.27

  20. Shih-Nan Hsiao, Pak-Man Yiu, Li-Chun Chang, Jyh-Wei Lee, Makoto Sekine, and Masaru Hori (INVITED )
    Anisotropic Atomic Layer Etching of HfO2 at Room Temperature using Halogen- Free Plasmas
    TACT2025, Taipei, Taiwan, 2025.10.27

  21. Kenji Ishikawa (INVITED )
    Recent Advances In PlasmaProcessing For Leading-edge Semiconductor Fabrication
    AEPSE, Phuket, Tailand, 2025.11.06

  22. Kenji Ishikawa, Tran Trung Nguyen, Kazunori Miwa, Kenichi Inoue, Takayoshi TsutsumiandThi-Thuy-Nga Nguyen (INVITED )
    Science-Based, Data-Driven Plasma Process Development
    AEPSE, Phuket, Tailand, 2025.11.05

  23. Hiroshi Hashizume, Hidemi Kitano, Hiroko Mizuno, Akiko Abe, Yuko Katsumata, Shih-Nan Hsiao, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Shogo Matsumoto, Hitoshi Sakakibara, Eisuke Kita, Yoji Hirosue, Naoto Miyashita, Masayoshi Maeshima, Kuniaki Saito, Masaaki Mizuno, Masaru Hori (INVITED )
    Effectiveness of cold plasma for rice cultivation at various growth stages
    9th Asia-Pacific Conference on Plasma Physics, Fukuoka, Japan, 2025.09.21

  24. Shih-Nan Hsiao (PLENARY )
    Advances in Etching Technologies for Next Generation Semiconductor Manufacturing Towards Sustainable Development Goals
    KISM 2025 BUSAN, Busan, Korea, 2025.11.13

  25. Thi-Thuy-Nga Nguyen (INVITED )
    Nonhalogen Etching for Hard-to-Etch Materials: A Concept Developed from Wet-like Plasma Technology for Semiconductor Device Fabrication
    KISM 2025 BUSAN, Busan, Korea, 2025.11.11

  26. C. Miron, L. Marin, M. Iftime, K. Inoue, R. Wakatsukasa, K. Ishikawa, S. Toyokuni, M. Hori, H. Tanaka (INVITED )
    Cold atmospheric plasma-activated liquid-based drug delivery systems for cancer treatment
    ICPAM-17&PAMS-8, Shizuoka, Japan, 2025.11.17

  27. H. Tanaka, M. Mizuno, C. Miron, K. Ishikawa, K. Nakamura, H. Kajiyama, S. Toyokuni, M. Hori (PLENARY )
    Plasma-activated Solutions for Biomaterials and Healthcare Applications
    ICPAM-17&PAMS-8, Shizuoka, Japan, 2025.11.18

  28. Takayoshi TSUTSUMI, Makoto SEKINE, Masaru HORI, Kenji ISHIKAWA (KEYNOTE )
    Interaction between Neutral species and Surface in the High-Aspect-Ratio Hole
    The 35th Annual Meeting of MRS-J, Kitakyushu, Japan, 2025.11.11

  29. Kenji Ishikawa, Tran Trung Nguyen, Kazunori Miwa, Kenichi Inoue, Takayoshi TsutsumiandThi-Thuy-Nga Nguyen (KEYNOTE )
    Science-based, data-driven developments in atomically scale controls of plasma processing technologies
    MNC2025, Tokyo, Japan, ×

  30. Kenji Ishikawa (INVITED )
    Frontiers of Plasma-driven Biochemistry
    Materials Research Meeting 2025 (MRM2025), Yokohama, Japan, 2025.12.12

  31. Shih-Nan Hsiao Nagoya Univ. (Japan) Yusuke Imai Nagoya Univ. (Japan) Makoto Sekine Nagoya Univ. (Japan) Ryutaro Suda Tokyo Electron Miyagi Ltd. (Japan) Yoshihide Kihara Tokyo Electron Miyagi Ltd. (Japan) Masaru Hori Nagoya Univ. (Japan) (INVITED )
    Overview of etching mechanism in cryogenic HF plasmas for SiO2 and SiN
    SPIE Advanced Lithography + Patterning, San Jose, California, US, 2026.02.24

  32. Kenji Ishikawa (INVITED )
    Pioneer of Plasma Interactions with Biological and Organic Liquids: In Memory of Professor William “Bill” Graham (1949–2025)
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.03

  33. Shih-Nan Hsiao, Makoto Sekine, Yoshihide Kihara, Ryutaro Suda, Masaru Hori (INVITED )
    Cryogenic Atomic-Layer Processes Using Synergetic Reaction between HF and Plasma
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04

  34. Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Mineo Hiramatsu (INVITED)
    Study on synthesis of functional graphene nanocomposites by gas-liquid interfacial plasma
    The 35th Annual Meeting of MRS-J, Kitakyushu, Japan, 2025.11.10



General

  1. Takashi Kondo, Jun Kumagai, Ryoichi Hirayama, Kenichi Inoue Hiroshi Hashizume, Hiromasa Tanaka, Kenji Ishikawa, Masaru Hori.
    Free radical generation by low-temperature He-plasma in aqueous solutions of nucleic acid bases and nucleosides: an ESR and spin-trapping study
    The 68th Annual Meeting of the Japanese Radiation Research Society The 6th Asian Congress of Radiation Research (JRRS/ACRR2025), Hiroshima, Japan, 2025.10.24.25. (POSTER )

  2. Trung-Nguyen Tran, Hiroshi Iwayama, Toshio Hayashi, Ken-ichi Inoue, Takayoshi Tsutsumi, and Kenji Ishikawa.
    Fragmentation of valence electronic states of C3HF5 studied by photoelectron photoion coincidence (PEPICO) techniques Trung-
    ISPC - 26th International Symposium on Plasma Chemistry, Minneapolis, USA, 2025.06.16. (ORAL )

  3. L. Du, C. Miron, T. Motooka, M. Hori, M. Mizuno, S. Toyokuni, H. Kajiyama, and H. Tanaka.
    Mechanism investigation of low-temperature plasma selective killing effect on human breast cancer cell
    ISPC - 26th International Symposium on Plasma Chemistry, Minneapolis, USA, 2025.06.19. (POSTER )

  4. Airah Osonio, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori.
    Defect-Assisted Radical Adsorption in Plasma-driven Atomic Layer Etching of Silicon Dioxide
    ISPC - 26th International Symposium on Plasma Chemistry, Minneapolis, USA, 2025.06.16. (POSTER )

  5. Yusuke Imai, Takayoshi Tsutsumi, Kenichi Inoue, Shih-Nan Hsiao, Makoto Sekine, Kenji Ishikawa.
    Estimation of HF gas temperature in low temperature plasma using infrared absorption spectroscopy
    ISPC - 26th International Symposium on Plasma Chemistry, Minneapolis, USA, 2025.06.16. (POSTER )

  6. Shih-Nan Hsiao, Makoto Sekine, Nagoya University, Japan; Yoshihide Kihara, Tokyo Electron Miyagi Limited, Japan; Masaru Hori, Nagoya University, Japan.
    Cryogenic Atomic Layer Etching of SiO2 by Physisorption of HF/C2H5OH and Ar Plasmas
    AVS 25th International Conference on Atomic Layer Deposition (ALD 2025), Jeju-do, South Korea, 2025.06.25. (ORAL )

  7. Shunya Hirai, Kazunori Shinoda, Thi-Thuy-Nga Nguyen, Kenichi Inoue, Takayoshi Tsutsumi, and Kenji Ishikawa.
    Mechanism of plasma chlorination on TiN surface during atomic layer etching using in-situ surface analysis
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.25. (ORAL )

  8. Makoto Sekine.
    Cryogenic Atomic Layer Etching of dielectrics by HF/C2H5OH gases and Ar plasma
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.26. (POSTER )

  9. Kenji Ishikawa.
    Elucidation of Primary Dissociation Mechanisms of Hydrofluorocarbons based on Photoelectron-photoion coincidence (PEPICO) measurements
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.26. (POSTER )

  10. Yusaku Hayashi, Nobukazu Ikeda, Masaru Hori, Kenji Ishikawa, Kei Hattori.
    Modification of surface of the SUS316 employing atmospheric pressure plasma
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.26. (ORAL )

  11. Nikolay Britun, Pierre Mathieu, Masaru Hori.
    Benefits of using burst ns-pulsed plasmas for enhanced radical production
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.26. (ORAL )

  12. Michael K. T. Mo, S.-N. Hsiao, M. Sekine, M. Hori, N. Britun.
    The effect of SiN substrate cooling on radical species density during CF4/H2 etching
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.26. (ORAL )

  13. Chieh-Ju Liao.
    Advancing Plasma Science: cLPS as a Bridge Between Academia and Industry for Sustainable Plasma Technologies
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.26. (POSTER )

  14. Koki Ono, Ayako Tanaka, Kenji Ishikawa, Wakana Takeuchi, Kenichi Uehara, Shigeo Yasuhara, Masaru Hori, and Hiromasa Tanaka.
    Impact of electrical stimulation and wall thickness variation on the differentiation potential of human mesenchymal stem cells cultured on SiC-coated CNWs
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.25. (ORAL )

  15. Taishi Yamakawa, Kenichi Inoue, Masaru Hori, Kenji Ishikawa, Hiromasa Tanaka.
    Elucidation of long-term nitric oxide radical production in plasma-activated solution
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.25. (ORAL )

  16. Y. Imai, S.-N. Hsiao, M. Sekine, T.Tsutsumi, K. Inoue, R. Suda, Y. Iijima, Y. Kihara, M.Hori, K. Ishikawa.
    Effect of H₂O on surface reactions in SiO₂ cryogenic etching with HF plasma
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.25. (ORAL )

  17. Maho Yamada, Kae Nakamura, Horoaki Kajiyama, Shinya Toyokuni, Masaaki Mizuno, Kenji Ishikawa, Masaru HoriandHiromasa Tanaka.
    Effects of direct irradiation on porcine skin using a plasma jet
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.25. (ORAL )

  18. Shuto Tsuchioka, Taito Yoshie, Tran Trung Nguyen, Thi-Thuy-Nga Nguyen, Kenichi Inoue, Takayoshi Tsutsumi, and Kenji Ishikawa.
    Influence of radical species on sidewall protection during Si etching based on experimental and computational analysis
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.25. (ORAL )

  19. Takuto Oya, Tran Trung Nguyen, Thi-Thuy-Nga Nguyen, Kenichi Inoue, Takayoshi Tsutsumi, and Kenji Ishikawa.
    Control of Trench-Feature Profile in Plasma Etching Fabrication for Diamond Field Effect Transistors
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.25. (ORAL )

  20. Kotaro Takahashi, Yusuke Ando, Takayoshi Tsutsumi, Kenichi Inoue, Makoto SekineandKenji Ishikawa.
    Prediction Method of Mass Spectrum of Neutral Species Spectrum by Optical Emission Spectroscopy in Hydrocarbon Plasma Using Random Forest Regression Model
    International Plasma Technology Joint Conference 2025 (IPTJC2025), New Taipei, Taiwan, 2025.06.25. (ORAL )

  21. Pierre Mathieu, Michael K. T. Mo, Rony Snyders, Masaru Hori, Nikolay Britun.
    Optical Study of CH4 Decomposition in an Atmospheric-Pressure ns-Discharge
    ISPC - 26th International Symposium on Plasma Chemistry, Minneapolis, USA, 2025.06.16. (POSTER )

  22. M. Ribeiro, M. K. T. Mo, M. Sekine, M. Hori, Tiago Silva, Vasco Guerra, N. Britun.
    The iterative actinometry: a new approach for tackling the deviations from Maxwellian EEDF by using Boltzmann Solver
    GEC2025, Seoul, Korea, 2025.10.14. (ORAL )

  23. M.K.T. Mo, S-N. Hsiao, M. Sekine, M. Hori, and N. Britun.
    Understanding CF4/H2-based cryogenic etching mechanisms by monitoring radical densities with extended optical actinometry technique
    ICPIG, Aix-en-Provence, France, 2025.07.25. (POSTER )

  24. D. Kitagawa, K. Shimizu, M. Shimizu, M. Kato, Y. Nishikawa, K. Ishikawa, H. Tanaka, M. HoriandM. Ito.
    Analysis of bactericidal species in oxygen radical treated indole solutions using HPLC
    Materials Research Meeting 2025 (MRM2025), Yokohama, Japan, 2025.12.13. (ORAL )

  25. Naohiro Shimizu, Arun Kumar Dhasiyan, Osamu Oda, Nobuyuki Ikarashi, and Masaru Hori.
    GaN and Ga2O3 Diodes Study by Applying Ni and O as p-type Dopants
    Solid State Devices and Materials (SSDM2025), Yokohama, Japan, 2025.09.17. (ORAL )

  26. Takumi Kurushima, Takayoshi Tsutsumi, Makoto Sekine, Masaru Hori, Kenji Ishikawa.
    Aspect Ratio Resolved Mass Spectrometry for Sticking Probability of Neutral Sppecies in High Aspect Ratio Hole
    AVS71, North Carolina, the United States, 2025.09.23. (ORAL )

  27. Shih-Nan Hsiao, Yusuke Imai, Makoto Sekine, Ryutaro Suda, Yuki Iijima, Yoshihide Kihara, Tokyo Electron Miyagi Limited, Japan; Masaru Hori, Nagoya University, Japan.
    Ion-Enhanced Synergistic Reactions in Cryogenic Plasma Etching with HF-Contained Gases
    AVS71, North Carolina, the United States, 2025.09.23. (ORAL )

  28. Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, Masaru Hori.
    Wet-Like Atomic Layer Etching of WCN by Applying the Leidenfrost Effect to Obtain Floating Nanomist-Assisted Vaper Etching
    AVS71, North Carolina, the United States, 2025.09.24. (ORAL )

  29. Masaru HORI, Hiroashi HASHIZUME.
    ENHANCEMENT OF GRAIN QUALITY OF BREWER’S RICE CULTIVAR WITH PLASMA TREATMENT OF CARYOPSIS USING “SMART AGRICULTURE SYSTEM” BASED ON COLLECTED DATA
    PLATHINIUM, Antibes, France, 2025.09.23. (POSTER )

  30. Taishi Yamakawa, Ayako Tanaka, Miron Camelia, Kenji Ishikawa, Masaru HoriandHiromasa Tanaka.
    Autophagy-inducing compounds enhanced by nitrogen reactive species derived from atmospheric pressure plasma
    MACRO lasi 2025, Iasi, Romania, 2025.09.25. (ORAL )

  31. Camelia Miron, Luminita Marin, Taishi Yamakawa, Koki Ono, Ryo Wakatsukasa, Manuela Iftime, Kenji Ishikawa, Shinya Toyokuni, Masaru Hori, Hiromasa Tanaka.
    PLASMA-ACTIVATED POLYMERS AND FORMULATIONS FOR CANCER TREATMENT
    MACRO lasi 2025, Iasi, Romania, 2025.09.25. (ORAL )

  32. Yusuke Ando, Nagoya University, Japan; Hu Li, Jianping Zhao, Tokyo Electron America, Inc.; Masaaki Matsukuma, Tokyo Electron Technology Solutions Ltd., Japan; Kenji Ishikawa, Nagoya University, Japan; Peter Ventzek, Tokyo Electron America, Inc..
    PS1-FrM-1 First-Principles Study on Film Stress Mechanisms of Amorphous Carbon: The Role of Bond Hybridization
    AVS71, North Carolina, the United States, 2025.09.26. (ORAL )

  33. K. Shinoda, T. T. N. Nguyen, D. Ishikawa, K. Yokogawa, M. Izawa, K. Ishikawa, and M. Hori.
    In-situ comparative analysis of surface reactions during isotropic ALE of TiC under various plasma chemistries and IR heating
    AVS71, North Carolina, the United States, 2025.09.24. (ORAL )

  34. Hiromasa Tanaka, Ayako Tanaka, Masaaki Mizuno, Shinya Toyokuni, Hiroaki KajiyamaandMasaru Hori.
    Novel intracellular molecular mechanisms underlying the selective cytotoxic effect of Plasma-activated Ringer’s lactate solution on MCF7 cells over MCF10A cells
    AEPSE, Phuket, Tailand, 2025.11.05. (ORAL )

  35. Yusuke Ando, Hu Li, Jian Ping Zhao, Masaaki Matsukuma, Kenji IshikawaandPeter Ventzek.
    Density functional theory study on stress generation mechanisms of amorphous carbon films
    AEPSE, Phuket, Tailand, 2025.11.04. (ORAL )

  36. Hiroshi Hashizume, Hidemi Kitano, Hiroko Mizuno, Akiko Abe, Yuko Katsumata, Shih-Nan Hsiao, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Shogo Matsumoto, Hitoshi Sakakibara, Eisuke Kita, Yoji Hirosue, Naoto Miyashita, Masayoshi Maeshima, Kuniaki Saito, Masaaki Mizuno, and Masaru Hori.
    Improvement Of Grain Quality Of Brewer's Rice Cultivar By Plasma Treatment Of Caryopses By Utilizing "Smart Agriculture System
    AEPSE, Phuket, Tailand, 2025.11.05. (POSTER )

  37. Liyin. Du, Camelia. Miron, Taisha. Motooka, Masaru. Hori, Masaaki. Mizuno, Shinya. Toyokuni, Hiroaki. Kajiyama, and Hiromasa. Tanaka.
    Plasma Treated L-arginine (PTA) Induced MCF-7 Source Exosome Function Change
    18th International Conference on Plasma Science and Applications (ICPSA 2025), Xi’an, Shaanxi, China, 2025.10.15. (ORAL )

  38. R.Fujita1), K.Ishikawa1), H.Hashizume1), M.Hori1), S.Akiyama1)and H.Tanaka1).
    Changes in the Hatching Rate by Plasma Irradiation on Artemia Cyst
    The 35th Annual Meeting of MRS-J, Kitakyushu, Japan, 2025.11.12. (ORAL )

  39. Koki Ito, Hiroshi Hashizume, Takashi Kondo, Kenji Ishikawa, Masaru Hori, Hiromasa Tanaka.
    Effects of Non-equilibrium Atmospheric Pressure Plasma on Germination and Free Radical Generation in Rice Seeds
    The 35th Annual Meeting of MRS-J, Kitakyushu, Japan, 2025.11.11. (ORAL )

  40. Ryo Wakatsukasa, Camelia Miron, Kae Nakamura, Kenji Ishikawa, Masaru Hori, Hiromasa Tanaka.
    Investigation of antitumor effects by repeated PAL treatment
    The 35th Annual Meeting of MRS-J, Kitakyushu, Japan, 2025.11.12. (ORAL )

  41. Y. Ando, H. Li, J. P. Zhao, M. Matsukuma, K. IshikawaandP. Ventzek.
    Atomistic Origins of Stress in Amorphous Carbon Films: A First-Principles Investigation
    DPS2025 46th International Symposium on Dry Process, Ehime, Japan, 2025.11.14. (ORAL )

  42. S. Tsuchioka, T. Trung Nguyen, K. Inoue, T. Tsutsumi, M. Sekine, and K. Ishikawa.
    Quantitative analysis of fluorine and oxygen species fluxes for precise profile control of Si etched structures
    DPS2025 46th International Symposium on Dry Process, Ehime, Japan, 2025.11.13. (POSTER )

  43. T. Kurushima, T. Tsutsumi, M. Sekine, K. InoueandK. Ishikawa.
    Effect of Gas-Phase Radical Composition Ratio on CFx Sticking Probability in High-Aspect-Ratio Holes
    DPS2025 46th International Symposium on Dry Process, Ehime, Japan, 2025.11.13. (ORAL )

  44. Shunya Hirai, Kazunori Shinoda, Thi-Thuy-Nga Nguyen, Kenichi Inoue, Takayoshi Tsutsumi, and Kenji Ishikawa.
    Surface reactions on thermal-cyclic etching (ALE) of titanium nitride (TiN) observed using in-situ X-ray photoelectron spectroscopy (XPS)
    DPS2025 46th International Symposium on Dry Process, Ehime, Japan, 2025.11.13. (POSTER )

  45. Kotaro Takahashi, Yusuke Ando, Takayoshi Tsutsumi, Kenichi Inoue, Makoto SekineandKenji Ishikawa.
    Prediction Method of Mass Spectrum of Neutral Species Spectrum by Optical Emission Spectroscopy Using Machine Learning
    DPS2025 46th International Symposium on Dry Process, Ehime, Japan, 2025.11.13. (POSTER )

  46. Y. Imai, S.-N. Hsiao, M. Sekine, S. Takagi, T. Tsutsumi, K. Inoue, M. K. T. Mo, N. Britun, Y. Kihara, R. Suda, and K. Ishikawa.
    Influence of CF4 addition to HF plasma on the etching characteristics of SiO2, SiN and a-C films
    DPS2025 46th International Symposium on Dry Process, Ehime, Japan, 2025.11.14. (POSTER )

  47. Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, Kenichi Inoue, Takayoshi TsutsumiandKenji Ishikawa.
    Reaction surface analysis of plasma etching of SiN, SiO2, and poly-Si films using low-global warming potential CF3CHCF2 gas
    DPS2025 46th International Symposium on Dry Process, Ehime, Japan, 2025.11.14. (POSTER )

  48. K. Miwa, T. T. Nga Nguyen, D. Akagi, M. HoriandK. Ishikawa.
    Directional Cyclic Etching of Pt Film using O2 Plasma and Subsequent Formic Acid Vapor Treatment
    DPS2025 46th International Symposium on Dry Process, Ehime, Japan, 2025.11.14. (POSTER )

  49. M. Sekine, S. N. Hsiao, Y. Imai, Y. Kihara, R. SudaandM. Hori.
    Role of H2O in SiO2 cryogenic etching using HF plasma
    DPS2025 46th International Symposium on Dry Process, Ehime, Japan, 2025.11.13. (ORAL )

  50. M. Ribeiro, T. Silva, V. Guerra, N. Britun.
    Towards more precise number density determination via iterative actinometry: the case of CF4-based plasmas
    DPS2025 46th International Symposium on Dry Process, Ehime, Japan, 2025.11.13. (POSTER )

  51. Daiji Kitagawa, Takashi Kondo, Kenichi Inoue, Hiroshi Hashizume, Hiromasa Tanaka, Kenji Ishikawa, Masaru HoriandMasafumi Ito.
    ESR spin trapping analysis of radical reactions in liquid phase using oxygen radical generator and plasma jet
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (ORAL )

  52. Naohiro Shimizu, Arun Kumar Dhasiyan, Osamu Oda, Nobuyuki IkarashiandMasaru Hori.
    p-type Layer Forming Method for Ga2O3 and GaN by Applying Ni Implantation and O Plasma Annealing
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.03. (ORAL )

  53. Camelia Miron, Luminita Marin, Masato Ikeda, Ryo Wakatsukasa, Taishi Yamakawa, Kenichi Inoue, Shinya Toyokuni, Kenji Ishikawa, Masaru Hori, and Hiromasa Tanaka.
    Cold atmospheric plasma-activated chitosan-based hydrogels for cancer treatment
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (POSTER )

  54. N. Britun, M. Ribeiro, M. K. T. Mo, M. Hori, V. GuerraandT. Silva.
    Emission-, laser- and solver-based diagnostics of the ground state density
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.06. (ORAL )

  55. Pierre Mathieu, Michael K. T. Mo, Rony Snyders, Masaru HoriandNikolay Britun.
    Burst ns-plasma used for the enhancement of H atom production
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.06. (POSTER )

  56. Kenichi Inoue, Amir Sawires, Camelia Miron, Rikimaru Fujita, and Kenji Ishikawa.
    Quantification of free radicals at plasma/liquid interfaces for analysis of perfluorooctanoic acid (PFOA) degradation processes
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.05. (ORAL )

  57. Hiroshi Hashizume, Akiko Abe, Hiroko Mizuno, Kaoru Sanda, Yuko Katsumata, Yuki Shibata, Kae Nakamura, Genki Yuasa, Satoe Tohno, Camelia Miron, Hiromasa Tanaka, Yoji Hirosue, Masafumi Ito, Naoto Miyashita, Masayoshi Maeshima, Kuniaki Saito, Masaaki Mizuno, and Masaru Hori.
    Inactivation of spores of Penicillium digitatum by novel plasma-activated solution
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (ORAL )

  58. Trung-Nguyen Tran, Hiroshi Iwayama, Toshio Hayashi, Takayoshi TsutsumiandKenji Ishikawa.
    Elucidating Primary Dissociation Mechanisms of C5H2F10, a Promising Etching Gas, Using Photoelectron-Photoion Coincidence (PEPICO) Measurements
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (ORAL )

  59. Swathy Jayaprasad Jayaprasad, Arun Kumar Dhasiyan, Naohiro Shimizu, Hiromasa Tanaka, Osamu Oda, Masaru Hori.
    Crystal Quality Improvement of GaN Grown at 800 oC on GaN/Si Templates by Radical Enhanced MOCVD (REMOCVD) Using a Water-cooled TMG Supply Nozzle
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (ORAL )

  60. Koki Ono, Ayako Tanaka, Kenji Ishikawa, Wakana Takeuchi, Kenichi Uehara, Shigeo Yasuhara, Masaru Hori, and, Hiromasa Tanaka.
    Influence of Electrical Stimulation on the Cellular Activities of Human Mesenchymal Stem Cells on Silicon Carbide-Coated Carbon Nanowall Scaffolds
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (ORAL )

  61. Yusuke Ando, Hu Li, Jianping Zhao, Masaaki Matsukuma, Peter VentzekandKenji Ishikawa.
    Stress origins of hydrogenated amorphous carbon: density functional theory and data-driven analysis study
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.05. (ORAL )

  62. Taishi Yamakawa, Kenichi Inoue, Kenji Ishikawa, Masaru Horiand, Hiromasa Tanaka.
    Long-term mechanism of nitric oxide radical generation in plasma-activated Ringer’s lactate solution
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (ORAL )

  63. Yusuke Imai, Shih-Nan Hsiao, Makoto Sekine, Takayoshi Tsutsumi, Kenichi Inoue, Ryutaro Suda, Yoshihide KiharaandKenji Ishikawa.
    Influence of HF adsorption on cryogenic reactive ion etching of silicon
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (ORAL )

  64. Takumi Kurushima, Takayoshi Tsutsumi, Makoto Sekine, Kenichi Inoue, and Kenji Ishikawa.
    Effect of Plasma Conditions on Radical Sticking Probability in High-Aspect-Ratio Holes
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (ORAL )

  65. S. Tsuchioka, T. Trung Nguyen, K. Inoue, T. Tsutsumi, M. Sekine, and K. Ishikawa.
    Temporal Control of F and O Radicals During Si Etching for Profile Control
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.03. (POSTER )

  66. Takuto Oya, Tran Trung Nguyen, Kenichi Inoue, Takayoshi TsutsumiandKenji Ishikawa.
    Impact of Process Conditions on Diamond Trench Profiles
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (POSTER )

  67. Kotaro Takahashi, Yusuke Ando, Takayoshi Tsutsumi, Kenichi Inoue, Makoto SekineandKenji Ishikawa.
    Real-time Analysis of Mass Spectrum of Neutral Species Spectrum by Optical Emission Spectroscopy in Hydrocarbon Plasma Using Machine Learning with Multivariate Data Analysis
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.05. (ORAL )

  68. Shaoyun Ge, Hiroko Mizuno, Kenji Ishikawa, Yuji Kamatari, Tomohiro Otsuka, Hirokazu Hara, Masafumi Ito, Masaru HoriandHiromasa Tanaka.
    Plasma-induced Protein Modification and Antibody–Antigen Interactions
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (POSTER )

  69. Ryo Wakatsukasa, Camelia Miron, Kae Nakamura, Kenji Ishikawa, Masaru Horiand, Hiromasa Tanka.
    Antitumor effects by repeated PAL treatment
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (ORAL )

  70. Koki Ito, Hiroshi Hashizume, Kenichi inoue, Takashi Kondo, Kenji Ishikawa, Masaru Hori, and, Hiromasa Tanaka.
    Germination Characteristics and ESR Imaging of Rice Seeds Induced by Non-equilibrium Atmospheric Pressure Plasma
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (ORAL )

  71. R.Fujita1), K.Ishikawa, ), H.Hashizume, ), M.Hori, ), S.Akiyama1)and H.Tanaka, ).
    Changes in Composition by Plasma Irradiation on Artemia Cyst
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (ORAL )

  72. Maho Yamada, Kae Nakamura, Hiroaki Kajiyama, Shinya Toyokuni, Masaaki Mizuno, Kenji Ishikawa, Masaru Horiand, Hiromasa Tanaka.
    Effects of direct irradiation on skin using a plasma jet
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (POSTER )

  73. Ibuki Saburi, Yuki Imai, Takayoshi Tsutsumi, Kenji Ishikawa, Yuji Yamamoto, Wei-Chen Wen, Katsunori Makihara.
    Influence of Radical Behavior on Si and Si0.7Ge0.3 Surface Reactions with CF4/H2 Plasma
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (POSTER )

  74. Takashi Eto, Daiji Kitagawa, Hiromasa Tanaka, Kenji Ishikawa, Masaru Hori, Masafumi Ito.
    Dependences of solvents on N’-formylkynurenine conversion efficiency in oxygen radical-irradiated tryptophan solutions
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (POSTER )

  75. Kota Kawaguchi, Kosuke Muto, Hironaka Tsukagoshi, Hiromasa Tanaka, Kenji Ishikawa, Masaru Hori, Masafumi Ito.
    Measurement of ozone permeability through rice seed coats using atmospheric-pressure mass spectrometry
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (POSTER )

  76. Rui Hasegawa, Kenichi Inoue, Tsuyohito Ito, Hitoshi Muneoka, Yusuke Yasuda, Kazuhiro Kirihara, Yoshiki Shimizu, Yukiya Hakuta, Kenji Ishikawa, Masaru Hori, Kohzo Ito, Kazuo Terashima.
    Evaluation of hBN Filler Orientation in Polyrotaxane Composites via Electron Spin Resonance
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.06. (ORAL )

  77. Tatsuhiro Esaki, Akane Suzuki, Yukino Shinozaki, Kenichi Nomura, Yuki Kagawa, Maho Yamada, Kae Nakamura, Hiromasa Tanaka, Shinya Toyokuni, Masaru Hori, Masaaki Mizuno.
    Exploring the effects of non–thermal plasma on skin wettability: Preliminary implications for biological signal acquisition
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.03. (POSTER )

  78. Masaki Nagane, Kotoko Myodo, Saki Miyagi, Yuko Naya, Hiromasa Tanaka, Naoyuki Aihara, Takanori Shiga, Junichi Kamiie, Tadashi Yamashita.
    Anti-aging Effects of Atmospheric Pressure Plasma-Activated Ringer's Solution
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (ORAL )

  79. Naohiro Noro, Kodai Yamamoto, Hiromasa Tanaka, Masaru Hori, Masafumi Ito.
    Effects of Neutral Radicals on the Selective Inactivation of Breast Cancer Cells by Plasma-Activated Lactate Ringer’s Solution
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (POSTER )

  80. Soya Goto, Daichi Michiyama, Hiroshi Hashizume, Hiromasa Tanaka, Masaru Hori, Masafumi Ito.
    Bactericidal effect of oxygen radical-irradiated Brij 35 solution on E. coli
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (POSTER )

  81. Daichi Michiyama, Hiroshi Hashizume, Hiromasa Tanaka, Masaru Hori, Masafumi Ito.
    Bactericidal effects of oxygen radical activated Tween20 solutions fractionated by liquid chromatography
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (POSTER )

  82. Koki Fukui, Soya Goto, Hiromasa Tanaka, Masaru Hori, Masafumi Ito.
    Bactericidal effects of oxygen radical-irradiated sodium copper chlorophyllin solution
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (POSTER )

  83. Ping-Yen Hsieh, Chia-Ying Liou, Shih-Nan Hsiao, Ying-Hung Chen, Masaru Hori, Ju-Liang He.
    Plasma etching resistance of gas flow sputter prepared SiC coating under cryogenic CF4/H2 plasma
    ISPlasma2026 / IC-PLANTS2026, Nagoya, Japan, 2026.03.04. (POSTER)