S. Takashima, S. Arai, M. Hori, T. Goto, A. Kono, M. Ito, and K. Yoneda. Characteristics of H2 Micro Hollow Cathode Plasma and Its Application for Vacuum Ultraviolet Absorption Spectroscopy,, International Symposium on Electron-Molecule Collisions and Swarms, Tokyo, Japan, 1999. pp. 99-100 (
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H. Ohta, A. Nagashima. M. Ito, M. Hori, and T. Goto. Control of Ion Bombardment and Species for Ultra Low Temperature Formation of Silicon Nitride Gate Dielectric Film Using Plasma Chemical Vapor Deposition,, 1999 International Conference on Solid State Devices and Materials, Tokyo, Japan, 1999. pp. 156-157 (
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K. Murata, M. Ito, M. Hori, and T. Goto. Control of Initial Layer Low Temperature and High Deposition Rate Polycrystalline Silicon Film Formation Process,, 1999 International Microprocess and Nanotechnology Conference, Yokohama, Japan, 1999. pp. 212-213 (
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N. Nishizawa, R. Okamura, and T. Goto. Compact System of Wavelength Tunable Femtosecond Soliton Pulse Generation in 1.56-1.85um using Optical Fibers, The Pacific Rim Conference on Lasers and Electro-Optics 1999 (CLEO/Pacific Rim 99), Seoul, Korea, September, 1999. pp. 795-796 (
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M. Nakamura, H. Nakayama, M. Ito, M. Hori, A. Kono, T. Goto, and N. Ishii. Measurement of Spatial distribution of Absolute CFx Radical Densities in a Plasma Reactor Using Infrared Diode Laser Absorption Spectroscopy and Laser-Induced Fluorescence, The Pacific Rim Conference on Lasers and Electro-Optics 1999 (CLEO/Pacific Rim 99), Seoul, Korea, September, 1999. P1.16, pp. 352-353 (
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K. Fujita, S. Kobayashi, M. Ito, M. Hori, and T. Goto. Environmentally Harmonized Plasma Etching Process Using Laser Ablation of Various Solid Materials, The Pacific Rim Conference on Lasers and Electro-Optics 1999 (CLEO/Pacific Rim 99), Seoul, Korea, September, 1999. ThF3, pp. 626-627 (
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M. Ito, M. Nakamura, M. Hori, and T. Goto. Spatial Distribution Measurement of Radicals in C4F8 and SiF4 Plasmas Using Infrared Diode Laser Absorption Spectroscopy and Laser- Induced Fluorescence,, 9th International Symposium on Laser-Aided Plasma Diagnostics (LAPD), California, USA, 1999. pp. 146-151 (
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M. Hori, K. Kamiya, T. Goto, and M. Ito. In-situ Observation of Surface Reaction on Si3N4 Films in ECR Selectively Etching of SiO2 over Si3N4 Process,, 1999 Joint International Meeting on Electrochemical society and Dry Process Symposium, Hawaii, USA, 1999. Vol. 99-2, p. 677 (
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H. Nagai, M. Hiramatsu, M. Nawata, J. Kamiiissaka, M. Hori, and T. Goto. Photo-Induced Etching of Metal Fluoride Film Using Synchrotoron Radiation, 1999 Joint International Meeting on Electrochemical society and Dry Process Symposium, Hawaii, USA, 1999. Vol. 99-2, p. 1447 (
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R. Goto, N. Nishizawa, T. Goto, M. Suzuki, M. Mori, and K. Yamane. Step-Tunable Spare Source in WDM Systems with an Intermodal Injection Locked Fabry-Perot LD using Four-Wave-Mixing, 4th Optoelectronics and Communication Conference (OECC 99), Beijing, China, October, 1999. pp. 1330-1331 (
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H. Kasuya, M. Mori, R. Goto, M. Suzuki, T. Goto, and K. Yamane. All-Optical Mode-Locking of Fabry-Perot Laser Diode by Injection CW Light at the Center Frequency of Two Longitudinal Modes, 4th Optoelectronics and Communication Conference (OECC 99), Beijing, China, October, 1999. pp. 1308-1310 (
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N. Nishizawa, M. Mori, T. Goto, and K. Yamane. Noise Reduction of Optical Pulses using Variable Spectral Filters and Optical Fibers, 4th Optoelectronics and Communication Conference (OECC 99), Beijing, China, October, 1999. pp. 1379-1381 (
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Y. Matsuo, N. Nishizawa, T. Goto, and M. Mori. Analysis of Wavelength Tunable Femtosecond Soliton Pulse Generation using Pulse Width Variable Fiber Laser, 4th Optoelectronics and Communication Conference (OECC 99), Beijing, China, October, 1999. pp. 1511-1513 (
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K. Teii, H. Ito, M. Ishikawa, M. Ito, M. Hori, T. Takeo, T. Kato, and T. Goto. Optical Diagnostics of Low-pressure Inductively Coupled Plasma for Nanocrystalline Diamond Growth,, XXIV International Conference on Phenomena in Ionized Gases, Warsaw, Poland, 1999. Vol. 1 pp. 87-88 (
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H. Nakayama, M. Nakamura, M. Ito, M. Hori, A. Kono, T. Goto, and N. Ishii. Spatial Distribution Measurement of Absolute CFx Radical Densities in Electron Cyclotron Resonance Fluorocarbon Plasma, XXIV International Conference on Phenomena in Ionized Gases, Warsaw, Poland, 1999. Vol. 1 pp. 99-100 (
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K. Teii, M. Ito, M. Hori, T. Goto, and N. Ishii. Observation of Polymeric Species Produced in High-density Fluorocarbon Plasma,, XXIV International Conference on Phenomena in Ionized Gases, Warsaw, Poland, 1999. Vol. 1 pp. 83-84 (
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K. Fujita, S. Kobayashi, M. Ito, M. Hori, and T. Goto. Behaviors and Control of CFx(X=1-3) Radicals in Environmentally Harmonized ECR Plasma Employing a Novel Radical Source,, XXIV International Conference on Phenomena in Ionized Gases, Warsaw, Poland, 1999. Vol. 1 pp. 33-34 (
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N. Nishizawa, H. Nagai, and T. Goto. 1.56-2.03 μm Widely Wavelength Tunable Femtosecond Soliton Pulse Generation Using Optical Fibers, IEEE Lasers and Electro-Optics Society 1999 Annual Meeting (LEOS 99), San Francisco, USA, November, 1999. pp. 179-180 (
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M. Ito, M. Nakamura, M. Hori, T. Goto, and N. Ishii. Spatial distribution measurements of absolute CFx (x=1-2) radical densities using single path infrared diode laser absorption spectroscopy and laser-induced fluorescence technique, 52nd Annual Gaseous Electronics Conference (GEC), Norfolk, Virginia, USA, 1999. DT1 6, pp. 17 (
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M. Ito, S. Sumiya, Y. Mizutani, M. Hori, T. Goto, S. Samukawa, and T. Tsukada. Diagnostics of ultra high frequency SiH4/H2 plasmas for synthesizing polycrystalline silicon thin film at low substrate temperatures, 52nd Annual Gaseous Electronics Conference (GEC), Norfolk, Virginia, USA, 1999. IWP10 69, pp. 54-55 (
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S. Takashima, M. Hori, A. Kono, T. Goto, M. Ito, and K. Yoneda. Development of Vacuum Ultraviolet Absorption Spectroscopy using High Pressure H2 Microdischarge Hollow Cathode Lamp for Measurements of H Atom Density in Plasmas, 52nd Annual Gaseous Electronics Conference (GEC), Norfolk, Virginia, USA, 1999. DT1 6, pp. 16 (
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S. Takashima, M. Hori, A. Kono, T. Goto, M. Ito, and K. Yoneda. Measurement of Atomic Species in High-Density Reactive Plasmas using Vacuum Ultraviolet Absorption Spectroscopy with High Pressure Microdischarge Hollow Cathode Lamp, 52nd Annual Gaseous Electronics Conference (GEC), Norfolk, Virginia, USA, 1999. ETP7 85, pp. 35 (
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H. Ito, K. Teii, M. Ito, M. Hori, T. Takeo, and T. Goto. Diamond Formation Using a Low-Pressure Inductively Coupled Plasma, 46th International Symposium of American Vacuum Society (AVS), Seattle, Washington, USA, 1999. TF-MoP8 pp. 54 (
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M. Hori, H. Ohta, A. Nagashima, M. Ito, and T. Goto. Ultra-Low-Temperature Formation of Silicon Nitride Gate Dielectric Films by Novel Plasma Technique, 46th International Symposium of American Vacuum Society (AVS), Seattle, Washington, USA, 1999. PS+FrM10, pp.218 (
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K. Fujita, S. Kobayashi, M. Hori, T. Goto, and M. Ito. Environmentally Harmonized Silicon Oxide Selective Etching Process Employing Novel Radical Injection Technique, 46th International Symposium of American Vacuum Society (AVS), Seattle, Washington, USA, 1999. MS+PS+ThM11, pp. 179 (
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T. Goto, and N. Nishizawa. Compact System of Widely Wavelength-Tunable Femtosecond Soliton Pulse Generation Using Optical Fibers Frontier Science Research Conference (FSRC), Science and Technology of Optical Fibers, La Jolla, USA, December, 1999. (
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