Invited talk

  1. Kenji Ishikawa, Hiromasa Tanaka, Hirokazu Hara, Shin-ichi Kondo, Masafumi Ito, Kazunori Koga, Masaharu Shiratani, and Masaru Hori (KEYNOTE )
    Plasma-driven science for emerging plasma-processing technologies,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023/3/9. 09aA08K

  2. Masaru Hori, Hiromasa Tanaka, Camelia Miron, Kenji Ishikawa, Shinya Toyokuni, Kae Nakamura, Hiroaki Kajiyama and Masaaki Mizuno (INVITED )
    High Performances of Plasma-activated Lactated Ringer’s Solution for Medical Treatment,
    The 14th EU-Japan Joint Symposium on Plasma Processing (JSPP-14) , Okinawa, Japan, 2023/4/18. I-29

  3. Kazunori Shinoda, Katsuya Miura, Kenji Maeda, Masaru Izawa, Thi-Thuy-Nga Nguyen, Kenji Ishikawa, and Masaru Hori (INVITED )
    In-situ analysis of surface reactions in plasma-assisted thermal-cyclic atomic layer etching of thin films,
    The 14th EU-Japan Joint Symposium on Plasma Processing (JSPP-14), Okinawa, Japan, 2023/4/20. I-36

  4. H.Kondo, H.Zhou, T.Tsutsumi, K.Ishikawa, M.Sekine, and M.Hori (INVITED )
    Recent Progress in the Synthesis of Functional and Three-Dimensional Carbon Nano-Composites By Gas-Liquid Interface Plasma,
    243rd ECS Meeting, Boston, MA, 2023/5/30. DO1-1498

  5. Hiramatsu, Mineo; Takeda, Keigo; Kondo, Hiroki; Hori, Masaru (KEYNOTE )
    Plasma Synthesis of Graphene-Based Materials: Functionalization and Applications
    THERMEC'2023, Vienna, Austria, 2023/7/3

  6. Kazunori Shinoda, N. Miyoshi, H. Kobayashi, M. Izawa, K. Ishikawa, M. Hori (INVITED )
    In-Situ Analysis of Surface Reactions on Thin Films in Plasma-Assisted Thermal-Cyclic Atomic Layer Etching
    23rd International Conference on Atomic Layer Deposition, 10th International Atomic Layer Etching Workshop (ALD/ALE2023), Bellevue, Washington, USA, 2023/7/25

  7. Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroaki Kajiyama, Shinya Toyokuni2, Masaru Hori (INVITED )
    Plasma-bio application using plasma-activated solutions
    65th KVS Suumer Annual Conference & IFFM 2023, Jeju, Korea, 2023.08.21

  8. Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroaki Kajiyama, Shinya Toyokuni, Masaru Hori (INVITED )
    Plasma-activated solutions for bio-medical application
    3rd Asia pacific conference on plasma and terahertz science(APCOPTS), Busan, Korea, 2023.08.26

  9. Camelia Miron, Hiromasa Tanaka, Nikolay Britun, Kenji Ishikawa, Du Liyin, Taishi Yamakawa, Yuya Kurebayashi, Takashi Kondo, Hiroki Kondo, Hiroaki Kajiyama, Shinya Toyokuni, Masaaki Mizuno, Masaru Hori (PLENARY )
    Cold Atmospheric Pressure Plasma-Activated Liquids for Cancer Treatment
    The 11th IEEE International Conference on E-Health and Bioengineering(EHB2023), Bucharest, Romania, 2023.10.10

  10. Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Camelia Miron, Yasumasa Okazaki, Shinya Toyokuni, Kae Nakamura, Hiroaki Kajiyama, Masaru Hori (INVITED )
    Biomedical applications of plasma-activated solutions,
    The 76th Annual Gaseous Electronics Conference (GEC76), Michigan League, USA, 2023.10.10. GT1.00005

  11. Shih-Nan Hsiao, Makoto Sekine, Yuki Iijima, Ryutaro Suda, Masahiko Yokoi, Yoshihide Kihara and Masaru Hori (INVITED )
    Recent Advances in Atomic Layer Etching and Cryogenic etching for Si-based Semiconductor Processing
    2023年度會員大會暨論文發表會(TVS-2023), Kaohsiung,Taiwan, 2023.10.27

  12. M. K. T. Mo, S.-N. Hsiao, M. Sekine, M. Hori, and N. Britun (INVITED )
    Simultaneous measurements of F, O and H ground state atom density in an industry-grade etching plasma,
    Global Plasma Forum in Aomori, Aomori, Japan, 2023.10.16. DX-I-8

  13. Nikolay Britun, Michael K. T. Mo, Shih-Nan Hsiao, Masaru Hori (INVITED )
    Poly-diagnostics of a nanosecond He-based atmospheric plasma,
    Global Plasma Forum in Aomori, Aomori, Japan, 2023.10.16. DX-I-7

  14. H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, H. Kousaka, and M. Hori (INVITED )
    Plasma-Enhanced Deposition Mechanism of Hydrogenated Amorphous Carbon Analyzed ByCombining Reactive Species Measurement and Machine Learning,
    244th ECS Meeting, Gothenburg, Sweden, 2023.10.11. D02-1170

  15. Masaru Hori (PLENARY )
    Booming Low-temperature Plasma Sciences for a Creation of New Value,
    AAPPS-DPP2023, Nagoya, Japan, 2023.11.15. PL-14

  16. Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Hirotaka Hamamura,Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori (INVITED )
    Wet-like plasma for the next generation of atomic layer etching,
    AAPPS-DPP2023, Nagoya, Japan, 2023.11.13. A-10-I4

  17. Shinya Toyokuni, Hao Zheng, Yasumasa Okazaki, Kae Nakamura, Hiroaki Kajiyama, Hiromasa Tanaka, Keiji Ishikawa and Masaru Hori (INVITED )
    Low-temperature plasma as a ferroptosis inducer in cancer cells,
    Global Plasma Forum in Aomori , Aomori, Japan, 2023.11.16. B-KN-1

  18. Yuan-Tai Lai, Che-Ya Wu, Shih-Nan Hsiao, Masaru Hori, Shao-Hsuan Chin, Pin-Hao Huang, Yun-Chen Chan, Jenq-Gong Duh (PLENARY)
    Exploration of Atmospheric Pressure Plasma Technique in the Surface Modification on Anode Material for High–rate Lithium–ion Battery and Rapid Organic Fertilizer Manufacturing for Sustainable Farming,
    Global Plasma Forum in Aomori, Aomori, Japan, 2023.11.16. PL-3



General

  1. Kohei Masuda,Makoto Sekine, Kenji Ishikawa, Shih-Nan Hsiao,Takayoshi Tsutsumi,Hiroki Kondo, and Masaru Hori.
    Study on plasma process using adsorbed C7F14 as an etchant,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.06. 06P-P1-26 (POSTER )

  2. Ngo Quang Minh, Ngo Van Nong, Osamu Oda, and Masaru Hori.
    Synthesis and characteristics of carbon nanowalls by combining different plasma methods,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.06. 06pC06O (ORAL )

  3. Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Shih-Nan Hsiao, Hirotaka Hamamura, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, and Masaru Hori.
    Non-halogen plasma etching of metal gate TiAlC,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.06. 06P-P1-24 (POSTER )

  4. Trung-Nguyen Tran,Thi-Thuy-Nga Nguyen,Kenji Ishikawa, Shih-Nan Hsiao,Toshio Hayashi,Makoto Sekine, and Masaru Hori.
    Etching silicon oxide, silicon nitride, and polysilicon films in CH2FCHF2 hydrofluorocarbon plasma,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.06. 06P-P1-23 (POSTER )

  5. Yusuke Izumi, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori.
    Self-limited fluorination of electron-beam-irradiated GaN surface,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.06. 06pB07O (ORAL )

  6. Kazuki Toji, Takayoshi Tsutsumi, Kenji Ishikawa, S-N. Hsaio, Makoto Sekine, and Masaru Hori.
    Positive and negative ion behaviors in DC-imposed Ar/SF6 pulsed plasma,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.06. 06P-P1-22 (POSTER )

  7. Shih-Nan Hsiao, Makoto Sekine and Masaru Hori.
    In situ monitoring surface structure during hydrofluorocarbon assisted atomic layer etching of silicon nitride using CF4/H2 and H2 plasmas,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.06. 06pB06O (ORAL )

  8. Ma. Shanlene D.C. Dela Vega, Ayane Kitahara, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Atsushi Takano, Yushu Matsushita and Masaru Hori.
    Etching behavior of lamellar poly(styrene-b-2-vinylpyridine) block copolymer under N2/H2 plasma process,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.06. 06P-P1-25 (POSTER )

  9. Liyin Du, Carmelia Miron, Saitoshi Kashiwagura, Takashi Kondo, Hiromasa Tanaka, Kenji Ishikawa, Masaaki Mizuno, Shinya Toyokuni, Hiroaki Kajiyama, and Masaru Hori.
    Investigation of anti-tumor effect mechanism by plasma irradiated L-Arginine solution,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.07. 07aE03O (ORAL )

  10. Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori.
    Contribution analysis of process parameters in plasma-enhanced chemical vapor deposition of amorphous carbon,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.07. 07aB03O (ORAL )

  11. Yuki Kojima, Hiroki Kondo, Masahiro Tanaka, Kenji Ishikawa, Hiroshi Hashizume, Masaru Hori.
    Morphological control of human mesenchymal stem cells with electrical stimulation on carbon nanowalls.,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.07. 07aE04O (ORAL )

  12. Hiroshi Hashizume, Kohei Nakano, Kaoru Sanda, Akiko Abe, Hiroko Mizuno, Manasikan Thammawong, Camelia Miron, Nikolay Britun, Teruaki Shimazu, Hiromasa Tanaka, and Masaru Hori.
    Cold plasma treatment during cultivation affects flesh firmness of strawberry fruits,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.07. 07P-P4-50 (POSTER )

  13. Hiroshi Hashizume, Hidemi Kitano, Hiroko Mizuno, Akiko Abe, Kaoru Sanda, Shih-Nan Hsiao, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Kenji Ishikawa, Shogo Matsumoto, Hitoshi Sakakibara, Yuji Hirosue , Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori..
    Control of generating white core in grains of brewer’s rice cultivar with direct plasma irradiation to spikelet after flowering,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.07. 07P-P4-49 (POSTER )

  14. K. Kodama, M. Miyachi, O. Oda, M. Hori, and D. Ueda.
    Self-aligned Ohmic Contact Formation Combining Growth of N+-GaN and Ohmic Metalization Using Pulsed Laser Deposition with Picosecond Laser,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.07. 07P-P2-29 (POSTER )

  15. Takumi Hashimoto, Hiroki Kondo, Hiromasa Tanaka, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Takao Yasui, Yoshinobu Baba, Mineo Hiramatsu and Masaru Hori.
    Morphological effect of carbon nanowalls on exosome capture,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.07. 07P-P4-47 (POSTER )

  16. Ryuichi Ohashi, Naoyuki Iwata, Hiroyuki Kato, Yasuhiro Nishikawa, Motoyuki Shimizu, Masashi Kato, Masaru Hori and Masafumi Ito.
    Enhancement Effects of Ambient-Air Glow-Discharge Treatment on Enzymatic Digradation of Lignin,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.07. 07P-P4-53 (POSTER )

  17. Kazuma Okamoto, Hiroyuki Kato, Masahiro Maebayashi, Motoyuki Shimizu, Masashi Kato, Masaru Hori and Masafumi Ito.
    Enhancement of Reacation Efficiency of Ambient-Air Glow Discharge with Carboxymethyl-Cellulose by Narrowing Solution-Flow Path,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.07. 07P-P4-54 (POSTER )

  18. Deng-Ke Xi, Xian-Hui Zhang, Si-Ze Yang, Seong Shan Yap, Kenji Ishikawa, Masaru Hori and Seong Ling Yap.
    Effects of Plasma Treated Water on Papaya Seed Germination,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.07. 07P-P4-56 (POSTER )

  19. Arun Kumar Dhasiyan, Swathy Jayaprasad, Frank Wilson Amalraj, Naohiro Shimizu, Osamu Oda, Kenji Ishikawa and Masaru Hori.
    Study of the behavior of trimethyl gallium and triethyl gallium by OES and QMS for the growth of GaN by REMOCVD (radical-enhanced metalorganic chemical vapor deposition),
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.08. 08aD05O (ORAL )

  20. Takashi Kondo, Hiroshi Hashizume, Jun Kumagai, 1Hiromasa Tanaka, Kenji Ishikawa, Masaru Hori.
    Low temperature plasma chemistry of aqueous solutions of amino acids. A spin trapping study,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.08. 08P-P1-05 (POSTER )

  21. Yusuke Imai, Shih-Nan Hsiao, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori.
    Characterization of plasmas and polymerized hydrofluorocarbon films in capacitively coupled CF4/H2 plasmas,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.08. 06pB07O (POSTER )

  22. Naohiro Shimizu, Britun Nikolay, Reiko Tanaka, Osamu Oda, Ranjit Borude, Hiroki Hosoe, Satoshi Ino, Yosuke Inoue and Masaru Hori.
    Nano-Pulsed Plasma Study of the Wet Electrode Methods on Hydrogen Generation from High-Resistive Water,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.08. 08aB03O (ORAL )

  23. Shintaro Iba, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu and Masaru Hori.
    In-plane aligned growth of carbon nanowalls by ion irradiation control,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.08. 08aC03O (ORAL )

  24. Yasumasa Mori, Naoyuki Iwata, Tomiyasu Murata, Masaru Hori and Masafumi Ito.
    Intracellular Fluorescent of Nitric Oxide in Fibroblasts Irradiated by Electrically Neutral Radical 1 Yasumasa Mori,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.08. 08P-P1-01 (POSTER )

  25. Takashi Namizaki, Naoyuki Iwata, Ryugo Tero, Hiroki Kondo, Masaru Hori and Masafumi Ito.
    loping Observation of Supported Lipid Bilayer in Oxygen-Radical Activated L-Tryptophan Solution Using Atomic Force Microscope,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.08. 08P-P1-02 (POSTER )

  26. Taiga Nishida, Naoyuki Iwata, Tomiyasu Murata, Hiromasa Tanaka, Masaru Hori and Masafumi Ito.
    Effect of Lactate Activated with Nitrogen and Oxygen Radicals on Inactivation of Breast Cancer Cells,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.08. 08P-P1-03 (POSTER )

  27. Daichi Goto, Naoyuki Iwata, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Masafumi Ito and Masaru Hori.
    Analysis of Effect of Neutral-Oxygen-Radical Irradiation on Biodegradation of Polyethylene Terephthalate Using High-Performance Liquid Chromatography,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.08. 08P-P1-04 (POSTER )

  28. Yuya Kurebayashi, Kenji Ishikawa, Hiroshi Hashizume, Hiromasa Tanaka, Shinichi Akiyama and Masaru Hori.
    Effects of Non-Equilibrium Atmospheric Pressure Plasma on Zebrafish,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.08. 08P-P1-15 (POSTER )

  29. Kyosuke Sugie, Jun-Seok Oh, Hiromasa Tanaka, Masaru Hori and Masafumi Ito.
    Mass Spectrometric Study of Ions and Neutral Species Generated by a High-Density Atmospheric-Pressure Plasma Source,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.08. 08P-P1-16 (POSTER )

  30. Koji Yamakawa, Hiroyuki Yamamoto, Shoji Den, Seigo Takashima, Masanao Iwata, Kenji Ishikawa and Masaru Hori.
    Effect of Deposition Temperature for Cubic Boron Nitride Film by Electron Beam Excited Plasma,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.08. 08P-P3-39 (POSTER )

  31. Nikolay Britun, Peterraj Dennis Christy, Shih-Nan Shiao, Masaru Hori.
    Multi-diagnostic study of nanosecond atmospheric jet discharge,
    ISPlasma2023 / IC-PLANTS2023, Gifu, Japan, 2023.03.09. 09aB02O (ORAL )

  32. Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori.
    Global and local contribution analysis of process parameters in Plasma enhanced chemical vapor deposition of amorphous carbon har,
    The 4th International Conference on Data Driven Plasma Sciences ( ICDDPS-4 ), Okinawa, Japan, 2023.04.18. O-12 (ORAL )

  33. K.Inoue, N.Takagi, T.Ito, Y.Shimizu, K.Ishikawa, K.Ito, M.Hori and K.Terashima.
    Subsequent functionalization of hexagonal boron nitride after plasma processing in solution for preparation of polymer composite materials,
    25th International Symposium on Plasma Chemistry (ISPC25), Kyoto, Japan, 2023.05.22. POS-7-106 (POSTER )

  34. Hiroshi Hashizume, Shogo Matsumoto, Hitoshi Sakakibara, Kaoru Sanda, Akiko Abe, Hiroko Mizuno, Kenki Tsubota, Mikiko Kojima, Yumiko Takebayashi, Genki Yuasa, Satoe Tohno, Hiromasa Tanaka, Kenji Ishikawa, Masafumi Ito, Hidemi Kitano, Takayuki Okuma, Yuji Hirosue, Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori.
    Efficacy of cold plasma for strawberry cultivation on fruit ripening process,
    25th International Symposium on Plasma Chemistry (ISPC25), Kyoto, Japan, 2023.05.23. 2-P-103 (POSTER )

  35. Nikolay Britun, Vladislav Gamaleev, Dennis Christy, Shih-Nan Hsiao, Masaru Hori.
    Time-resolved poly-diagnostics of atmospheric ns He jet discharge,
    25th International Symposium on Plasma Chemistry (ISPC25), Kyoto, Japan, 2023.05.25. POS-3-301 (POSTER )

  36. Shih-Nan Hsiao, Nikolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori.
    A comparative study on the CF4/H2 and HF/H2 plasmas for etching of highly hydrogenated SiN films,
    25th International Symposium on Plasma Chemistry (ISPC25), Kyoto, Japan, 2023.05.26. 5-A-206 (ORAL )

  37. Hiroshi Hashizume, Shogo Matsumoto, Kaoru Sanda, Hiroko Mizuno, Akiko Abe, Genki Yuasa, Satoe Tohno, Mikiko Kojima, Yumiko Takebayashi, Hiromasa Tanaka, Kenji Ishikawa, Masafumi Ito, Hidemi Kitano, Hitoshi Sakakibara, Takayuki Okuma, Yoji Hirosue, Masayoshi Maeshima, Masaaki Mizuno, and Masaru Hori.
    Activation of strawberry fruit ripening with cold plasma treatment during cultivation
    4TH INTERNATIONAL WORKSHOP ON PLASMA AGRICULTURE (IWOPA4), Seoul, Korea, 2023.06.19. (ORAL )

  38. Hiroki Kondo, Takayoshi Tsutsumi, Mineo Hiramatsu, Masaru Hori.
    In-liquid plasma synthesis, morphological control, and functionalization of nanographene materials,
    THERMEC'2023, Vienna, Austria, 2023.07.03. G2 July-03 1 (ORAL )

  39. Shih-Nan Hsiao, Makoto Sekine1 and Masaru Hori.
    Atomic layer etching of SiN films with CF4/H2 surface modification and H2/N2 plasma exposure,
    International Conference on Phenomena in Ionized Gases ICPIG XXXV, Egmond aan Zee, The Netherlands, 2023.07.13. P4-41 (POSTER )

  40. Thi-Thuy-Nga Nguyen, K. Shinoda, S. Hsiao, H. Hamamura, Maeda, K. Yokogawa, M. Izawa, K. Ishikawa, M. Hori.
    Non-Halogen Plasma for Selective Removal of Titanium Compounds Applied in Advanced Atomic Layer Etching,
    23rd International Conference on Atomic Layer Deposition, 10th International Atomic Layer Etching Workshop (ALD/ALE2023), Bellevue, Washington, USA, 2023.07.24. ALE-MoA-14 (ORAL )

  41. ARUN KUMAR DHASIYAN, Swathy Jayaprasad, Frank Wilson Amalraj, Naohiro Shimizu, Osamu Oda, Kenji Ishikawa, Masaru Hori.
    The Effect of V/III Ratio on the Morphology and Structure of the Homo-epitaxial GaN Growth on Bulk GaN Substrates by Radical Enhanced Metal-Organic Chemical Vapor Deposition,
    2023 international Conference on Solid State Devices and Materials(SSDM), Nagoya, Japan, 2023.09.07. PS-11-19 (POSTER )

  42. Nikolay Britun, Michael K. T. Mo, Shih-Nan Hsiao, Masaru Hori.
    A comprehensive characterization of a He-based atmospheric nanosecond jet discharge for gas conversion
    The plasma road to sustainable chemical conversion workshop, Madeira, Portugal, 2023.09.04. (ORAL )

  43. Camelia Miron, Hiromasa Tanaka, Taishi Yamakawa, Du Lyin, Hiroki Kondo, Hiroshi Hashizume, Takashi Kondo, Kenji Ishikawa, Shinya Toyokuni, Masaaki Mizuno, and Masaru Hori.
    Physicochemical investigation of plasma treated polymer solutions for cancer treatment,
    MACRO 2023 Symposium at ICMPP, IASI, Iasi, Romania, 2023.10.06. PP5 (POSTER )

  44. Shih-Nan Hsiao, Makoto Sekine, Yuki Iijima, Ryutaro Suda, Yoshinobu Ohya, Yoshihide Kihara, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori.
    A pseudo-wet plasma etching mechanism for SiO2 at cryogenic temperature using hydrogen fluoride gas with in-situ surface monitoring,
    AVS 69th International Symposium and Exhibition (AVS 69), Portland, OR, USA, 2023.11.09. PS1-ThA-1 (ORAL )

  45. Shih-Nan Hsiao, Makoto Sekine, Takayoshi Tsutsumi, Kenji Ishikawa, Manabu Iwata, Maju Tomura, Yuki Iijima, Taku Gohira, Keiichi Matsushima, Yoshinobu Ohya, Masaru Hori.
    Plasma-based pseudo-wet mechanism for cryogenic SiO2 etching using hydrogen-contained fluorocarbon gases with an in-situ surface analysis,
    The 76th Annual Gaseous Electronics Conference (GEC76), Michigan League, USA, 2023.10.11. GW1.00002 (ORAL )

  46. Shih-Nan Hsiao, Yusuke Imai, Makoto Sekine, Nikolay Britun, Michael K. T. Mo, Yuki Iijima,Ryutaro Suda, Yoshinobu Ohya, Yoshihide Kihara, and Masaru Hori.
    A mechanism for cryogenic etching of SiO2 using CF4/H2 and HF plasmas based on in-situ monitoring techniques,
    36th International Microprocesses and Nanotechnology Conference (MNC 2023), Sapporo, Japan, 2023.11.16. 16C-2-4 (ORAL )

  47. Shih-Nan Hsiao, Makoto Sekine, Nikolay Britun, Michael Kin-Ting Mo, Yusuke Imai, Takayoshi Tsusumi, Kenji Ishikawa, Yuki Iijima, Masahiko Yokoi, Ryutaro Suda, Yoshihide Kihara and Masaru Hori.
    On the mechanism of high-speed SiO2 etching using hydrogen fluoride-contained plasmas at cryogenic temperature,
    Global Plasma Forum in Aomori, Aomori, Japan, 2023.10.18. DX-I-15 (ORAL )

  48. Camelia Miron, Hiromasa Tanaka, Taishi Yamakawa, Du Lyin, Hiroki Kondo, Hiroshi Hashizume, Takashi Kondo, Kenji Ishikawa, Shinya Toyokuni, Masaaki Mizuno, and Masaru Hori.
    Chemically Active Compounds Formed in Low-temperature Plasma Treated Liquids for Cancer Treatment,
    Global Plasma Forum in Aomori, Aomori, Japan, 2023.10.16. B-O-1 (ORAL )

  49. Liugang Hu, Kenji Ishikawa, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Hiroki Kondo, Makoto Sekine, and Masaru Hori.
    Selective removal of graphene by irradiation of remote oxygen plasma,
    Global Plasma Forum in Aomori, Aomori, Japan, 2023.10.16. GN-O-2 (ORAL )

  50. Ngo Quang Minh, Ngo Van Nong, Osamu Oda, Masaru Hori and Kenji Ishikawa.
    Synthesis and characteristics of carbon nanowalls using two-step growth combining different plasma chemical vapor deposition methods,
    Global Plasma Forum in Aomori, Aomori, Japan, 2023.10.16. GN-O-3 (ORAL )

  51. Chih-Yu Ma.
    Prevalence of antibiotic-resistant E. coli in wastewater treatment plant effluent and the southern watershed of Lake Biwa,
    Global Plasma Forum in Aomori, Aomori, Japan, 2023.10.17. P-44 (POSTER )

  52. M. K. T. Mo, S.-N. Hsiao, M. Sekine, M. Hori, and N. Britun.
    Simultaneous measurements of F, O and H ground state atom density in an industry-grade etching plasma,
    The 44th International Symposium on Dry Process (DPS2023), Nagoya, Japan, 2023.11.22. P-16 (POSTER )

  53. T. Yoshie, K. Ishikawa, T. Tsutsumi, M. Sekine, and M. Hori.
    Control of etching profile by bias supply timing in cyclic process using C4F8/SF6 gas modulated plasma,
    The 44th International Symposium on Dry Process (DPS2023), Nagoya, Japan, 2023.11.21. A-4 (ORAL )

  54. Liyin Du, Camelia Miron, Takashi Kondo, Hiromasa Tanaka, Kenji Ishikawa, Masaaki Mizuno, Shinya Toyokuni, Hiroaki Kajiyama, and Masaru Hori.
    Selective Cytotoxicity of Plasma-Treated L-Arginine Solution on Human Breast Cancer Cells,
    13th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2023), Busan, Korea, 2023.11.07. Tu1B-2 (ORAL )

  55. Kotaro Sato, Ming Yang, KaeNakamura, Hiromasa Tanaka, Masaru Hori, Miki Nishio, Akira Suzuki, Hideharu Hibi, Shinya Toyokuni.
    Ferroptosis induced by plasma-activated Ringer’s lactate solution prevents oral cancer progression,
    Global Plasma Forum in Aomori, Aomori, Japan, 2023.11.17. P-42 (POSTER )

  56. Kae Nakamura, Nobuhisa Yoshikawa, Hiromasa Tanaka, Kenji Ishikawa, Masaaki Mizuno, Shinya Toyokuni, Masaru Hori and Hiroaki Kajiyama.
    Plasma-activated solutions invigorate anti-tumor immune response in the intraperitoneal environments of ovarian cancer,
    Global Plasma Forum in Aomori, Aomori, Japan, 2023.11.17. P-43 (POSTER )

  57. Thi-Thuy-Nga Nguyen, Daijiro Akagi, Toshiyuki Uno, Takeshi Okato, Kenji Ishikawa, and Masaru Hori.
    Surface reactions during atomic layer etching of platinum by high-density nitrogen-oxygen plasma and organic acid vapor,
    AVS 69th International Symposium and Exhibition (AVS 69), Portland, OR, USA, 2023.11.10. AP+PS-FrM-4 (ORAL )

  58. Yusuke Imai, S. Hsiao, M. Sekine, T. Tsutsumi, K. Ishikawa, M. Iwata, M. Tamura, Y. Iijima, T. Gohira, K. Matsushima, Y. Ohya, M. Hori.
    Etching Selectivities of SiO2 and SiN Against a-C Films Using CF4/H2 with a Pseudo-Wet Plasma Etching Mechanism,
    AVS 69th International Symposium and Exhibition (AVS 69), Portland, OR, USA, 2023.11.06. PS+TF-MoM-6 (ORAL )

  59. Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Camelia Miron, Hiroshi Hashizume, Yasumasa Okazaki, Shinya Toyokuni, Kae Nakamura, Hiroaki Kajiyama, and Masaru Hori.
    Mechanisms of selective killing of cancer cells against normal cells by plasma-activated Ringer’s lactate solution,
    13th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2023), Busan, Korea, 2023.11.07. Tu1B-3 (ORAL )

  60. Taishi Yamakawa,Kae Nakamura, Masaaki Mizuno, Shinya Toyokuni, Hiroaki Kajiyama, Masaru Hori, Kenji Ishikawa and Hiromasa Tanaka.
    Evaluation of Autophagy-Inducing Substances in PAL,
    13th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2023), Busan, Korea, 2023.11.07. Tu1B-4 (ORAL )

  61. Koki Ono, Hiroki Kondo, Kenji Ishikawa, Wakana Takeuchi, Kenichi Uehara, Shigeo Yasuhara, Hiromasa Tanaka and Masaru Hori.
    Cellular Response to Electrical Stimulation on Carbon Nanowalls Coated with Silicon Carbide,
    13th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2023), Busan, Korea, 2023.11.07. Tu1B-5 (ORAL )

  62. Taito Yoshie, Kenji Ishikawa, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Takayoshi Tsutsumi, Makoto Sekine, and Masaru Hori.
    Transient behavior of cycle process in Ar plasma with alternately injected C4F8 and SF6,
    13th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2023), Busan, Korea, 2023.11.08. We3A-1 (ORAL )

  63. Tran Trung Nguyen, Kenji Ishikawa, Toshio Hayashi, Hiroshi Iwayama, Shih-Nan Hsiao, Makoto Sekine, and Masaru Hori.
    Unravelling Dissociation of Hydrofluorocarbon Molecules through Photoelectron–Photoion Coincidence (PEPICO) Studies,
    13th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2023), Busan, Korea, 2023.11.08. We3A-4 (ORAL )

  64. M. K. T. Mo, S.-N. Hsiao, M. Sekine, M. Hori, and N. Britun.
    Simultaneous measurements of F, O and H ground state atom density in an industry-grade etching plasma,
    The 44th International Symposium on Dry Process (DPS2023), Winc Aichi, Nagoya, Japan, 2023.11.22. P-16 pp.77 (POSTER )

  65. Shih-Nan Hsiao, Makoto Sekine, Kenji Ishikawa,Yuki Iijima, Yoshinobu Ohya and Masaru Hori.
    An approach to reduce surface charging with cryogenic plasma etching using hydrogen-fluoride contained gases,
    The 44th International Symposium on Dry Process (DPS2023), Winc Aichi, Nagoya, Japan, 2023.11.22. E-5 pp.45 (ORAL )

  66. T. Yoshie, K. Ishikawa, T. Tsutsumi, M. Sekine, and M. Hori.
    Control of etching profile by bias supply timing in cyclic process using C4F8/SF6 gas modulated plasma,
    The 44th International Symposium on Dry Process (DPS2023), Winc Aichi, Nagoya, Japan, 2023.11.21. A-4 pp. 9 (ORAL )

  67. Y. Imai, S-N. Hsiao, M. Sekine, K. Ishikawa, T. Tsutsumi, M. Iwata, M. Tomura,Y. Iijima, K. Matsushima and M. Hori.
    Etch selectivities of SiO2 and SiN against a-C films using CF4/H2 plasma at low temperature,
    The 44th International Symposium on Dry Process (DPS2023), Winc Aichi, Nagoya, Japan, 2023.11.22. E-4 pp.43 (ORAL )

  68. K. Toji, T. Tsutsumi, S-N. Hsiao, M. Sekine, M. Hori, and K. Ishikawa.
    Compositions of Ions Related with Electrode Materials in Pulsed Plasma for High-Aspect-Ratio Hole Etching,
    The 44th International Symposium on Dry Process (DPS2023), Winc Aichi, Nagoya, Japan, 2023.11.21. G-3 pp.197 (ORAL )

  69. T. Hayashi, K. Ishikawa, M. Sekine, and M. Hori.
    Dissociative properties of C4F6obtained using computational chemistry,
    The 44th International Symposium on Dry Process (DPS2023), Winc Aichi, Nagoya, Japan, 2023.11.22. P-3 pp.51 (POSTER )

  70. Tran Trung Nguyen, Toshio Hayashi, Hiroshi Iwayama, Shih-Nan Hsiao, Makoto Sekine, Masaru Hori and Kenji Ishikawa.
    Hydrofluorocarbon Molecule Dissociation through Photoeoctron-Photoion Coincidence (PEPICO)Studies,
    The 44th International Symposium on Dry Process (DPS2023), Winc Aichi, Nagoya, Japan, 2023.11.22. E-3 pp.41 (ORAL )

  71. Y. Izumi, T. Tsutsumi, H Kondo, M. Sekine, M. Hori, and K. Ishikawa.
    Electron-Beam-Assisted Self-limiting fluorination of GaN surface using XeF2 for Atomic Layer Etching,
    The 44th International Symposium on Dry Process (DPS2023), Winc Aichi, Nagoya, Japan, 2023.11.21. D-2 pp.29 (ORAL )

  72. S-N Hsiao, M. Sekine, K. Ishikawa, T.Tsutsumi, and M. Hori Y Iijima, R. Suda, Y. Kihara.
    A pseudo-wet cryogenic plasma etching of SiO2 investigated with in-situ surface monitoring,
    The 44th International Symposium on Dry Process (DPS2023), Winc Aichi, Nagoya, Japan, 2023.11.22. E-1 pp,37 (ORAL )

  73. S.Nunomura, T.Tsutsumi, I. Sakata and M Hori.
    Defect characterization at SiO2/Si interface throughout plasma processing and annealing,
    The 44th International Symposium on Dry Process (DPS2023), Winc Aichi, Nagoya, Japan, 2023.11.22. P-11 pp.67 (POSTER)