1. T. Ohta, M. Ito, Y. Tachibana, S. Taneda, S. Takashima, M. Hori, H. Kano, and S. Den
    Simultaneous monitoring of multimetallic atom densities in plasma processes employing a multimicrohollow cathode lamp
    Applied Physics Letters, Vol. 90 (25) (June, 2007) 251502 pp. 1-3,
    DOI: 10.1063/1.2751104

  2. Y. Hara, S. Takashima, K. Yamakawa, S. Den, H. Toyoda, and M. Hori
    Tunable low-energy Ar fast atom source with large diameter
    Applied Physics Letters, Vol. 91 (23) (December, 2007) 231502 pp. 1-3,
    DOI: 10.1063/1.2820444

  3. K. Takeda, Y. Kubota, S. Takashima, M. Hori, A. Serdyuchenko, M. Ito, and Y. Matsumi
    Diagnostics of surface wave excited Kr/O2 plasma for low-temperature oxidation processes
    Journal of Applied Physics, Vol. 102 (1) (July, 2007) 013302 pp. 1,
    DOI: 10.1063/1.2752549

  4. Haruhiko Ito, Kungen Teii, Masafumi Ito, and Masaru Hori
    Formation of microcrystallie diamond using a low-pressure inductively coupled plasma assisted by thermal decomposition of di-t-alkyl peroxide
    Diamond and Related Materials, Vol. 16 (2) (February, 2007) pp. 393-396 ,
    DOI: 10.1016/j.diamond.2006.07.007

  5. M. Hiramatsu, T. Deguchi, H. Nagao, and M. Hori
    Aligned Growth of Single-Walled and Double-Walled Carbon Nanotube Films by Control of Catalyst Preparation
    Japanese Journal of Applied Physics, Vol. 46 (13) (March 23, 2007) pp. L303-L306 ,
    DOI: 10.1143/JJAP.46.L303

  6. M .Iwasaki, K. Takeda, M. Ito, T. Yara, T. Uehara, and M. Hori.
    Effect of Low Level O2 Addition to N2 on Surface Cleaning by Nonequilibrium Atmospheric-Pressure Pulsed Remote Plasma
    Japanese Journal of Applied Physics, Vol. 46 (23) (June 8, 2007) pp. L540-L542 ,
    DOI: 10.1143/JJAP.46.L540

  7. H. Kondo, K. Kawaai, A. Sakai, M. Hori, S. Zaima, and Y. Yasuda
    Growth and Energy Bandgap Formation of Silicon Nitride Films in Radical Nitridation
    Japanese Journal of Applied Physics, Vol. 46 (1) (January 10, 2007) pp. 71-75,
    DOI: 10.1143/JJAP.46.71

  8. M. Nagai, and M. Hori
    Silicon Oxide Selective Etching Employing Dual Frequency Superimposed Magnetron Sputtering of Carbon Using F2/Ar Gases
    Japanese Journal of Applied Physics, Vol. 46, (2) (February, 2007) pp. 799-802,
    DOI: 10.1143/JJAP.46.799

  9. H. Ju, T. Ohta, M. Ito, M. Sasaki, K. Hane, and M. Hori
    Geometric characteristics of silicon cavities etched in EDP
    J. Micromech, & Microeng., Vol. 17 (April 17, 2007) pp. 1012-1016,
    DOI: 10.1088/0960-1317/17/5/022

  10. M. Hori
    Plasma Etching Technology for Low-k Porous SiOCH Films
    ECS Transaction, Vol. 6 (3) (March 1, 2007) pp. 485-500,
    DOI: 10.1149/1.2728815

  11. H. Kondo, S. Zaima, M. Hori, A. Sakai, and M. Ogawa
    Initial Stage of Processes and Energy Bandgap Formation in Nitridation of Silicon Surface Using Nitrogen Radicals
    Journal of the Vacuum Society of Japan. 50 (11) (2007) pp. 665- 671,
    DOI: 10.3131/jvsj.50.665