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Diagnostic and analytical study on a low-pressure limit of diamond chemical vapor deposition in inductively coupled CO?CH4?H2plasmas
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High Performance of Silicon Oxide Selective Etching Using F2 Gas and Graphite Instead of Perfluorinated Compound Gases
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A Novel Silicon-Dioxide Etching Process Employing Pulse-Modulated Electron-Beam-Excited Plasma
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Growth of carbon nanotubes by microwave-excited non-equilibrium atmospheric-pressure plasma
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Study on the Absolute Density and Translational Temperature of Si Atoms in Very High Frequency Capacitively Coupled SiH4 Plasma with Ar, N2, and H2 Dilution Gases
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