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Spatiotemporal behaviors of absolute density of atomic oxygen in a planar type of Ar/O2 non-equilibrium atmospheric pressure plasma jet
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Deposition of AZO thin film using RF and ICP at facing magnetron sputtering system
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- 高島 成剛, 浅見 悦男, 早川 雅浩, 山川 晃司, 山本 博之, 田 昭治, 和田 仁志, 堀 勝
アルミニウム合金のプラズマ窒化処理と処理物
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