Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroaki Kajiyama, Shinya Toyokuni, and Masaru Hori (PLENARY
) Biological interactions of plasma-activated solutions 14TH INTERNATIONAL SYMPOSIUM ON PLASMA BIOSCIENCE (ISPB14), KwangWoon University, Seoul, Korea, 2024.06.24
Nikolay Britun, V. Gamaleev, S.-N. Hsiao and M. Hori (KEYNOTE
) The measurement s of electric field and electron density in a nanosecond atmospheric plasma optimized for room temperature treatment s The 1ST Global Forum and International Workshop in Hybrid mode on Industrial Plasma Processes and Diagnostics 2024 (IPPD 2024), Lecture Hall Complex (LHC) IIT Delhi, Hauz Khas, 2024.05.09
Takayoshi Tsutsumi (INVITED
) Chemical Reaction Analysis for Plasma-Enhanced Atomic Layer Process The 1ST Global Forum and International Workshop in Hybrid mode on Industrial Plasma Processes and Diagnostics 2024 (IPPD 2024):, Lecture Hall Complex (LHC) IIT Delhi, Hauz Khas, 2024.05.09
Makoto Sekinea, Shih-Nan Hsiaoa, Yuki Iijimab, Ryutaro Sudab, Masahiko Yokoib, Maju Tomurab, Yoshihide Kiharab and Masaru Horia (INVITED
) Cryogenic plasma etching in semiconductor processes with reduced environmental impact, 2nd International Workshop on Plasma Cryo Etching Processes, Leuven,Belgium, 2024.06.10. Abstract pp.14
Shih-Nan Hsiao, Makoto Sekine, Yuki Iijima, Ryutaro Suda, Masahiko Yokoi, Yoshihide Kihara and Masaru Hori (INVITED
) Cryogenic plasma etching towards zero greenhouse gas emission for semiconductor processes 2024 International Forum of Plasma and Thin Film Technologies for Sustainable Development Goals(PTSTG), Taipei, Taiwan, 2024.06.21
N. Britun (INVITED
) The role of spectroscopic diagnostics in understanding of the plasma-based gas conversion and synthesis., 19th International Conference on Plasma Surface Engineering（PSE2024）, ERFURT, GERMANY, 2024.09.02. Abstract #545
Masaru Hori (INVITED
) Challenge of Low-temperature Plasma Sciences towards the Realization of SDGs The Scientific Seminar, Kazakh-British Technical University, Kazakhstan,, 2024.07.02
C. Miron, H. Tanaka, L. Marin, M. Iftime, A. Fifere, T. Kondo, K. Ishikawa, H. Kondo, S. Toyokuni, V. Harabagiu, M. Hori (INVITED
) Cold atmospheric pressure plasma-treated polymer solutions for cancer treatment, The 16th International Conference on Physics of Advanced Materials (ICPAM-16) , 7th Autumn School on Physics of Advanced Materials (PAMS-7), Antalya, Turkey, 2024.09.14. T6-I
Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroaki Kajiyama, Shinya Toyokuni, and Masaru Hori (PLENARY
) Cancer therapy using plasma-activated solutions, 10TH INTERNATIONAL CONFERENCE ON PLASMA MEDICINE (ICPM10) & 9TH INTERNATIONAL WORKSHOP ON PLASMA FOR CANCER TREATMENT (IWPCT9), Jozef Stefan Institute,Ljubljana, 2024.09.09. PL-1
Masaru Hori (INVITED
) Plasma interactions with surfaces and biological materials 10TH INTERNATIONAL CONFERENCE ON PLASMA MEDICINE (ICPM10) & 9TH INTERNATIONAL WORKSHOP ON PLASMA FOR CANCER TREATMENT (IWPCT9), Jozef Stefan Institute,Ljubljana, 2024.09.11
M. Sekine (INVITED
) Surface Analysis of GaN by Cyclic Etching Process for ALE of III-V Materials, PRiME 2024 (Pacific Rim international meeting of The Electrochemical Society (ECS), Hawaii, 2024.10.08. G01
Masaru Hori (INVITED
) Damage-free plasma etching of GaN at high temperatures, VASSCAA-12&TVS-2024, Taipei, Taiwan, 2024.10.15. #1027
Masaru Hori (PLENARY
) The Challenge of Green Transformation of Semiconductor Plasma Processes 2nd International Conferenceon Smart Devices and Sustainable Energy(SDSE2024), New Taipei city, Taiwan, 2024.10.17
Shih-Nan Hsiao1* , Yusuke Imai1, Makoto Sekine1, Yosishide Kihara2, Ryutaro Suda2, Masaru Hori1 (INVITED
) Cryogenic plasma etching for atomic layer process of dielectric materials, VASSCAA-12&TVS-2024, Taipei, Taiwan, 2024.10.15. #1042
Nikolay Britun, Michael K.T. Mo1 , Shih-Nan Hsiao1 , Makoto Sekine1 , Masaru Hori1 (INVITED
) Diagnostics of plasma radicals' density in etching processes, VASSCAA-12&TVS-2024, Taipei, Taiwan, 2024.10.15. #1115
OSONIO Airah Peraro1,a *, TSUTSUMI Takayoshi11,2,b, ISHIKAWA Kenji1,2,c and MASARU Hori1,d (INVITED
) Behavior of Radical Adsorption on Plasma Induced Defect for Atomic Layer Etching ICMSEP2024, Tagaytay, Philippines, 2024.10.29
Masaru Hari, M. Sekine, T. Tsutsumi, K. Ishikawa (INVITED
) Advanced Semiconductor Plasma Processes Pioneered by Understanding and Controlling Plasma-Surface Interactions AVS Tempa, Tampa, FL, 2024.11.04
Shih-Nan Hsiao, Makoto Sekine (Nagoya Univ., Japan), Yoshihide Kihara, Ryutaro Suda (Tokyo Electron Miyagi Ltd., Japan), and Masaru Hori (Nagoya Univ., Japan) (INVITED
) Cryogenic Plasma Etching for Semiconductor Processes Towards Carbon Neutrality KISM, Busan, Korea, 2024.11.14
Kenji Ishikawa (PLENARY
) Plasma-Driven Sciences: Exploring Complex Interactions at Plasma-boundaries 17TH INTERNATIONAL CONFERENCE ON PLASMA SCIENCE AND APPLICATIONS 2024（ICPSA2024）, Kuala Lumpur, Malaysia, 2024.11.12
堀先生 (INVITED
) Highly Selective Etch Technology for Next Generation 3D Devices STS2025, 307, Conference Room (South), 3F, COEX, World Trade Center, 2025.02.20
Hiromasa Tanaka (INVITED
) Plasma-activated solutions and their applications in Plasma Life Science OLTP seminar, Online, 2024.11.12
Tsutsumi Takayoshi1, Hiroki Kondo2, Makoto Sekine1, Kenji Ishikawa1 and Masaru Hori1 (INVITED
) In-Situ Observation of Reaction Layer in Surface for Damage-Free Atomic Layer Etching, 2024 MRS FALL MEETING & EXHIBIT, Boston, Massachusetts, 2024.12.02. CH01.02.01
Takayoshi Tsutsumi Y. Ando/M.Sekine/M.Hori/K.Ishikwa (INVITED
) Undestanding Surface Reaction in PECVD Process by Combining In-situ Monitoring and Machine Learning International Symposium on Semiconductor Manufacturing (ISSM) 2024, Tokyo, Japan, 2024.12.09
近藤 隆 (INVITED
) 低温プラズマによるフリーラジカル生成. 放射線および超音波との比較 Free Radical Formation Induced by Low-temperature Plasma. Comparison with Ionizing Radiation and Ultrasound, 第34回日本MRS年次大会, Yokohama, Kanagawa, Japan, 2024.12.18. D3-I18-011
*S. N. Hsiao1), M. Sekine1), Y. Imai1), N. Britun1), M. Mo1), Y. Iijima2), R. Suda2), M. Yokoi2), Y. Kihara2) and M. Hori1) (INVITED
) Recent Advance in Cryogenic Plasma Etching for Si-based Semiconductor Processing, 第34回日本MRS年次大会, Yokohama, Kanagawa, Japan, 2024.12.18. C1-I18-001
Kenji Ishikawa (INVITED) Energy-efficient, environmental, evolutional, and educational E4 assurance for new advanced semiconductor etching technologies based on low-temperature plasma science 19th International TFT Conference, Nara Park Bus Terminal, Nara, Japan, 2025.03.25
General
Michael K. T. Mo, S.-N. Hsiao, M. Sekine, M. Hori, N. Britun. The effects of SiO2 substrate cooling on radical species production in CF4/H2 plasma, 2nd International Workshop on Plasma Cryo Etching Processes, Leuven,Belgium, 2024.06.11. Abstract pp.49 (ORAL
)
Shih-Nan Hsiaoa, Yusuke Imaia, Makoto Sekinea, Takayoshi Tsutsumia, Kenji Ishikawaa, Yuki Iijimab, Ryutaro Sudab, Masahiko Yokoib, Maju Tomurab, Yoshihide Kiharab and Masaru Hori. Plasma-based pseudo-wet etching for SiN using hydrogencontained fluorocarbon gases at cryogenic temperatures, 2nd International Workshop on Plasma Cryo Etching Processes, Leuven,Belgium, 2024.06.10. Abstract pp.38 (ORAL
)
N. Britun, M. K.T. Mo, S.-N. Hsiao, F. J. Arellano, M. Sekine, M. Hori. Multi-ratio Ar-based actinometry for obtaining F, O, H, N and P atomic number densities., 19th International Conference on Plasma Surface Engineering（PSE2024）, ERFURT, GERMANY, 2024.09.02. Abstract #22 (ORAL
)
Nikolay Britun, Masaru Hori, Kazuhiro Hikida, Kazutaka Fujiwara. 11 years of ground state density mapping in HiPIMS: from scientific trials to industry-grade research, The 17th International Symposium on Sputtering & Plasma Processes（ISSP2024）, Kyoto, JAPAN, 2024.07.04. HP2-03 (ORAL
)
Thi-Thuy-Nga Nguyen, Y. Yamaguchi, K. Shinoda, K. Sun, K. Maeda, K. Yokogawa, M. Izawa, K. Ishikawa, M. Hori. A New Challenge for Developing Novel Atomic Layer Etching: Applying the Leidenfrost Effect to Obtain Floating Nanomist Assisted Vapor Etching, AVS 24th International Conference on Atomic Layer Deposition (ALD 2024) featuring the 11th International Atomic Layer Etching Workshop (ALE 2024), Helsinki, Finland, 2024.08.06. ALE1-TuM-6 (ORAL
)
Kenji Ishikawa, Masafumi Ito, Naoyuki Iwata, Yasuhiro Nishikawa, Motoyuki Shimizu, Hironaka Tsukakoshi, Masashi Kato, Masaru Hori, Hiromasa Tanaka. Metabolic Disorders in E. coli Induced by Electrically Neutral Oxygen Radicals Irradiation of Tryptophane-Containing Solutions, 10TH INTERNATIONAL CONFERENCE ON PLASMA MEDICINE (ICPM10) & 9TH INTERNATIONAL WORKSHOP ON PLASMA FOR CANCER TREATMENT (IWPCT9), Jozef Stefan Institute,Ljubljana, 2024.09.13. Fri-O-4-1 (ORAL
)
Kae Nakamura, Katsumi Ebisawa, Masaaki Mizuno, Nobuhisa Yoshikawa, Hiromasa Tanaka, Kazunobu Hashikawa, Shinya Toyokuni, Masaru Hori, Yuzuru Kamei, Hiroaki Kajiyama. Safety and efficacy study of Plasma-activated Lactate Ringer's Solution (PAL) for application on animal and human skin, 10TH INTERNATIONAL CONFERENCE ON PLASMA MEDICINE (ICPM10) & 9TH INTERNATIONAL WORKSHOP ON PLASMA FOR CANCER TREATMENT (IWPCT9), Jozef Stefan Institute,Ljubljana, 2024.09.10. Tue-O-6-4 (ORAL
)
Sanae Ikehara, Kazuhiko Azuma, Syota Ohki, Hiroki Kondo, Yoko Iizumi, Toshiya Okazaki, Masaru Hori, Komei Baba, Yuzuru Ikehara. Developing a conductive treatment method for pathological specimens using plasma for the diagnosis using electron microscopy, 10TH INTERNATIONAL CONFERENCE ON PLASMA MEDICINE (ICPM10) & 9TH INTERNATIONAL WORKSHOP ON PLASMA FOR CANCER TREATMENT (IWPCT9), Jozef Stefan Institute,Ljubljana, 2024.09.12. Thu-O-7-8 (ORAL
)
Masafumi Ito, Naoyuki Iwata, Kenji Ishikawa, Yasuhiro Nishikawa, Motoyuki Shimizu, Hironaka Tsukakoshi, Masashi Kato, Masaru Hori. Bactericidal and Plant-Growth Effects of Amino-Acid Solutions Irradiated by Electrically-Neutral Oxygen Radicals, 10TH INTERNATIONAL CONFERENCE ON PLASMA MEDICINE (ICPM10) & 9TH INTERNATIONAL WORKSHOP ON PLASMA FOR CANCER TREATMENT (IWPCT9), Jozef Stefan Institute,Ljubljana, 2024.09.13. Fri-O-10-1 (ORAL
)
Kenichi Inoue, Takashi Kondo, Kenji Ishikawa and Masaru Hori. In Situ Electron Spin Resonance and Spin Trapping Study for Kinetics of Free Radical Reactions at Plasma/Liquid Interfaces Plasma Chemistry on Liquids, The 77th Annual Gaseous Electronics Conference, San Diego, California, 2024.10.03. GR2.00002 (ORAL
)
Taishi Yamakawa, Kae Nakamura, Masaaki Mizuno, Shinya Toyokuni, Hiroaki Kajiyama, Kenji Ishikawa, Masaru Hori and Hiromasa Tanaka. Identificaion of autophagy inducers on cancer cell treated by Plasma-Activated Ringer’s lactate solution, The 77th Annual Gaseous Electronics Conference, San Diego, California, 2024.10.02. HW6.00037 (POSTER
)
Michael Mo, Shih-Nan Hsiao, Fatima Jenina T Arellano, Makoto Sekine, Masaru Hori, Nikolay Britun. Revisiting optical actinometry to utilize multiple argon line ratios for determination of absolute radical densities, The 77th Annual Gaseous Electronics Conference, San Diego, California, 2024.10.01. ET1.00004 (ORAL
)
Trung Nguyen Tran, Toshio Hayashi, Hiroshi Iwayama, Shih-Nan Hsiao, Makoto Sekine, Masaru Hori. Process Control of Plasma Etching of SiN, SiO2 and poly-Si films via Enhanced Fragmentation of CHF2CF3 and CF3CH3, CHF2CH3, The 77th Annual Gaseous Electronics Conference, San Diego, California, 2024.10.01. ET2.00004 (ORAL
)
Yusuke Imai1 * , Shih-Nan Hsiao1, Makoto Sekine1, Kenji Ishikawa1, Takayoshi Tsutsumi1, Yuki Iijima2 and Masaru Hori1. Effect of bias voltage on etching reaction of SiO2 in cryogenic process with HF contained plasmas, VASSCAA-12&TVS-2024, Taipei, Taiwan, 2024.10.15. #1048 (POSTER
)
Chieh-Ju Liao , Masaru Hori, Noriyasu Ohno. Pioneering the Future: Exploring the Potential of Low-Temperature Plasma Science VASSCAA-12&TVS-2024, Taipei, Taiwan, 2024.10.15. (POSTER
)
A.P. Osonio1, T. Tsutsumi1, B. Mukherjee2, R. Borude2, N. Kobayashi1, and M. Hori1. Plasma-assisted Atomic Layer Etching (PE-ALE) of SiO2 via surface fluorination and argon bombardment AAPPS_DPP, Malacca, Malaysia, 2024.11.05. (ORAL
)
T. Tsutsumi1, M. Sekine1, K. Ishikawa1, M. Hori1. In-situ measurements of plasma-induced defects and radical adsorption in ALE AAPPS_DPP, Malacca, Malaysia, 2024.11.05. (ORAL
)
Kenichi Inoue1, Tsuyohito Ito2, Yoshiki Shimizu3, Yukiya Hakuta3, Kazuo Terashima2,3. Surface modification of hexagonal boron nitride using plasmas in solution for development of polymer composite materials AAPPS_DPP, Malacca, Malaysia, 2024.11.04. (ORAL
)
Shih-Nan Hsiao, M. Sekine, Y. Iijima, R. Suda, M. Yokoi, Y. Kihara, M. Hori. PS2-TuM-15 The Role of PF3 on Etching Characteristics of SiO2 and SiN Using HF-Based Cryogenic Plasma Etching Analyzed with in situ Monitoring Techniques AVS Tempa, Tampa, FL, 2024.11.05. (ORAL
)
Shih-Nan Hsiao1 , Makoto Sekine1 , Yuki Iijima2 , Yoshihide Kihara2 and Masaru Hori1. Cryogenic plasma etching of SiN films with HF-contained (CF4/H2, HF, HF/Ar) gas mixtures ドライプロセスシンポジウム（DPS2024）, Hokkaido, Japan, 2024.11.15. (ORAL
)
Liugang Hu1, Takayoshi Tsutsumi2, Nobuyoshi Kobayashi2, Kenji Ishikawa2, and Masaru Hori2. Plasma-enhanced atomic layer deposition of carbon films ドライプロセスシンポジウム（DPS2024）, Hokkaido, Japan, 2024.11.14. (ORAL
)
R. Takahashi1, R. Sakai1, T. Tsutsumi2, M. Sekine2, M. Hori2, and K. Ishikawa2. UV laser ionization desorption of surfaces for GaN etching ドライプロセスシンポジウム（DPS2024）, Hokkaido, Japan, 2024.11.15. (POSTER
)
J. He1, S. Nakamura1,2, A. Tanide1,2, T. N. Tran1, T. Tsutsumi1, M. Sekine1, M. Hori1, and K. Ishikawa1. Etching of GaN using Ar/F2 plasma at high temperatures ドライプロセスシンポジウム（DPS2024）, Hokkaido, Japan, 2024.11.15. (POSTER
)
Chih-Yu Ma1, Shih-Nan Hsiao1, Yusuke Imai1, Makoto Sekine1, Nikolay Britun1, Yuki Iijima2, Yoshihide Kihara2 and Masaru Hori1. Cryogenic plasma etching of SiO2 and Si using PF3/H2 precursors with different hydrogen concentrations ドライプロセスシンポジウム（DPS2024）, Hokkaido, Japan, 2024.11.15. (ORAL
)
Tran Trung Nguyen1*, Toshio Hayashi1, Hiroshi Iwayama2, Makoto Sekine1, Masaru Hori1 and Kenji Ishikawa1. Hydrofluoroethane plasmas with CHF2CF3, CF3CH3, and CHF2CH3 on reactions of etching surface of SiN, SiO2 and poly-Si films ドライプロセスシンポジウム（DPS2024）, Hokkaido, Japan, 2024.11.15. (POSTER
)
Koki Ono , Ayako Tanaka , Kenji Ishikawa , Wakana Takeuchi ,Kenichi Uehara , Shigeo Yasuhara , Masaru Hori , Hiromasa Tanaka. The Effect of Electrical Stimulation on the Cellular Response of Human Mesenchymal Stem Cells on SiC-coated CNW Scaffolds. 2024 MRS FALL MEETING & EXHIBIT, Boston, Massachusetts, 2024.12.04. (ORAL
)
関根 誠. PF3/H2ガスを使用した SiO2とSiの低温プラズマエッチング Cryogenic plasma etching of SiO2 and Si with PF3/H2 gases, 第34回日本MRS年次大会, Yokohama, Kanagawa, Japan, 2024.12.18. C1-O18-003 (ORAL
)
石川 健治1),ギョン ハン2. プラズマ駆動型生化学への計算化学アプローチ Computational chemistry of plasma-driven reactions in lactated solution, 第34回日本MRS年次大会, Yokohama, Kanagawa, Japan, 2024.12.18. D3-O18-013 (ORAL
)
白田 颯1),石川 健治2),橋爪 博司2),堀 勝2),秋山 真一3),田中 宏昌2. プラズマ照射が引き起こすアルテミアのアスコルビン酸量に対する影響 The Impact of Plasma Irradiation on the Ascorbic Acid of Artemia, 第34回日本MRS年次大会, Yokohama, Kanagawa, Japan, 2024.12.17. D3-O17-006 (ORAL
)
井深 裕太1),橋爪 博司2),堀 勝2),田中 宏昌2. 低温プラズマ処理による豆苗の成長促進効果に関する研究 Growth promotion of Pea sprouts (Pisum sativum) by low-temperature plasma irradiation, 第34回日本MRS年次大会, Yokohama, Kanagawa, Japan, 2024.12.17. D3-O17-004 (ORAL
)
橋爪 博司1),北野 英己1),水野 寛子1),阿部 明子1),蕭 世男1),湯浅 元気2),東野 里江2),田中 宏昌1),松本 省吾1),榊原 均1),北 栄輔1),広末 庸治2),前島 正義1),齋藤 邦彰2),水野 正明1),堀 勝1. 「プラズマスマート農業」システムを利用した稲穂のプラズマ照射による酒米品種山田錦の高品質化 Plasma irradiation of flowering caryopses of brewer’s rice cultivar, Yamadanishiki, for producing high-quality grains with a “Plasma Smart Agriculture” system, 第34回日本MRS年次大会, Yokohama, Kanagawa, Japan, 2024.12.17. D3-P17-006 (POSTER
)
*Shih-Nan Hsiao1, Pak-Man Yiu2, Li-Chun Chang2, Jyh-Wei Lee2, Makoto Sekine1, Masaru Hori1. Non-halogen Atomic Layer Etching of HfO2 by Alternating N2 and O2 Plasma at Room Temperature ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.04. (ORAL
)
1Kohei Mori*, 1Taishi Yamakawa, 2Masaru Hori, 2Kenji Ishikawa and 2Hiromasa Tanaka. Investigation of mitophagy-inducing substances and their effects on mitochondrial function in plasma-activated Ringer's lactate solution ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.05. (ORAL
)
1Hayato Shirata*, 1Kenji Ishikawa, 1Shinichi Akiyama, 1Hiroshi Hashizume,1Masaru Hori and 1Hiromasa Tanaka. Effects of Plasma Irradiation on the Ascorbic Acid Content in Artemia ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.05. (ORAL
)
1Takaya Suzuki*, 1Taishi Yamakawa, 2,3Ayako Tanaka, 3Masaaki Mizuno, 2Shinya Toyokuni, 2,4Hiroaki Kajiyama, 2,4Kae Nakamura, 2Kenji Ishikawa, 2Masaru Hori and 2Hiromasa Tanaka. Effects of PAL targeting cancer-initiating cells ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.04. (ORAL
)
1Taishi Yamakawa*, 2Kenichi Inoue, 2Masaru Hori, 2Kenji Ishikawa and 2Hiromasa Tanaka. Analysis of radical production in plasma-activated Ringer’s lactate solution using electron spin resonance ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.04. (ORAL
)
1Yota Kojima*, 1Kenji Ishikawa, 1Hiroshi Hashizume, 1Masaru Hori, and 1Hiromasa Tanaka. Plasma-activated Ringer’s lactate solution induces changes in the planarian regeneration ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.04. (ORAL
)
1Michael K. T. Mo*, 1S.-N. Hsiao, 1M. Sekine, 1M. Hori, and 1N. Britun. The effect of SiN substrate cooling on radical species during CF4/H2 etching ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.04. (ORAL
)
Swathy Jayaprasad*, Arun Kumar Dhasiyan, Naohiro Shimizu, Hiromasa Tanaka, Osamu Oda and Masaru Hori. Growth of GaN on graphene/SiO2/Si (100) by radical enhanced metal organic chemical vapor deposition. ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.05. (ORAL
)
1Shunya Hirai*, 2Kazunori Shinoda, 1Thi-Thuy-Nga Nguyen, 1Takayoshi Tsutsumi, 1Kenichi Inoue, and 1Kenji Ishikawa. In-situ analysis of chlorination of TiN surfaces by chlorine radical irradiations ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.04. (ORAL
)
*Hiroshi Hashizume1, Hidemi Kitano1, Hiroko Mizuno1, Akiko Abe1, Yuko Katsumata1, Genki Yuasa2, Satoe Tohno2, Hiromasa Tanaka1, Shogo Matsumoto1, Hitoshi Sakakibara1, Eisuke Kita1, Yoji Hirosue2, Naoto Miyashita1, Masayoshi Maeshima1, Kuniaki Saito2, Masaaki Mizuno1, Masaru Hori1. Effectiveness of “Smart Plasma Agriculture” system for grain-quality improvement of brewer’s rice cultivar by plasma irradiation of caryopsis based on collecting environmental data ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.05. (ORAL
)
1Yuta Ibuka*, 2Hiroshi Hashizume, 2Kenji Ishikawa, 2Masaru Hori and 2Hiromasa Tanaka. Growth Promotion of Pea Sprouts (Pisum Sativum) by Non-Equilibrium Atmospheric Pressure Plasma Irradiation ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.04. (POSTER
)
1Takumi Kurushima*, 2Takayoshi Tsutsumi, 2Makoto Sekine, 2Masaru Hori, and 2Kenji Ishikawa. Effect of Sticking Probability on Radical Transports in High-Aspect-Ratio Holes ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.04. (ORAL
)
1Ryoto Takahashi, 1Takayoshi Tsutsumi, 1Kenichi Inoue, 1Ryusei Sakai, 1Makoto Sekine, 1Masaru Hori and 1Kenji Ishikawa. Surface reactions by deep ultraviolet laser irradiation for GaN etching ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.04. (ORAL
)
1Thi-Thuy-Nga Nguyen*, 2Kazunori Shinoda, 1Shih-Nan Hsiao, 2Kenji Maeda, 2Kenetsu Yokogawa, 2Masaru Izawa, 1Kenji Ishikawa, and 1Masaru Hori. Low-damage plasma etching of metal gate TiAlC using nonhalogen chemistries at room temperature ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.04. (POSTER
)
NIKOLAY BRITUN, Masaru Hori. Enhancing He3S1 state production in burst atmospheric plasma ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.05. (ORAL
)
Kenichi Inoue, 2 Naoto Takagi, 2 Shota Ando, 3 Koichi Mayumi, 2 Hitoshi Muneoka, 4 Yoshiki Shimizu, 2 Tsuyohito Ito, 2 Kohzo Ito and 2,4Kazuo Terashima. Application of plasma-surface-modified hexagonal boron nitride for composites with unique polymers; low-covered polyrotaxanes ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.05. (ORAL
)
Pankaj Kumar Singh*, Koichi Sugimoto, Ngo Van Nong, Kozuka Yoshinari, Osamu Oda and Masaru Hori. Structural changes and degradation mechanism of LiCoO2 in Li-ion battery ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.06. (ORAL
)
1Koki Ono, 2Ayoko Tanaka, 2Kenji Ishikawa, 3Wakana Takeuchi, 4Kenichi Uehara, 4Shigeo Yasuhara, 2Masaru Hori, and 2Hiromasa Tanaka. The effect of electrical stimulation on the multipotency of mesenchymal stem cells on SiC-coated CNW scaffolds ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.04. (ORAL
)
1Takayoshi Tsutsumi*, 1Yusuke Izumi, 1Makoto Sekine, 1Masaru Hori, and 1Kenji Ishikawa. Damage evaluation for electron-beam-assisted modification of GaN surface ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.04. (ORAL
)
*Ken Akamatsu1, Takashi Kondo2, Hiromasa Tanaka2. Spectra of DNA Damage Induced by Low-Temperature He-Plasma Irradiation and its Dependence on a Radical Scavenger Concentration Compared with those by X-Rays ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.04. (POSTER
)
*Qingyang Liu1, Taishi Yamakawa2, Hiromasa Tanaka2, Minoru Sasaki1. Growth Characteristics of Lily Pollens in Random and Array ISPlasma2025/IC-PLANTS2025, Chubu University, Aichi, Japan, 2025.03.04. (POSTER)