1. S. WATANABE, K. HANE, M. ITO, and T. GOTO
    DYNAMIC-MODE FORCE MICROSCOPY FOR THE DETECTION OF LATERAL AND VERTICAL ELECTROSTATIC FORCES
    Applied Physics Letters, Vol. 63 (18) (November 1, 1993) pp. 2573-2575,
    DOI: 10.1063/1.110437

  2. K. Maruyama, A. Sakai, and T. Goto
    Measurement of the CF3 Radical Using Infrared Diode Laser Absorption Spectroscopy
    Journal of Physics D: Applied Physics, Vol. 26 (2) (1993) pp. 199-202,
    DOI: 10.1088/0022-3727/26/2/005

  3. H. SEKIDO, T. KONDO, A. KONO, and T. GOTO
    MEASUREMENT OF DIFFUSION-COEFFICIENTS FOR GROUND-STATE AND METASTABLE COPPER ATOMS IN RARE-GASES
    Journal of Physics D: Applied Physics, Vol. 26 (9) (September 14, 1993) pp. 1414-1418,
    DOI: 10.1088/0022-3727/26/9/011

  4. A. Kono, N. Koike, K. Okuda, and T. Goto
    Laser-Induced-Fluorecence Detection of SiH Radicals in a Radio- Frequency Silane Plasma
    Japanese Journal of Applied Physics, Vol. 32 (4A) (1993) pp. L543-L546,
    DOI: 10.1143/JJAP.32.L543

  5. K. Takahashi, M. Hori, K. Maruyama, S. Kishimoto, and T. Goto
    Measurements of the CF,CF2 and CF3 Radicals in a CHF3 Electron Cyclotron Resonance Plasma
    Japanese Journal of Applied Physics, Vol. 32 (5A) (1993) pp. L694-L697,
    DOI: 10.1143/JJAP.32.L694

  6. K. Takahashi, M. Hori, and T. Goto
    Control of Fluorocarbon Radicals by On-Off Modulated Electron Cyclotron Resonance Plasma
    Japanese Journal of Applied Physics, Vol. 32 (8A) (1993) pp. L1088-L1091,
    DOI: 10.1143/JJAP.32.L1088

  7. S. Naito, M. Ikeda, N. Ito, T. Hattori, and T. Goto
    Effect of Rare Gas Dilution on CH3 Radical Density in RFーDischarge CH4 Plasma
    Japanese Journal of Applied Physics, Vol. 32 (12A) (December, 1993) pp. 5721-5725,
    DOI: 10.1143/JJAP.32.5721

  8. H. FURUHASHI, M. ICHIKAWA, E. FUWA, and T. GOTO
    DENSITY-MEASUREMENTS OF EXCITED COMPONENTS IN A LONGITUDINAL DISCHARGE EXCIMER-LASER
    IEEE JOURNAL OF QUANTUM ELECTRONICS (1993) pp. 1520-1525,
    DOI: 10.1109/3.234403

  9. A. Kono
    Neutral Radical Density Measurements for RF SiH4 Plasmas Using Laser Spectroscopic Methods
    Symposium on Plasma Science for Materials (SPSM-6) (1993) pp. 1-7,
    DOI:

  10. T. Goto
    Measurements of SiH3 and SiH2 Radical Densities in RF Silane Plasmas Using Laser Spectroscopic Techniques
    Proceeding on Material Research Society Symposium, Vol. 297 (1993) pp. 3-12,
    DOI:

  11. 後藤 俊夫
    半導体プロセス用プラズマ中のラジカル計測
    応用物理 第62巻 第7号 (1993) pp. 666-675,
    DOI:

  12. 堀 勝, 高橋 邦方, 後藤 俊夫
    オン・オフ変調ECR-CHF3プラズマ中のフルオロカーボンラジカル測定
    電気学会 プラズマ研究会資料, EP-93-27 (1993) pp. 29-38,
    DOI: