M. Hori (INVITED
) Consideration of High Quality Silicon Film Deposition on the Basis of Plasma Science 6th International Workshop on Advanced Plasma Processing and Diagnostics, Nagoya University VBL, Nagoya, Japan, January 8-9, 2008
M. Hiramatsu, M. Hori (PLENARY
) Carbon Nano Material Processing on the Basis of Plasma Nano Science BK21 International Symposium on Prospects for Physics and Chemistry in the Next Decade, Natural Science Campus, Sungkyunkwan University, Suwon, Korea, February 18-19, 2008
M. Sekine, E. Shibata, and M. Hori (INVITED
) Low-k Film Etch Process and Surface Reaction Mechanism Employing a Low GWP Gas International workshop on merging state-of-the-art plasma science into novel technologies, Academisch Genootschap, Eindhoven, The Netherlands, May 14-16, 2008
M. Sekine (INVITED
) Advanced Plasma Etching Technology for ULSIs Surface Reaction Mechanism of Low-k Film Etching with Low GWP Gas and Nitrogen 7th Korea-Japan Workshop on Plasma Technology, Sungkyunkwan University, Suwon, Korea, July 3-5, 2008
M. Sekine, E. Shibata, M. Hori (INVITED
) Low-k Film Etch Process and Surface Reaction Employing a Fluorocarbon Gas with Low GWP 7th Korea-Japan Workshop on Plasma Technology, Sungkyunkwan University, Suwon, Korea, July 3-5, 2008
M. Hori, W. Takeuchi, M. Hiramatsu, Y. Tokuda, and H. Kano (INVITED
) Control of Structure of Carbon Nanowalls Synthesized by Fluorocarbon Plasma Enhanced Chemical Vapor Deposition ICPP2008 Satellite Meeting on Plasma Physics and Advanced Applications in ASO, ASO Ikoi-no-Mura, Aso, Japan, September 12-14, 2008
M. Hori, W. Takeuchi, S. Kondo, and M. Hiramatsu (INVITED
) On the Growth Mechanism of Carbon Nanowalls using Plasma Enhanced Chemical Vapor Deposition 11th International Conference on Plasma Surface Engineering (PSE), Garmisch-Partenkirchen, Germany, September 15-19, 2008
M. Hori (INVITED
) Manufacturing Innovation by Advanced Plasma Nano Technology-Advanced “Monodzukuri” with Hori Type Ultra Micro-Hollow Atmospheric Pressure Plasma Device : HU-MAP (Ultra High Density Room Temperature Atmospheric Pressure Plasma Device) 1st International Symposium of Plasma Center for Industrial Applications (PLACIA) and Plasma Application Monodzukuri (PLAM) on Manufacturing Innovation by Plasma Surface Modification, Nagoya Science Park, Nagoya, Japan, December 4, 2008
M. Sekine, Masaru Hori (INVITED
) Etching Ultrafine Etching Technology for the 32 nm node ?Combination of Profile Variability Control and Metrology? SEMI Technology Symposium (STS) 2008, Makuhari Messe, Chiba, Japan, December 4, 2008
General
M. Li, K. Takeda, T. Mori, M. Sekine, M. Hori. Low-Temperature SiN Film Formation on Si and OLEDs by VHF-CCP System 6th International Workshop on Advanced Plasma Processing and Diagnostics, Nagoya University VBL, Nagoya, Japan, January 8-9, 2008. (
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S. Kondo, W. Takeuchi, M. Hiramatsu, K. Yamakawa, H. Kano, M. Sekine, M. Hori. Synthesis of Graphene Sheet by Radical Controlled Plasma 6th International Workshop on Advanced Plasma Processing and Diagnostics, Nagoya University VBL, Nagoya, Japan, January 8-9, 2008. (
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K. Takeda, S. Kono, K. Yamakawa, T. Maeda, M. Hori. Development of New remote Plasma Processes for Flexible Device Fabrication 1st International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, March 13-14, 2008. (
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S. Takashima, K. Takeda, S. Kato, M. Hiramatsu M. Hori. Surface Loss Probability of Nitrogen Atom in Process Plasmas 1st International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, March 13-14, 2008. (
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E. Shibata, H. Okamoto, M. Sekine, M. Hori. Porous Low-k Film Etching Process and its Surface Reactions Employing an Alternative Fluorocarbon Gas 1st International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, March 13-14, 2008. (
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H. Yamamoto, K. Takeda, M. Sekine, M. Hori. Evaluating Damage Generation Mechanism on Porous SiOCH by H2 Plasma Ashing Process 1st International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, March 13-14, 2008. (
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T. Masuda, M. Hiramatsu, K. Yamakawa, M. Hori. Fabrication of Carbon Nanostructures Using Non-Equilibrium Atmospheric Pressure Plasma CVD 1st International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, March 13-14, 2008. (
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O. Stepanovic, S. Kondo, K. Yamakawa, S. Den, M. Hiramatsu M. Hori . Investigation of Early Phase of Carbon Nanowall Formation Process in a Newly Developed Three-plasma Experiment 1st International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, March 13-14, 2008. (
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M. Ohhira, T. Hishikawa, M. Hiramatsu, M. Hori. Fabrication of Carbon Nanostructures Using Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition 1st International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, March 13-14, 2008. (
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H. Watanabe, T. Deguchi, M. Hiramatsu M. Hori. Fabrication of Carbon Nanotube Film with Self-Assembled Conical Tips Using Microwave Plasma-Enhanced CVD 1st International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, March 13-14, 2008. (
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T. Mori, M. Hiramatsu, K. Yamakawa, K. Takeda, M. Hori. Growth of Carbon Nanowalls Using Electron Beam Excited Plasma-Enhanced CVD 1st International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, March 13-14, 2008. (
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S. Kato, H. Sasaki, S. Takashima, K. Yamakawa, M. Hiramatsu, M. Hori. Radical Density Measurements in VHF C2F6/H2 Plasma with Radical Injection CVD Used for CNWs Fabrication 1st International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, March 13-14, 2008. (
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A. Noda, M. Hiramatsu M. Hori. Pattern Transfer of Carbon Nanowall into SiO2 Film 1st International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, March 13-14, 2008. (
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W. Takeuchi, M. Hiramatsu, Y. Tokuda, H. Kano M. Hori. Structural Control of Carbon Nanowalls Using Oxygen Gas Addition to C2F6/H2 Plasma 1st International Conference on Plasma-Nano Technology and Science, IB Building, Nagoya University, Nagoya, Japan, March 13-14, 2008. (
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W. Takeuchi, M. Hiramatsu, Y. Tokuda, H. Kano, M. Hori. Effect of Oxygen Gas Addition to C2F6/H2 Plasma on the Structure of Carbon Nanowalls 4th International Nanotechnology Conference on Communication and Cooperation (Nanotech in Japan), Hitotsubashi Memorial Hall, Tokyo, Japan, April 14-17, 2008. (
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W. Takeuchi, M. Hiramatsu, Y. Tokuda, H. Kano, M. Hori. Structural Control of N-doped Carbon Nanowalls using O2 Effect 2nd International Conference on New Diamond and Nano Carbons, Grand Hotel, Taipei, Taiwan, May 26-29, 2008 . (
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S. Kondo, O. Stepanovic, K. Yamakawa, M. Hiramatsu, M. Hori. Carbon Nanowall Formation by Controlled Irradiation of Radicals and Iions 2nd International Conference on New Diamond and Nano Carbons, Grand Hotel, Taipei, Taiwan, May 26-29, 2008. (
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H. Yamamoto, K. Takeda, S. Takashima, M. Sekine, M. Hori . Quantitative Measuring of Damage on Porous SiOCH by H2/N2 Plasma Ashing Process 17th World INTERFINISH Congress and Exhibition, Grand Hotel Haeundae, Busan, Korea, June 16-19, 2008. (
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C. S. Moon, K. Takeda, M. Sekine, M. Hori. Development of Combinatorial Plasma Apparatus for Autonomous Nano-processing Technology 17th World INTERFINISH Congress and Exhibition, Grand Hotel Haeundae, Busan, Korea, June 16-19, 2008. (
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H. Watanabe, M. Hiramatsu, M. Hori. Fabrication of Nanowall Using Radical Injection Plasma Enhanced Chemical Vapor Deposition and its Electrochemical Evaluation 7th Korea-Japan Workshop on Plasma Technology, Sungkyunkwan University, Suwon, Korea, July 3-5, 2008. (
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H. Inui, Y. Matsudaira, H. Kano, N. Yoshida, M. Hori. Characterization of AC Exited Nonequilibrium Atmospheric Pressure Plasma with Ultra High Electron Density for Glass Surface Cleaning 7th Korea-Japan Workshop on Plasma Technology, Sungkyunkwan University, Suwon, Korea, July 3-5, 2008. (
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C. Moon, K. Takeda, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori. Development of Combinatorial Plasma Etching Process System 7th Korea-Japan Workshop on Plasma Technology, Sungkyunkwan University, Suwon, Korea, July 3-5, 2008. (
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S. Iseki, K. Yamamoto, T. Ohta, M. Ito, H. Kano, Y. Higashijima, M. Hori. Contributions of UV Light to Sterilization using Nonequilibrium Atmospheric Pressure Plasma 7th Korea-Japan Workshop on Plasma Technology, Sungkyunkwan University, Suwon, Korea, July 3-5, 2008. (
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W. Takeuchi, M. Hiramatsu, Y. Tokuda, H. Kano M. Hori. Control of Graphene Sheet Structure Using Oxygen Gas Addition to C2F6/H2 Plasma 7th Korea-Japan Workshop on Plasma Technology, Sungkyunkwan University, Suwon, Korea, July 3-5, 2008. (
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S. Kondo, O. Stepanovic, K. Yamakawa, S. Den, M. Hiramatsu, M. Hori . Growth Mechanism of Carbon Nanowalls Synthesized by Irradiations of Ions and Radicals 7th Korea-Japan Workshop on Plasma Technology, Sungkyunkwan University, Suwon, Korea, July 3-5, 2008. (
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H. Yamamoto, K. Takeda, M. Sekine, M. Hori . Evaluating Damages on Porous SiOCH Film During H2/N2 Plasma Ashing Process 7th Korea-Japan Workshop on Plasma Technology, Sungkyunkwan University, Suwon, Korea, July 3-5, 2008. (
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M. Ohira, M. Hiramatsu, M. Hori. Shape Change of Carbon Nanowalls Grown using Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition 7th Korea-Japan Workshop on Plasma Technology, Sungkyunkwan University, Suwon, Korea, July 3-5, 2008. (
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K. Takeda, T. Ohta, M. Ito, M. Hori. Micromachining Process Employing Electron-Beam-Excited Plasma 3rd International School of Advanced Plasma Technology, Villa Monastero, Varenna, Italy, July 28-31, 2008. (
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H. Inui, Y. Matsudaira, H. Kano, N. Yoshida, M. Hori. Characterization of Nonequilibrium Atmospheric Pressure Plasma with Ultrahigh Electron Density and its Application to Glass Surface Cleaning 3rd International School of Advanced Plasma Technology, Villa Monastero, Varenna, Italy, July 28-31, 2008. (
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M. Hori, S. Takashima, S. Takahashi, K. Yamakawa, S. Den, H. Kano, M. Sekine, M. Shiratani, Y. Setsuhara. Optical Probe for Atomic Radical Monitoring and its Application to Advanced Plasma Nano-processing based on Plasma Science 1st International Conference on Microelectronics and Plasma Technology, Ramada Plaza Jeju Hotel, Jeju, Korea, August 18-20, 2008 . (
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H. Inui, H. Kano, Y. Suzuki, D. Sutou, K. Nakada M. Hori . Nonequilibrium Atmospheric Pressure Plasma Excited by Three-Phase AC and Its Application to Surface Modification of Polymer Materials International Interdisciplinary-Symposium on Gaseous and Liquid Plasmas, Hotel Crescent, Tohoku University Akiu/Sendai, Japan, September 5-6, 2008. (
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H. Inui, H. Kano, Y. Suzuki, D. Sutou, K. Nakada M. Hori. Three-phase AC Excited Nonequilibrium Atmospheric Pressure Plasma and Surface Modification Process of Polymer Materials International Congress on Plasma Physics 2008, Fukuoka International Congress Center, Japan, September 8-12, 2008 . (
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S. Kondo, M. Hiramatsu, M. Hori. Initial Growth Phase of Carbon Nanowalls Synthesized by Irradiation of Ions and Radicals International Congress on Plasma Physics 2008, Fukuoka International Congress Center, Japan, September 8-12, 2008. (
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Y. Matsudaira, H. Inui, H. Kano, N. Yoshida M. Hori. Development of Novel Nonequilibrium Atmospheric Pressure Plasma with Ultrahigh Electron Density and High Cleaning Performance on Glass Surface International Congress on Plasma Physics 2008, Fukuoka International Congress Center, Japan, September 8-12, 2008. (
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T. Ohta, Y. Tachibana, N. Takota, M. Ito, S. Takashima, Y. Higashijima, H. Kano, S. Den, M. Hori. Simultaneous Monitoring of Absolute Densities of Multi Metallic Atoms in Magnetron Sputtering Employing Micro Hollow Cathode Lamp 11th International Conference on Plasma Surface Engineering (PSE), Kongresshaus (Congress Center), Garmisch-Partenkirchen, Germany, September 15-19, 2008. (
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T. Ohta, S. Iseki, K. Yamamoto, M. Ito, H. Kano, Y. Higashijima, M. Hori. Sterilization Mechanism of Penicillium Digitatum using Non-equilibrium Atomospheric Pressure Plasma 11th International Conference on Plasma Surface Engineering (PSE), Kongresshaus (Congress Center), Garmisch-Partenkirchen, Germany, September 15-19, 2008. (
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E. Shibata, H. Okamoto, M. Sekine, M. Hori. Surface Reaction on Low-k Film in Etching Process Employing Alternative Fluorocarbon Gas 34th International Conference on Micro and Nano Engineering, Hilton Athens Hotel, Athens, Greece, September 15-18, 2008 . (
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W. Takeuchi, M. Hiramatsu, Y. Tokuda, H. Kano, M. Hori. Control of Structure and Electrical Properties of Carbon Nanowalls: Effect of N2/O2 Addition to Fluorocarbon Plasma CVD with H Radical Injection 2008 International Conference on Solid State Device and Materials (SSDM), Tsukuba International Congress Center, Tsukuba, Japan, September 23-26, 2008 . (
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S. Takashima, R. Saito, S. Uchida, K. Takeda, M. Fukasawa, K. Oshima, K. Nagahata, T. Tatsumi, M. Hori. Diagnostics of Plasma Induced Damages on Low-k SiOCH Films 2008 International Conference on Solid State Device and Materials (SSDM), Tsukuba International Congress Center, Tsukuba, Japan, September 23-26, 2008. (
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Y. Matsudaira, H. Inui, N. Yoshida, H. Kano, M. Hori. Gas-Phase Diagnostics of Novel Nonequilibrium Atmospheric-Pressure Plasma with Ultrahigh Electron Density (1016 cm-3) and Glass Surface Cleaning 13th European Summer School "Low Temperature Plasma Physics: Basics and Applications", Physikzentrum Bad Honnef, Bad Honnef, Germany, October 4-11, 2008. (
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T. Yamaguchi, T. Kimura, K. Ando, K. Takeda, M. Sekine, M. Hori. Radical density distribution in Dual Frequency Capacitively Coupled Etching Plasma 13th European Summer School "Low Temperature Plasma Physics: Basics and Applications, Physikzentrum Bad Honnef, Bad Honnef, Germany,, October 4-11, 2008. (
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H. Kuroda, H. Yamamoto, M. Ito, T. Ohta, M. Sekine, M. Hori. Controlling Etch Processes of Low-k Films based on Measurement of Substrate Temperature by Low-coherence Interferometer 13th European Summer School "Low Temperature Plasma Physics: Basics and Applications", Physikzentrum Bad Honnef, Bad Honnef, Germany, October 4-11, 2008. (
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Y. Miyawaki, K. Takeda, M. Fukasawa, K. Oshima, K. Nagahata, T. Tatsumi, S. Takashima, M. Sekine, M. Hori. Damages on Organic Low-k Films due to VUV, UV Radiation, Radical and Ion in Dual Frequency Capacitively Coupled Plasma 13th European Summer School "Low Temperature Plasma Physics: Basics and Applications", Physikzentrum Bad Honnef, Bad Honnef, Germany, October 4-11, 2008. (
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Y. Matsudaira, H. Inui, N. Yoshida, H. Kano, M. Hori. Development of Novel Nonequilibrium Atmospheric Pressure Plasma with Ultrahigh Electron Density (1016 cm-3) and Its Applications 2nd Japanese-German Student Workshop on Plasma Science and Technology, Ruhr-University of Bochum, Bochum, Germany, October 12-14, 2008. (
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T. Yamaguchi, T. Kimura, K. Ando, K. Takeda, M. Sekine, M. Hori. Behavior of Radicals in Dual Frequency Capacitively Coupled Etching Plasma 2nd Japanese-German Student Workshop on Plasma Science and Technology, Ruhr-University of Bochum, Bochum, Germany, October 12-14, 2008 . (
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H. Kuroda, H. Yamamoto, M. Ito, T. Ohta, M. Sekine, M. Hori. Radical Control of Plasma Etching Process through Substrate Temperature Measured by Low-coherence Interferometer 2nd Japanese-German Student Workshop on Plasma Science and Technology, Ruhr-University of Bochum, Bochum, Germany, October 12-14, 2008. (
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Y. Miyawaki, K. Takeda, M. Fukasawa, K. Oshima, K. Nagahata, T. Tatsumi, S. Takashima, M. Sekine, M. Hori. Damages on Organic Low-k Films due to VUV, UV Radiation, Radical and Ion in Dual Frequency Capacitively Coupled Plasma 2nd Japanese-German Student Workshop on Plasma Science and Technology, Ruhr-University of Bochum, Bochum, Germany, October 12-14, 2008. (
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H. Inui, Y. Matsudaira, N. Yoshida, H. Kano, M. Hori. Diagnostics of Nonequilibrium Atmospheric Pressure Plasma with Ultra High Electron Density for Surface Cleaning Processes 61st Annual Gaseous Electronics Conference (GEC), Marriott Dallas/Addison Quorum, Dallas, Texas, USA, October 13-17, 2008. (
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Chang S. Moon, K. Takeda, T. Hayashi, S. Takashima, M. Sekine, Y. Setsuhara, M. Shiratani, M. Hori . Surface Loss Rate of H and N Radicals in H2/N2 Plasma Etching Process 61st Annual Gaseous Electronics Conference (GEC), Marriott Dallas/Addison Quorum, Dallas, Texas, USA, October 13-17, 2008. (
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S. Kondo, O. Stepanovic, K. Yamakawa, S. Den, M. Hiramatsu, M. Hori . Effects of High Energy Ar Ions on Synthesis of Carbon Nanowalls 61st Annual Gaseous Electronics Conference (GEC), Marriott Dallas/Addison Quorum, Dallas, Texas, USA, October 13-17, 2008. (
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S. Kondo, O. Stepanovic, K. Yamakawa, S. Den, M. Hiramatsu, M. Hori . Initial Formation of Carbon Nanowalls Synthesized by Ar Ions and CFX/H Radicals 61st Annual Gaseous Electronics Conference (GEC), Marriott Dallas/Addison Quorum, Dallas, Texas, USA, October 13-17, 2008. (
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H. Yamamoto, K. Takeda, M. Sekine, M. Hori. Evaluation of Plasma Ashing Damages on Porous SiOCH Films by Measurement of H and N Radical Densities 61st Annual Gaseous Electronics Conference (GEC), Marriott Dallas/Addison Quorum, Dallas, Texas, USA, October 13-17, 2008. (
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K. Takeda, S. Takashima, R. Saito, M. Fukasawa, K. Nagahata, T. Tatsumi, M. Hori. Plasma Damages on Organic Low-k Film due to VUV Radiation, UV Radiation, Radicals, Radicals with Radiation, and Ions in H2/N2 Plasma Etching Processes 55th International Symposium American Vacuum Society (AVS), Hynes Convention Center, Boston, MA, USA, October 19-24, 2008. (
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Chang S. Moon, K. Takeda, M. Sekine, M. Hori, Y. Setsuhara, M. Shiratani. Impact of Combinatorial Plasma Process on the Development of Organic Low-k Dielectric Film Etching 55th International Symposium American Vacuum Society (AVS), Hynes Convention Center, Boston, MA, USA, October 19-24, 2008. (
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W. Takeuchi, M. Hiramatsu, Y. Tokuda, H. Kano, and M. Hori. Control of Structures and Electrical Properties of Carbon Nanowalls Using Plasma Enhanced CVD Employing N2/O2 Addition to C2F6/H2 Gases 55th International Symposium American Vacuum Society (AVS), Hynes Convention Center, Boston, MA, USA, October 19-24, 2008. (
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S. Kondo, O. Stepanovic, K. Yamakawa, S. Den, M. Hiramatsu, M. Hori. Growth Mechanism of Carbon Nanowalls Synthesized by Irradiation of Independently Controlled Ar Ions and CFX/H Radicals 55th International Symposium American Vacuum Society (AVS), Hynes Convention Center, Boston, MA, USA, October 19-24, 2008. (
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H. Yamamoto, K. Takeda, M. Sekine, M. Hori. Mechanism of Plasma Ashing Damages on Porous SiOCH Films 55th International Symposium American Vacuum Society (AVS), Hynes Convention Center, Boston, MA, USA, October 19-24, 2008. (
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H. Kuroda, H. Yamamoto, M. Ito, T. Ohta, M. Sekine, M. Hori. Control of Plasma Etching Process through Substrate Temperature Measured by Optical Fiber-type Low-coherence Interferometer 2008 International Microprocesses and Nanotechnology Conference, JAL Resort Sea Hawk Hotel, Fukuoka, Japan, October 27-30, 2008 . (
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S. Takahashi, R. Kawauchi, S. Den, T. Katagiri, H. Kano, T. Suzuki, T. Ohta, M. Ito, M. Hori. Development of Autonomous Nano-Etching Process System 30th International Symposium on Dry Process (DPS), KOKUYO Hall, Tokyo, Japan, November 26-28, 2008. (
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H. Mikuni, W. Takeuchi, M. Hiramatsu, H. Kano, Y. Tokuda, M. Hori. Fabrication of Bridge-shaped Carbon Nanowall Using Electron Beam Excited Plasma Enhanced CVD IUMRS International Conference in Asia 2008, Nagoya Congress Center, Nagoya, Japan, December 9-13, 2008. (
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H. Yamamoto, K. Takeda, M. Sekine, and M. Hori. Development of Quantitative Measuring Method for Damaged Layer on Porous SiOCH Film during H2 / N2 Plasma Ashing IUMRS International Conference in Asia 2008, Nagoya Congress Center, Nagoya, Japan, December 9-13, 2008 . (
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E. Shibata, H. Okamoto, M. Sekine, M. Hori. Role of Nitrogen in Low-k Film Etching Process Employing C5F10O/N2/Ar Plasma IUMRS International Conference in Asia 2008, Nagoya Congress Center, Nagoya, Japan, December 9-13, 2008. (
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Y. Abe, K. Takeda, , M. Sekine, M. Hori. Absolute Density and Translational Temperature of Hydrogen Atoms in the High Pressure VHF Capasitively Coupled Plasma IUMRS International Conference in Asia 2008, Nagoya Congress Center, Nagoya, Japan, December 9-13, 2008. (
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A. Malinowski, W. Takeuchi, M. Sekine, M. Hori, D. Tomaszewski. Nano Carbon Based Transistor for Future Generation FET Devices IUMRS International Conference in Asia 2008, Nagoya Congress Center, Nagoya, Japan, December 9-13, 2008. (
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