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1994

  1. A. Kono, M. Endo, K. Ohata, S. Kishimoto, and T. Goto
    Charged Particle Densities and Kinetics in a Radio-Frequency SF6 Plasma
    Journal of Applied Physics, Vol. 76 (11) (December 1, 1994) pp. 7221-7230,
    DOI: 10.1063/1.358003

  2. S. NAGAI, H. FURUHASHI, Y. UCHIDA, J. YAMADA, A. KONO, T. GOTO
    FORMATION DYNAMICS OF EXCITED ATOMS IN AN ARF LASER USING HE AND NE BUFFER GASES
    Journal of Applied Physics, Vol. 77 (7) (April, 1994) pp. 2906-2911,
    DOI: 10.1063/1.358705

  3. T. Tanaka, M. Hiramatsu, M. Nawata, A. Kono, and T. Goto
    Reaction Rate Constant of Si Atoms with SiH4 Molecules in a RF Silane Plasma
    Journal of Physics D: Applied Physics, Vol. 27 (8) (August 14, 1994) pp. 1660-1663,
    DOI: 10.1088/0022-3727/27/8/012

  4. K. Hattori, M. Hori, and M. Aoyama
    Residue-Free Etching of the AL-Si-Cu Alloy Employing Magnetron Reactive Ion Etching
    Journal of Electrochemical Society, Vol. 141 (10) (November 18, 1994) pp. 2825-2828,
    DOI: 10.1149/1.2059238

  5. S. WATANABE, K. HANE, M. ITO, T. GOTO
    2-DIRECTIONAL DYNAMIC-MODE FORCE MICROSCOPY - DETECTION OF DIRECTIONAL FORCE GRADIENT
    Journal of Vacuum Science Technology B, Vol. 12 (3) (May, 1994) pp. 1577-1580,
    DOI: 10.1116/1.587290

  6. N. NISHIZAWA, S. KUME, M. MORI, T. GOTO, A. MIYAUCHI
    SQUEEZED-LIGHT GENERATION WITH 1.064 MU-M ND-YAG LASER AND 0.85 MU-M SINGLE-MODE FIBER
    Japanese Journal of Applied Physics, Vol. 33 (1A) (January, 1994) pp. 138-143,
    DOI: 10.1143/JJAP.33.138

  7. H. Nomura, A. Kono, and T. Goto
    Effect of Dilution Gases on the SiH3 Radical Density in an RF SiH4 Plasma
    Japanese Journal of Applied Physics, Vol. 33 (7B) (July, 1994) pp. 4165-4169,
    DOI: 10.1143/JJAP.33.4165

  8. K. Takahashi, M. Hori, S. Kishimoto, and T. Goto
    CFx(x=1-3) Radicals Controlled by On-Off Modulated Electron Cyclotron Resonance Plasma and Their Effects on Polymer Film Deposition
    Japanese Journal of Applied Physics, Vol. 33 (7B) (July, 1994) pp. 4181-4185,
    DOI: 10.1143/JJAP.33.4181

  9. K. Maruyama, K. Ohkouchi, Y. Ohtsu, and T. Goto
    CF3, CF2, and CF Radical Measurements in RF CHF3 Etching Plasma Using Infrared Diode Laser Absorption Spectroscopy
    Japanese Journal of Applied Physics, Vol. 33 (7B) (July, 1994) pp. 4298-4302,
    DOI: 10.1143/JJAP.33.4298

  10. Y. Yamamoto, H. Nomura, T. Tanaka, M. Hiramatsu, M. Hori, and T. Goto
    Measurement of Absolute Densities of Si, SiH and SiH3 in Electron Cyclotron Resonance SiH4 /H2 Plasma
    Japanese Journal of Applied Physics, Vol. 33 (7B) (July, 1994) pp. 4320-4324,
    DOI: 10.1143/JJAP.33.4320

  11. K. Takahashi, M. Hori, and T. Goto
    Characteristics of Fluorocarbon Radicals and CHF3 Molecule in CHF3 Electron Cyclotron Resonance Downstream Plasma
    Japanese Journal of Applied Physics, Vol. 33 (8) (August, 1994) pp. 4745-4751,
    DOI: 10.1143/JJAP.33.4745

  12. S. Naito, N. Ito, T. Hattori, and T. Goto
    Calculated Three Dimensional Spatial Distribution of CH3 Radical Density in the RF Discharge CH4 Plasma with Parallel-Plate Electrodes
    Japanese Journal of Applied Physics, Vol. 33 (9A) (September, 1994) pp. 5046-5050,
    DOI: 10.1143/JJAP.33.5046

  13. S. Naito, N. Ito, T. Hattori, and T. Goto
    Correlation Between CH3 Radical Density and Carbon Thin-Film Formation in RF Discharge CH4 Plasma
    Japanese Journal of Applied Physics, Vol. 33 (10) (October, 1994) pp. 5967-5970,
    DOI: 10.1143/JJAP.33.5967

  14. N. NISHIZAWA, S. KUME, M. MORI, T. GOTO, A. MIYAUCHI
    EVALUATION OF NOISE INCREASE DUE TO PUMP LIGHT CROSSTALK IN QUADRATURE SQUEEZED-LIGHT GENERATION WITH A FIBER RING REFLECTOR
    OPTICS AND LASER TECHNOLOGY, Vol 26 (1) (February, 1994) pp. 49-53,
    DOI: 10.1016/0030-3992(94)90011-6

  15. N. NISHIZAWA, S. KUME, M. MORI, T. GOTO, A. MIYAUCHI
    SYMMETRICAL AND ASYMMETRIC FIBER LOOP MIRRORS FOR OBSERVING GUIDED-ACOUSTIC-WAVE BRILLOUIN-SCATTERING IN POLARIZATION-MAINTAINING FIBERS
    OPTICS LETTERS, Vol. 19 (18) (September 15, 1994) pp. 1424-1426,
    DOI: 10.1364/OL.19.001424

  16. K. Miyata, K. Takahashi, S. Kishimoto, M. Hori, and T. Goto
    Systematical Measurements of CFx(X=1-3) Radicals in ECR Etching Plasmas
    The 16th Symposium on Dry Process, VI-3 (1994) pp.193-198,
    DOI:

  17. M. Ikeda, M. Inayoshi, M. Hori, M. Hiramatsu, M. Nawata, T. Goto, and A. Hiraya
    Synchrotron Radiation (SR) Assisted Deposition of Carbon Film Employing Methyl Alcohol
    UVSOR-21, Activity Report (1994) pp. 176-177,
    DOI:

  18. 山本 康雄、堀 勝、平松 美根男、後藤 俊夫
    ECR SiH4 プラズマプロセスにおけるラジカルの計測
    電子情報通信学会、信学技報, SDM94-118 (1994) pp. 49-54,
    DOI:

  19. 後藤 俊夫
    レーザ分光法による半導体プロセス用プラズマ中のラジカル計測
    精密工学会誌, Vol. 60 (11) (1994) pp. 1549-1553,
    DOI:

  20. 後藤 俊夫
    レーザー分光法によるプラズマ中のラジカル計測
    超精密加工専門委員会, 精密工学会 (1994) pp. 1-6,
    DOI:

  21. 後藤 俊夫
    半導体レーザによる気相中ラジカルの測定
    月刊「ＩＯＮＩＣ」９月号 (1994) pp. 11-19,
    DOI:

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