- S. WATANABE, K. HANE, M. ITO, and T. GOTO
DYNAMIC-MODE FORCE MICROSCOPY FOR THE DETECTION OF LATERAL AND VERTICAL ELECTROSTATIC FORCES
Applied Physics Letters, Vol. 63 (18) (November 1, 1993) pp. 2573-2575,
DOI: 10.1063/1.110437
- K. Maruyama, A. Sakai, and T. Goto
Measurement of the CF3 Radical Using Infrared Diode Laser Absorption Spectroscopy
Journal of Physics D: Applied Physics, Vol. 26 (2) (1993) pp. 199-202,
DOI: 10.1088/0022-3727/26/2/005
- H. SEKIDO, T. KONDO, A. KONO, and T. GOTO
MEASUREMENT OF DIFFUSION-COEFFICIENTS FOR GROUND-STATE AND METASTABLE COPPER ATOMS IN RARE-GASES
Journal of Physics D: Applied Physics, Vol. 26 (9) (September 14, 1993) pp. 1414-1418,
DOI: 10.1088/0022-3727/26/9/011
- A. Kono, N. Koike, K. Okuda, and T. Goto
Laser-Induced-Fluorecence Detection of SiH Radicals in a Radio- Frequency Silane Plasma
Japanese Journal of Applied Physics, Vol. 32 (4A) (1993) pp. L543-L546,
DOI: 10.1143/JJAP.32.L543
- K. Takahashi, M. Hori, K. Maruyama, S. Kishimoto, and T. Goto
Measurements of the CF，CF2 and CF3 Radicals in a CHF3 Electron Cyclotron Resonance Plasma
Japanese Journal of Applied Physics, Vol. 32 (5A) (1993) pp. L694-L697,
DOI: 10.1143/JJAP.32.L694
- K. Takahashi, M. Hori, and T. Goto
Control of Fluorocarbon Radicals by On-Off Modulated Electron Cyclotron Resonance Plasma
Japanese Journal of Applied Physics, Vol. 32 (8A) (1993) pp. L1088-L1091,
DOI: 10.1143/JJAP.32.L1088
- S. Naito, M. Ikeda, N. Ito, T. Hattori, and T. Goto
Effect of Rare Gas Dilution on CH3 Radical Density in RFｰDischarge CH4 Plasma
Japanese Journal of Applied Physics, Vol. 32 (12A) (December, 1993) pp. 5721-5725,
DOI: 10.1143/JJAP.32.5721
- H. FURUHASHI, M. ICHIKAWA, E. FUWA, and T. GOTO
DENSITY-MEASUREMENTS OF EXCITED COMPONENTS IN A LONGITUDINAL DISCHARGE EXCIMER-LASER
IEEE JOURNAL OF QUANTUM ELECTRONICS (1993) pp. 1520-1525,
DOI: 10.1109/3.234403
- A. Kono
Neutral Radical Density Measurements for RF SiH4 Plasmas Using Laser Spectroscopic Methods
Symposium on Plasma Science for Materials (SPSM-6) (1993) pp. 1-7,
DOI:
- T. Goto
Measurements of SiH3 and SiH2 Radical Densities in RF Silane Plasmas Using Laser Spectroscopic Techniques
Proceeding on Material Research Society Symposium, Vol. 297 (1993) pp. 3-12,
DOI:
- 後藤 俊夫
半導体プロセス用プラズマ中のラジカル計測
応用物理 第62巻 第７号 (1993) pp. 666-675,
DOI:
- 堀 勝, 高橋 邦方, 後藤 俊夫
オン・オフ変調ECR-CHF3プラズマ中のフルオロカーボンラジカル測定
電気学会 プラズマ研究会資料, EP-93-27 (1993) pp. 29-38,
DOI: