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2002

  1. H. Nagai, S. Takashima, M. Hiramatsu, M. Hori, and T. Goto
    Behavior of Atomic Radicals and Their Effects on Organic Low Dielectric Constant Film Etching in High Density N2 /H2 and N2/NH3 Plasmas
    Journal of Applied Physics, Vol. 91 (5) (February, 2002) pp. 2615-2621,
    DOI: 10.1063/1.1435825

  2. M. Ito, K. Kamiyaa, M. Hori, and T. Goto
    Subsurface Reaction of Silicon Nitride in a Highly Selective Etching Process of Silicon Oxide over Silicon Nitri de
    Journal of Applied Physics, Vol. 91 (5) (February, 2002) pp. 3452-3458,
    DOI: 10.1063/1.1448870

  3. K. Teii, M. Hori, and T. Goto
    Ion-to-CH3 Flux Ratio in Diamond Chemical-Vapor Deposition
    Journal of Applied Physics, Vol. 92 (7) (July, 2002) pp. 4103-4107,
    DOI: 10.1063/1.1506384

  4. K. Murata, D. Kikukawa, M. Hori, and T. Goto
    Effect of Initial Layer on Surface Roughness and Crystallinity of Microcrystalline silicon Thin Films Formed by Remote Electron Cyclotron Resonance Plasma
    Journal of Vacuum Science Technology A, Vol. 20 (3) (May, 2002) pp. 953-956,
    DOI: 10.1116/1.1458945

  5. K. Fujita, M. Hori, T. Goto, and M. Ito
    Silicon Oxide Contact Hole Etching Employing an Environmentally Benign Process
    Journal of Vacuum Science Technology B, Vol. 20 (6) (August, 2002) pp. 2192-2198,
    DOI: 10.1116/1.1513632

  6. M. Hori, and T. Goto
    Measurement Technique of Radicals Their Gas Phase and Surface Reactions in Reactive Plasma Processing
    Applleid Surface Science, Vol. 192 (1-4) (May 30, 2002) pp. 135-160,
    DOI: 10.1016/S0169-4332(02)00024-7

  7. S. Tada, S. Takashima, M. Ito, M. Hamagaki, M. Hori, and T. Goto
    Investigation of Nitrogen Atoms in Low Pressure Nitrogen Plasma Using a Compact Electron-Beam-Exicited Plasma Source
    Japanese Journal of Applied Physics, Vol. 41 (A) (July, 2002) pp. 4691-4695,
    DOI: 10.1143/JJAP.41.4691

  8. S. Tada, M. Ito, M. Hamagaki, M. Hori, and T. Goto
    Deposition of Diamond-like Carbon Using Compact Electron-Beam Excited Plasma Source
    Japanese Journal of Applied Physics, Vol. 41 (8) (August, 2002) pp. 5408-5414,
    DOI: 10.1143/JJAP.41.5408

  9. S. Tada, M. Ito, M. Hamagaki, M. Hori, and T. Goto
    Cleaning of Glass Disk in Oxygen Plasma by Using Compact Electron-Beam-Excited Plasma Source
    Japanese Journal of Applied Physics, Vol. 41 (11A) (July, 2002) pp. 6553-6556,
    DOI: 10.1143/JJAP.41.6553

  10. M. Hori, and T. Goto
    Formation of Preferentially Oriented Polycrystalline Silicon Thin Films Employing Pulse-modulated Plasma CVD
    The Surface Finishing., Vol. 53 (12) (2002) ,
    DOI:

  11. 堀 勝, 後藤 俊夫
    パルス変調プラズマCVDを用いた配向性ポリシリコン薄膜形成
    表面技術、53巻12号 (2002) ,
    DOI:

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