Fumi Utsumi, Hiroaki Kajiyama, Kae Nakamura, Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Hiroki Kondo, Hiroyuki Kano, Masaru Hori, and Fumitaka KikkawaEffect of Indirect Nonequilibrium Atmospheric Pressure Plasma on Anti-Proliferative Activity against Chronic Chemo-Resistant Ovarian Cancer Cells In Vitro and In Vivo 10.1371/journal.pone.0081576 Satomi Tajima, Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru HoriRoom-Temperature Si Etching in NO/F2 Gases and the Investigation of Surface Reaction Mechanisms 10.1021/jp3119132 Satomi Tajima, Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru HoriFormation of Nanoporous Features, Flat Surfaces, or Crystallographically Oriented Etched Profiles by the Si Chemical Dry Etching Using the Reaction of F2 + NO -> F + FNO at an Elevated Temperature 10.1021/jp4084794 Hiroshi Hashizume, Takayuki Ohta, Jia Fengdong, Keigo Takeda, Kenji Ishikawa, Masaru Hori, and Masafumi ItoInactivation effects of neutral reactive-oxygen species on Penicillium digitatum spores using non-equilibrium atmospheric-pressure oxygen radical source 10.1063/1.4824892 Takayoshi Tsutsumi, Takayuki Ohta, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori, and Masafumi ItoRapid measurement of substrate temperatures by frequency-domain low-coherence interferometry 10.1063/1.4827426 Takeyoshi Horibe, Hiroki Kondo, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, Mineo Hiramatsu, and Masaru HoriSupercritical Fluid Deposition of High-Density Nanoparticles of Photo-Catalytic TiO2 on Carbon Nanowalls 10.7567/APEX.6.045103 Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru HoriA High-Temperature Nitrogen Plasma Etching for Preserving Smooth and Stoichiometric GaN Surface 10.7567/APEX.6.056201 Hironao Shimoeda, Hiroki Kondo, Kenji Ishikawa, Mineo Hiramatsu, Makoto Sekine, and Masaru HoriAtomic Oxygen Etching from the Top Edges of Carbon Nanowalls 10.7567/APEX.6.095201 T. Takeuchi, C. Corbella, S. Grosse-Kreul, A. von Keudell, K. Ishikawa, H. Kondo, K. Takeda, M. Sekine, and M. HoriDevelopment of the sputtering yields of ArF photoresist after the onset of argon ion bombardment 10.1063/1.4772996 Y. Abe, A. Fukushima, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, and M. HoriSurface loss probability of H radicals on silicon thin films in SiH4/H2 plasma 10.1063/1.4773104 Y. Abe, S. Kawashima, A. Fukushima, Y. Lu, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, and M. HoriImpact of Hydrogen radical-injection plasma on fabrication of microcrystalline silicon thin film for solar cells 10.1063/1.4778608 Takuya Takeuchi, Kenji Ishikawa, Yuichi Setsuhara, Hiroki Kondo, Keigo Takeda, Makoto Sekine, and Masaru HoriSurface roughness development on ArF-photoresist studied by beam-irradiation of CF4 plasma 10.1088/0022-3727/46/10/102001 Arkadiusz Malinowski, Takuya Takeuchi, Shang Chen, Toshiya Suzuki, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Lidia Lukasiak, and Andrzej JakubowskiA novel fast and flexible technique of radical kinetic behaviour investigation based on pallet for plasma evaluation structure and numerical analysis 10.1088/0022-3727/46/26/265201 Keigo Takeda, Masaki Kato, Fendong Jia, Kenji Ishikawa, Hiroyuki Kano, Makoto Sekine, and Masaru HoriEffect of gas flow on transport of O (3Pj) atoms produced in ac power excited non-equilibrium atmospheric-pressure O2/Ar plasma jet 10.1088/0022-3727/46/46/464006 Hiromasa Tanaka, Masaaki Mizuno, Kenji Ishikawa, Kae Nakamura, Hiroaki Kajiyama, Hiroyuki Kano, Fumitaka Kikkawa, and Masaru HoriPlasma-activated medium selectively kills glioblastoma brain tumor cells by downregulating a survival signaling molecule, AKT kinase 10.1615/PlasmaMed.2012006275 H. Watanabe, H. Kondo, M. Hiramatsu, M. Sekine, S. Kumar, K. Ostrikov, and M. HoriSurface Chemical Modification of Carbon Nanowalls for Wide-Range Control of Surface Wettability 10.1002/ppap.201200141 Su B. Jin, Joon S Lee, Yoon S. Choi, In S Choi, Jeon G.Han, and M. HoriScale-up approach for industrial plasma enchanced chemical vapor deposition processes and Siox thin film technology 10.1016/j.tsf.2013.03.061 Tatsuya Urakawa, Hidehumi Matsuzaki, Daisuke Yamashita, Giichiro Uchida, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara, Makoto Sekine, and Masaru HoriMass density control of carbon films deposited by H-assisted plasma CVD method 10.1016/j.surfcoat.2012.10.002 Y. Miyawaki, Y. Kondo, M. Sekine, K. Ishikawa, T. Hayashi, K. Takeda, H. Kondo, and M. HoriHighly selective etching of SiO2 over Si3N4 and Si in capacitivlly coupled plasma employing C5HF7 gas 10.7567/JJAP.52.016201 M. Hiramatsu, Y. Nihashi, H. Kondo, and M. HoriNucleation Control of Carbon Nanowalls Using Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition 10.7567/JJAP.52.01AK05 M. Hiramatsu, M. Naito, H. Kondo, and M. HoriFabrication of Graphene-Based Films Using Microwave-Plasma-Enhanced Chemical Vapor Deposition 10.7567/JJAP.52.01AK04 T. Urakawa, R. Torigoe, H. Matsuzaki, D. Yamashita, G. Uchida, K. Koga, M. Shiratani, Y. Setsuhara, K. Takeda, M. Sekine, and M. HoriH2/N2 plasma etching rate of carbon films deposited by H-assisted plasma CVD 10.7567/JJAP.52.01AB01 T. Hiraoka, T. Ohta, T. Kageyama, M. Ito, N. Nishizawa, and M. HoriTemperature Measurement of Si Substrate Using Optical-Fiber-Type Low-Coherence Interferometry Employing Supercontinuum Light 10.7567/JJAP.52.040201 Y. Miyawaki, E. Shibata, Y. Kondo, K. Takeda, H. Kondo, K. Ishikawa, H. Okamoto, M. Sekine, and M. HoriEtching-Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C5F10O Plasma 10.7567/JJAP.52.020204 S. Chen, Y. Kawai, H. Kondo, K. Ishikawa, K. Takeda, H. Kano, M. Sekine, H. Amano, and M. HoriDevelopment of High-Density Nitrogen Radical Source for Low Mosaicity and High Rate Growth of InGaN Films in Molecular Beam Epitaxy 10.7567/JJAP.52.021001 T. Hiraoka, T. Ohta, M. Ito, N. Nishizawa, and M. HoriOptical-Fiber-Type Broadband Cavity Ring-Down Spectroscopy Using Wavelength-Tunable Ultrashort Pulsed Light 10.7567/JJAP.52.040201 H. Hashizume, T. Ohta, T. Mori, S. Iseki, M. Hori, and M. ItoInactivation Process of Penicillium digitatum Spores Treated with Non-equilibrium Atmospheric Pressure Plasma 10.7567/JJAP.52.056202 Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru HoriDissociations of C5F8 and C5HF7 in Etching Plasma 10.7567/JJAP.52.05EB02 Masanaga Fukasawa, Hiroyasu Matsugai, Takayoshi Honda, Yudai Miyawaki, Yusuke Kondo, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Kazunori Nagahata, Fumikatsu Uesawa, Masaru Hori, and Tetsuya TatsumiWavelength dependence of photon-induced interface defects in hydrogenated silicon nitride/Si structure during plasma etching processes 10.7567/JJAP.52.05ED01 Shouichiro Izumi, Masaki Minami, Michiru Kamada, Tetsuya Tatsumi, Atsushi A. Yamaguchi, Kenji Ishikawa, Masaru Hori, and Shigetaka TomiyaPhotoluminescence Study of Plasma-Induced Damage of GaInN Single Quantum Well 10.7567/JJAP.52.08JL09 Hye Ran Kim, L. Wen, Su Bong Jin, Yoon Seok Choi, In Sik Choi, M. Hori, and Jeon Geon HanStudy on Effects of Hydrogen Flow Rates on the Properties of ZnO Thin Film Deposited by Facing Targets Sputtering System 10.7567/JJAP.52.11NB01 Hitoshi Itoh, Yusuke Kubota, Yusaku Kashiwagi, Keigo Takeda, Kenji Ishikawa, Hiroki Kondo, Hirotaka Toyoda, and Masaru HoriHigh H Radical Density Produced by 1-m-length Atmospheric Pressure Microwave Plasma System 10.7567/JJAP.52.11NE01 Toshiya Suzuki, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru HoriField Emissions from Organic Nanorods Armored with Metal Nanoparticles 10.7567/JJAP.52.120203 Y. Setsuhara, K. Cho, M. Shiratani, M. Sekine, and M. HoriPlasma interactions with aminoacid (l-alanine) as a basis of fundamental processes in plasma medicine 10.1016/j.cap.2013.01.030 Su B. Jin, Joon S. Lee, Yoon S. Choi, In S. Choi, Jeon G. Han, and M. HoriImproving the gas barrier properties of a-SiOxCyNz film at low temperature using high energy and suitable nitrogen flow rate 10.1016/j.cap.2013.01.001 Kosuke Takenaka, Ken Cho, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, and Masaru HoriInvestigations on Plasma-Biomolecules Interactions as Fundamental Process for Plasma Medicine 10.1088/1742-6596/441/1/012001 H. Itoh, Y. Kubota, Y. Kashiwagi, K. Takeda, K. Ishikawa, H. Kondo, M. Sekine, H. Toyoda, and M. HoriA Development of Atmospheric Pressure Plasma Equipment and Its Applications for Treatment of Ag Films Formed from Nano-Particle Ink 10.1088/1742-6596/441/1/012019 Yuichi Setsuhara, Atsushi Miyazaki, Kosuke Takenaka, and Masaru HoriPlasma Interactions with Biological Molecules in Aqueous Solution 10.1557/opl.2013.1155 Hiroaki Kajiyama, Fumi Utsumi, Kae Nakamura, Hiromasa Tanaka, Masaru Hori, and Fumitaka KikkawaPerspective of strategic plasma therapy for prognostic improvement of patients with ovarian cancer 10.1557/opl.2013.1188 Ryosuke Kometani, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru HoriSurface morphology on high-temperature plasma-etched gallium nitride 10.14723/tmrsj.38.325 Hye R. Kim, Su B. Jin, Long Wen, Yoon S. Choi, In S. Choi, M. Hori, and Jeon G. HanStudy on change of electrical properties of ZnO thin films deposited in low temperature facing targets magnetron sputtering (FTS) system with H2 and O2 flow rate changes Mineo Hiramatsu, Hiroki Kondo and Masaru HoriGraphene Nanowalls 10.5772/3358 R. Sato, D. Yasumatsu, S. Kumagai, M. Hori, and M. SasakiLocalized Microplasma Generation in MEMS Gas Channel 堀 勝社会イノベーションを実現する低温プラズマ科学技術 古閑 一憲, 白谷 正治, 節原 裕一, 関根 誠, 堀 勝ﾌﾟﾗｽﾞﾏ異方性化学気相堆積法による硬質カーボン薄膜の低温製膜