1. M. Iwasaki, M. Ito, T. Uehara, M. Nakamura, and M. Hori
    Ion Attachment Mass Spectrometry of Nonequilibrium Atmospheric-Pressure Pulsed Remote Plasma for SiO2 Etching
    Journal of Applied Physics, Vol. 100 (November, 2006) 093304 pp. 1,
    DOI: 10.1063/1.2372736

  2. M. Nagai, and M. Hori
    Effects of N2 Addition on Density and Temperature of Radicals in 60 MHz Capacitively Coupled C-C4F8 Gas Plasma
    Journal of Vacuum Science Technology A, Vol. 24 (June, 2006) pp. 1760-1763 ,
    DOI: 10.1116/1.2218852

  3. K. Takeda, T. Ohta, M. Ito, and M. Hori
    Silicon Dioxide Etching Process for Fabrication of Micro-optics Employing Pulse-Modulated Electron-beam-excited Plasma
    Journal of Vacuum Science Technology A, Vol. 24 (August, 2006) pp. 1725-1729,
    DOI: 10.1116/1.2217979

  4. H. Shoyama, T. Hishida, T. Hara, Y. Dake, T. Mori, H. Nagai, M. Hori, and T. Goto
    Nitriding of a tool steel with an electron-beam-excited plasma
    Journal of Vacuum Science Technology A, Vol. 24 (October, 2006) pp. 1999-2002,
    DOI: 10.1116/1.2338563

  5. D. Kikukawa, M. Hori, K. Honma, M. Yamamoto, T. Goto, S. Takahashi, and S. Den
    Development of a low pressure microwave excited plasma and its application to the formation of microcrystalline silicon films
    Journal of Vacuum Science Technology A, Vol. 24 (October, 2006) pp. 2128-2132,
    DOI: 10.1116/1.2357958

  6. M. Hori, and T. Goto
    Progress of Radical Measurements in Plasmas for Semiconductor Processing
    Plasma Sources Science Technology, Vol. 15 (2) (April 26, 2006) pp. S74-S83,
    DOI: 10.1088/0963-0252/15/2/S10

  7. M. Hiramatsu, and M. Hori
    Fabrication of Carbon Nanowalls Using Novel Plasma Processing
    Japanese Journal of Applied Physics, Vol. 45 (6B) (June 20, 2006) pp. 5522-5527,
    DOI: 10.1143/JJAP.45.5522

  8. M. Nagai, T. Hayashi, M. Hori, and H. Okamoto
    Low-k SiOCH Film Etching Process and Its Diagnostics Employing Ar/C5F10O/N2 Plasma
    Japanese Journal of Applied Physics, Vol. 45 (9A) (September 7, 2006) pp. 7100-7104,
    DOI: 10.1143/JJAP.45.7100

  9. M. Nagai, O. Takai, and M. Hori
    Atmospheric Pressure Fluorocarbon-Particle Plasma Chemical Vapor Deposition for Hydrophobic Film Coating
    Japanese Journal of Applied Physics, Vol. 45 (17) (April 21, 2006) pp. L460-L462,
    DOI: 10.1143/JJAP.45.L460

  10. M. Hori, and M. Hiramatsu
    Carbon Nanowalls Formation by Raadical Controlled Plasma Process
    Advanced in Science and Technology, Vol. 48 (October, 2006) pp. 119-126,
    DOI: 10.4028/www.scientific.net/AST.48.119

  11. 平松 美根男, 堀 勝
    プラズマ化学気相堆積法を用いたカーボンナノウォールの作製
    真空 Vol. 49 (9) (June, 2006) pp. 368-372,
    DOI: 10.3131/jvsj.49.368

  12. 山川 晃司, 堀 勝
    マイクロ波励起非平衡大気圧プラズマを用いたシリコン酸化膜の超高速エッチングおよびカーボンナノチューブの形成
    真空 Vol. 48 (August 8, 2006) pp. 51-56,
    DOI: 10.3131/jvsj.48.51