1. M. Hiramatsu, K. Shiji, H. Amano, and M. Hori
    Fabrication of vertically aligned carbon nanowalls using capacitively coupled plasma-enhanced chemical vapor deposition assisted by hydrogen radical injection
    Applied Physics Letters, Vol. 84 (23) (May, 2004) pp. 4708-4710,
    DOI: 10.1063/1.1762702

  2. Koji Yamakawa, Masaru Hori, Toshio Goto, Shoji Den, Toshirou Katagiri, and Hiroyuki Kano
    Ultrahigh-speed etching of SiO2with ultrahigh selectivity over Siin microwave-excited non equilibrium atmospheric pressure plasma
    Applied Physics Letters, Vol. 85 (4) (July, 2004) pp. 549-551,
    DOI: 10.1063/1.1775885

  3. K. Teii, M. Hori, and T. Goto
    Diagnostic and analytical study on a low-pressure limit of diamond chemical vapor deposition in inductively coupled CO?CH4?H2plasmas
    Journal of Applied Physics, Vol. 95 (8) (March, 2004) pp. 4463-4470,
    DOI: 10.1063/1.1686900

  4. M. Ito, K. Takeda, T. Shiina, Y. Okamura, H. Nagai, M. Hori, and T. Goto
    Silicon-oxide etching process employing an electron-beam-excited plasma
    Journal of Vacuum Science Technology A, Vol. 22 (January, 2004) pp. 543-547,
    DOI: 10.1116/1.1651110

  5. T. Ohta, T. Ishida, M. Hori, T. Goto, M. Ito, S. Kawakami
    Effects of Ar dilution and exciting frequency on absolute density and translational temperature of Si atom in very high frequency-capacitively coupled SiH4 plasmas
    Japanese Journal of Applied Physics, Vol. 43 (1AB) (January, 2004) pp. L94-L96,
    DOI: 10.1143/JJAP.43.L94

  6. M. Nagai, M. Hori, and T. Goto
    High Performance of Silicon Oxide Selective Etching Using F2 Gas and Graphite Instead of Perfluorinated Compound Gases
    Japanese Journal of Applied Physics, Vol. 43 (4A) (March 19, 2004) pp. L501-L503,
    DOI: 10.1143/JJAP.43.L501

  7. K. Takeda, Y. Tomekawa, M. Iwasaki, M. Ito, T. Ohta, K. Yamakawa, and M. Hori
    A Novel Silicon-Dioxide Etching Process Employing Pulse-Modulated Electron-Beam-Excited Plasma
    Japanese Journal of Applied Physics, Vol. 43 (9A/B) (August 12, 2004) pp. L1166,
    DOI: 10.1143/JJAP.43.L1166

  8. A. Matsushita, M. Nagai, K. Yamakawa, M. Hiramatsu, A. Sakai, M. Hori, T. Goto, and S. Zaima
    Growth of carbon nanotubes by microwave-excited non-equilibrium atmospheric-pressure plasma
    Japanese Journal of Applied Physics, Vol. 43 (1) (January, 2004) pp. 424-425,
    DOI: 10.1143/JJAP.43.424

  9. T. Ohta, M. Hori, T. Ishida, T. Goto, M. Ito, and S. Kawakami
    Study on the Absolute Density and Translational Temperature of Si Atoms in Very High Frequency Capacitively Coupled SiH4 Plasma with Ar, N2, and H2 Dilution Gases
    Japanese Journal of Applied Physics, Vol. 43 (9A) (September 9, 2004) pp. 6405-6412,
    DOI: 10.1143/JJAP.43.6405