1. M. Iwasaki, H. Inui, Y. Matsudaira, H. Kano, N. Yoshida, M. Ito, and M. Hori
    Nonequilibrium Atmospheric Pressure Plasma with Ultrahigh Electron Density and High Performance for Glass Surface Cleaning
    Applied Physics Letters, Vol. 92 (8) (February, 2008) 081503 pp. 1-3,
    DOI: 10.1063/1.2885084

  2. W. Takeuchi, M. Ura, M. Hiramatsu, Y. Tokuda, H. Kano, and M. Hori
    Electrical Conduction Control of Carbon Nanowalls
    Applied Physics Letters, Vol. 92 (21) (May 28, 2008) 213103 pp. 1-3,
    DOI: 10.1063/1.2936850

  3. K. Takeda, S. Takashima, M. Ito, and M. Hori
    Absolute Density and Temperature of O(1D2) in Highly Ar or Kr Diluted O2 Plasma
    Applied Physics Letters, Vol. 93 (2) (July 14, 2008) 021501 pp. 1-3,
    DOI: 10.1063/1.2957679

  4. N. Nishizawa, and M. Hori
    Octave Spanning High Quality Super Continuum Generation Using 10 nJ and 104 fs High Energy Ultrashort Soliton Pulse
    Applied Physics Express, Vol. 1 (2) (February 15, 2008) 022009 pp. 1-2,
    DOI: 10.1143/APEX.1.022009

  5. H. Ito, H. Kano, and M. Hori
    New Compact Continuous Spectrum Light Source Using Atmospheric Pressure Microplasma with High-Velocity Ar Gas Flow
    Applied Physics Express, Vol. 1 (10) (September 26, 2008) 106001 pp. 1-3,
    DOI: 10.1143/APEX.1.106001

  6. M. Iwasaki, Y. Matsudaira, K. Takeda, M. Ito, E. Miyamoto, T. Yara, T. Uehara, and M. Hori
    Roles of Oxidizing Species in a Nonequilibrium Atmospheric-pressure Pulsed Remote O2/N2 Plasma Glass Cleaning Process
    Journal of Applied Physics, Vol. 103 (2) (January, 2008) 023303 pp. 1-7,
    DOI: 10.1063/1.2830982

  7. Y. Hara, S. Takashima, K. Yamakawa, S. Den, H. Toyoda, M. Sekine, and M. Hori
    Characteristics of Low Energy Atom and Molecule Beams Generated by the Charge Exchange Reaction
    Journal of Applied Physics, Vol. 103 (5) (March, 2008) 053301 pp. 1-5,
    DOI: 10.1063/1.2842402

  8. S. Uchida, S. Takashima, M. Hori, M. Fukasawa, K. Ohshima, K. Nagahata, and T. Tatsumi
    Plasma Damage Mechanisms for Low-k Porous SiOCH Films due to Radiation, Radicals, and Ions in the Plasma Etching Process
    Journal of Applied Physics, Vol. 103 (7) (April 7, 2008) 073303 pp. 1-5,
    DOI: 10.1063/1.2891787

  9. T. Mori, M. Hiramatsu, K. Yamakawa, K. Takeda, and M. Hori
    Fabrication of Carbon Nanowalls using Electron Beam Excited Plasma-Enhanced Chemical Vapor Deposition
    Diamond and Related Materials, Vol. 17 (7-10) (July-October, 2008) pp. 1513-1517,
    DOI: 10.1016/j.diamond.2008.01.070

  10. S. Kondo, K. Yamakawa, S. Den, H. Kano, M. Hiramatsu, and M. Hori
    Highly Reliable Growth Process of Carbon Nanowalls using Radical Injection Plasma-Enhanced Chemical Vapor Deposition
    Journal of Vacuum Science Technology B, Vol. 26 (4) (August, 2008) pp. 1294-1300,
    DOI: 10.1116/1.2938397

  11. M. Fukasawa, T. Tatsumi, K. Oshima, K. Nagahata, S. Uchida, S. Takashima, M. Hori, and Y. Kamide
    Surface Reactions during Low-k Etching using N2/H2 Plasma
    Journal of Vacuum Science Technology A, Vol. 26 (4) (July, 2008) pp. 870-874,
    DOI: 10.1116/1.2839764

  12. S. Uchida, S. Takashima, M. Hori, M. Fukasawa, K. Ohshima, K. Nagahata, and T. Tatsumi
    Evaluation of Property Changes due to Radiation, Radicals, and Ions on Organic Low-k Films in H2/N2 Plasma Etching
    Japanese Journal of Applied Physics, Vol. 47 (5) (May 16, 2008) pp. 3621-3624,
    DOI: 10.1143/JJAP.47.3621

  13. M. Iwasaki, H. Inui, H. Kano, M. Ito, Y. Suzuki, D. Sutou, K. Nakada, and M. Hori
    Surface Modification Process of Contact Lens Using Three-Phase AC Excited Nonequilibrium Atmospheric Pressure Ar Plasma
    Japanese Journal of Applied Physics, Vol. 47 (5) (May 16, 2008) pp. 3625-3629,
    DOI: 10.1143/JJAP.47.3625

  14. T. Ideno, H. Inui, S. Takashima, H. Kano, M. Kondo, M. Hiramatsu, and M. Hori
    Novel Silicon Wafer Slicing Technology Using Atmospheric-Pressure Reactive Microplasma
    Japanese Journal of Applied Physics, Vol. 47 (7) (July 11, 2008) pp. 5648-5651,
    DOI: 10.1143/JJAP.47.5648

  15. Modeling & Simulation Working Group, Semiconductor Equipment Association of Japan
    Analysis of Process Plasma via Computer Simulations and Plasma Diagnostics, for N2 Plasma and H2 Plasma
    Journal of the Vacuum Society of Japan. 51 (12) (July 25, 2008) pp. 807-813,
    DOI: 10.3131/jvsj2.51.807