1. M. Nagai, M. Hori, and T. Goto
    Decomposition and Polymerization of Perfluorinated Compounds in Microwave-Excited Atmospheric Pressure Plasma
    Journal of Applied Physics, Vol. 97 (12) (June, 2005) 123304 pp. 1,
    DOI: 10.1063/1.1931034

  2. K. Yamakawa, M. Hori, T. Goto, S. Den, T. Katagiri, and H. Kano
    Etching Process of Silicon Dioxide with Nonequilibrium Atmospheric Pressure Plasma
    Journal of Applied Physics, Vol. 98 (1) (July, 2005) 013301 pp. 1,
    DOI: 10.1063/1.1944219

  3. K. Yamakawa, M. Hori, T. Goto, S. Den, T. Katagiri, and H. Kano
    Ultrahigh-speed etching of organic films using microwave-excited nonequilibrium atmospheric-pressure plasma
    Journal of Applied Physics, Vol. 98 (4) (August 15, 2005) 043311 pp. 1,
    DOI: 10.1063/1.2030409

  4. M. Nagai, M. Hori, and T. Goto
    Property of atmospheric pressure plasma with microwave excitation of plasma processing
    Journal of Vacuum Science Technology A, Vol. 23 (January, 2005) pp. 221-225 ,
    DOI: 10.1116/1.1851539

  5. K. Shiji, M. Hiramatsu, A. Enomoto, M. Nakamura, H. Amano, and M. Hori
    Vertical growth of carbon nanowalls using rf plasma-enhanced chemical vapor deposition
    Diamond and Related materials, Vol. 14 (3-7) (March, 2005) pp. 831-834,
    DOI: 10.1016/j.diamond.2004.10.021

  6. M. Taniguchi, H. Nagao, M. Hiramatsu, Y. Ando, and M. Hori
    Preparation of dense carbon nanotube film using microwave plasma-enhanced chemical vapor deposition
    Diamond and Related materials, Vol. 14 (3-7) (March, 2005) pp. 855-858,
    DOI: 10.1016/j.diamond.2004.10.002

  7. M. Hiramatsu, H. Nagao, M. Taniguchi, H. Amano, Y. Ando, and M. Hori
    High-Rate Growth of Films of Dense, Aligned Double-Walled Carbon Nanotubes Using Microwave Plasma-Enhanced Chemical Vapor Deposition
    Japanese Journal of Applied Physics, Vol. 44 (2) (May 23, 2005) pp. L693 - L695,
    DOI: 10.1143/JJAP.44.L693

  8. S. Takahashi, M. Hori, H. Kano, S. Den, T. Katagiri, and K. Yamakawa
    Development of Compact C[2]F[4] Gas Supply Equipment and Its Application to Etching of Dielectrics in an Environmental Benign Process
    Japanese Journal of Applied Physics, Vol. 44 (24) (June 3, 2005) pp. L781-L783,
    DOI: 10.1143/JJAP.44.L781

  9. M. Hiramatsu, M. Taniguchi, H. Nagao, Y. Ando, and M. Hori
    Fabrication of Dense Carbon Nanotube Films Using Microwave Plasma-Enhanced Chemical Vapor Deposition
    Japanese Journal of Applied Physics, Vol. 44 (February 8, 2005) pp. 1150-1154,
    DOI: 10.1143/JJAP.44.1150

  10. 平松 美根男, 堀 勝
    RFプラズマCVDによるカーボンナノウォールの配向成長
    プラズマ・核融合学会誌、 第81巻、第9号 (October 26, 2005) pp. 669-673,
    DOI: 10.1585/jspf.81.669