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Ion Attachment Mass Spectrometry of Nonequilibrium Atmospheric-Pressure Pulsed Remote Plasma for SiO2 Etching
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Effects of N2 Addition on Density and Temperature of Radicals in 60 MHz Capacitively Coupled C-C4F8 Gas Plasma
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Silicon Dioxide Etching Process for Fabrication of Micro-optics Employing Pulse-Modulated Electron-beam-excited Plasma
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Nitriding of a tool steel with an electron-beam-excited plasma
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Development of a low pressure microwave excited plasma and its application to the formation of microcrystalline silicon films
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Progress of Radical Measurements in Plasmas for Semiconductor Processing
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Fabrication of Carbon Nanowalls Using Novel Plasma Processing
Japanese Journal of Applied Physics, Vol. 45 (6B) (June 20, 2006) pp. 5522-5527,
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Low-k SiOCH Film Etching Process and Its Diagnostics Employing Ar/C5F10O/N2 Plasma
Japanese Journal of Applied Physics, Vol. 45 (9A) (September 7, 2006) pp. 7100-7104,
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Atmospheric Pressure Fluorocarbon-Particle Plasma Chemical Vapor Deposition for Hydrophobic Film Coating
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Carbon Nanowalls Formation by Raadical Controlled Plasma Process
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マイクロ波励起非平衡大気圧プラズマを用いたシリコン酸化膜の超高速エッチングおよびカーボンナノチューブの形成
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