- M. Ito, K. Murata, K. Aiso, M. Hori, T. Goto, and M. Hiramatsu
6.Scanning Tunneling Microscopic and Spectroscopics Characterization of Diamond Film Prepared by Capacitively Coupled Radio Frequency CH3OH Plasma with OH Radical Injection
Applied Physics Letters, Vol. 70 (16) (June, 1998) pp. 2141-2143,
DOI: 10.1063/1.118971
- M. Hori, R. G. Woodham, and H. Ahmed
Sub-5 nm Gold Dot Formation Using Retarding-Field Single Ion Deposition
Applied Physics Letters, Vol. 73 (22) (November, 1998) pp. 3223-3225,
DOI: 10.1063/1.122725
- M. Shiratani, H. Kawasaki, T. Fukuzawa, Y. Watanabe, Y. Yamamoto, S. Suganuma, M. Hori, and T. Goto
A Study on the Time Evolution of SiH3 Surface Loss Probability on Hydrogenated Amorphous Silicon Films in SiH4 Rf Discharges using Infrared Diode-Laser Absorption Spectroscopy
Journal of Physics D: Applied Physics, Vol. 31 (7) (April, 1998) pp. 776-780,
DOI: 10.1088/0022-3727/31/7/004
- M. Inayoshi, M. Ito, M. Hori, T. Goto, and M. Hiramatsu
Surface Reaction of CF2 Radicals for Fluorocarbon Film Formation in SiO2/Si Selective Etching Process
Journal of Vacuum Science Technology A, Vol. 16 (1) (June, 1998) pp. 233-238,
DOI: 10.1116/1.580977
- M. Ikeda, M. Inayoshi, M. Hori, T. Goto, M. Hiramatsu, and A. Hirata
Synchrotron Radiation Induced SiC Formation on Si Substrate Employing Methanol and H Radical
Journal of Vacuum Science Technology A, Vol. 16 (4) (January, 1998) pp. 2252-2256,
DOI: 10.1116/1.581335
- A. Kono, S. Hirose, K. Kinoshita, and T. Goto
Translational Temperature Measurement for SiH2 in RF Silane Plasma using CW Laser Induced Fluorescence Spectroscopy
Japanese Journal of Applied Physics, Vol. 37 (8) (August, 1998) pp. 4588-4589,
DOI: 10.1143/JJAP.37.4588
- A. Kono, S. Hirose, and T. Goto
Laser-Induced-Fluorescence Study of SiH2 in a RF SiH4/SiH2Cl2 Plasma
The Review of Laser Engineering, Vol. 26 (6) (May, 1998) pp. 453-457,
DOI: 10.2184/lsj.26.453