Kenji Ishikawa, Naoya Sumi, Akihiko Kono, Hideo Horibe, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru HoriSynergistic Formation of Radicals by Irradiation with Both Vacuum Ultraviolet and Atomic Hydrogen: A Real-time In Situ Electron Spin Resonance Study 10.1021/jz2002937 W. Takeuchi, H. Kondo, T. Obayashi, M. Hiramatsu, and M. HoriElectron field emission enhancement of carbon nanowalls by plasma surface nitridation 10.1063/1.3532114 Z. H. Wu, Y. Kawai, Y.-Y. Fang, C. Q. Chen, H. Kondo, M. Hori, Y. Honda, M. Yamaguchi, and H. AmanoSpontaneous formation of highly regular superlattice structure in InGaN epilayers grown by molecular beam epitaxy 10.1063/1.3574607 K. Mase, H. Kondo, S. Kondo, M. Hori, M. Hiramatsu, and H. KanoFormation and mechanism of ultrahigh density platinum nanoparticles on vertically grown graphene sheets by metal-organic chemical supercritical fluid deposition 10.1063/1.3583672 H. Kondo, W. Takeuchi, M. Hori, S. Kimura, Y. Kato, T. Muro, T. Kinoshita, O. Sakata, H. Tajiri, and M. HiramatsuSynchrotron x-ray analyses of crystalline and electronic structures of carbon nanowalls 10.1063/1.3659470 Fengdong Jia, Naoya Sumi, Kenji Ishikawa, Hiroyuki Kano, Hirotoshi Inui, Jagath Kularatne, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Akihiro Kono, and Masaru HoriLaser Scattering Diagnosis of a 60-Hz Non-Equilibrium Atmospheric Pressure Plasma Jet 10.1143/APEX.4.026101 Sachiko Iseki, Hiroshi Hashizume, Fengdong Jia, Keigo Takeda, Kenji Ishikawa, Takayuki Ohta, Masafumi Ito, and Masaru HoriInactivation of Penicillium digitatum Spores by a High-Density Ground-State Atomic Oxygen-Radical Source Employing an Atmospheric-Pressure Plasma 10.1143/APEX.4.116201 Hirotoshi Inui, Keigo Takeda, Kenji Ishikawa, Takuya Yara, Tsuyoshi Uehara, Makoto Sekine, and Masaru HoriHydrophobic treatment of organics against glass employing nonequilibrium atmospheric pressure pulsed plasmas with a mixture of CF4 and N2 gases 10.1063/1.3525246 K. Takeda, Y. Miyawaki, S. Takashima, M. Fukasawa, K. Oshima, K. Nagahata, T. Tatsumi, and M. HoriMechanism of plasma-induced damage to low-k SiOCH films during plasma ashing of organic resists 10.1063/1.3544304 Hiroshi Yamamoto, Keigo Takeda, Kenji Ishikawa, Masafumi Ito, Makoto Sekine, Masaru Hori, Takeshi Kaminatsui, Hisataka Hayashi, Itsuko Sakai, and Tokuhisa OhiwaH2/N2 plasma damage on porous dielectric SiOCH film evaluated by in situ film characterization and plasma diagnostics 10.1063/1.3562161 Hiroshi Yamamoto, Kohei Asano, Kenji Ishikawa, Makoto Sekine, Hisataka Hayashi, Itsuko Sakai, Tokuhisa Ohiwa, Keigo Takeda, Hiroki Kondo, and Masaru HoriChemical bond modification in porous SiOCH films by H2 and H2/N2 plasmas investigated by in situ infrared reflection absorption spectroscopy 10.1063/1.3671547 M. Hori, H. Kondo, and M. HiramatsuRadical-controlled plasma processing for nanofabrication 10.1088/0022-3727/44/17/174027 Y. Kawai, S. Chen, Y. Honda, M. Yamaguchi, H. Amano, H. Kondo, M. Hiramatsu, H. Kano, K. Yamakawa, S. Den, and M. HoriAchieving high-growth-rate in GaN homoepitaxy using high-density nitrogen radical source 10.1002/pssc.201000969 Shang Chen, Hiroki Kondo, Kenji Ishikawa, Keigo Takeda, Makoto Sekine, Hiroyuki Kano, Shoji Den, and Masaru HoriBehaviors of Absolute Densities of N, H, and NH3 at Remote Region of High-Density Radical Source Employing N2/H2 Mixture Plasmas 10.1143/JJAP.50.01AE03 Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou SuuDissociation Channels of c-C4F8 to CF2 Radical in Reactive Plasma 10.1143/JJAP.50.036203 H. Kondo, M. Hori, W. Takeuchi, and M. HiramatsuControlled Synthesis of Carbon Nanowalls for Carbon Channel Engineering 10.1143/JJAP.50.036203 Tsuyoshi Yamaguchi, Tetsuya Kimura, Chishio Koshimizu, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru HoriSpatial Distributions of Electron, CF, and CF2 Radical Densities and Gas Temperature in DC-Superposed Dual-Frequency Capacitively Coupled Plasma Etch Reactor Employing Cyclic-C4F8/N2/Ar Gas 10.1143/JJAP.50.056101 Shingo Kondo, Hiroki Kondo, Yudai Miyawaki, Hajime Sasaki, Hiroyuki Kano, Mineo Hiramatsu, and Masaru HoriReactive Ion Etching of Carbon Nanowalls 10.1143/JJAP.50.075101 S. Kumagai, H. Matsuyama, Y. Yokoyama, M. Hori, and M. Sasaki Novel Atmospheric Pressure Inductively Coupled Micro Plasma Source Using Floating Wire Electrode 10.1143/JJAP.50.08JA02 Masaki Minami, Shigetaka Tomiya, Kenji Ishikawa, Ryosuke Matsumoto, Shang Chen, Masanaga Fukasawa, Fumikatsu Uesawa, Makoto Sekine, Masaru Hori, and Tetsuya TatsumiAnalysis of GaN Damage Induced by Cl2/SiCl4/Ar Plasma 10.1143/JJAP.50.08JE03 Takuya Takeuchi, Shinpei Amasaki, Hiroki Kondo, Kenji Ishikawa, Hirotaka Toyoda, Makoto Sekine, Song-Yun Kang, Ikuo Sawada, and Masaru HoriImpacts of CF+,CF2+,CF3+,and Ar Ion Beam Bombardment with Energies of 100 and 400 eV on Surface Modification of Photoresist 10.1143/JJAP.50.08JE05 Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, Masaru Hori, Akihiro Kono, and Koukou SuuQuantum Chemical Investigation for Chemical Dry Etching of SiO2 by Flowing NF3 into H2 Downflow Plasma 10.1143/JJAP.51.016201 K. Ohnishi, J. Watanabe, M. Sato, T. Ohkawa, and N. Ebizuka Spectroscopic Observation of the Re-Entry Capsule of HAYABUSA Spacecraft N. Ebizuka, K. Ichiyama, T. Yamada, C. Tokoku, M. Onodera, M. Hanesaka, K. Kodate, Y. Katsuno Uchimoto, M. Maruyama, K. Shimasaku, I. Tanaka, T. Yoshikawa, N. Kashikawa, M. Iye, and T. IchikawaCryogenic Volume-Phase Holographic Grisms for MOIRCS N. Ebizuka , K. S. Kawabata, K. Oka , A. Yamada, M. Kashiwagi, K. Kodate, T, Hattori, N. Kashikawa, and M. IyeGrisms Developed for FOCAS Hiroki Kondo, Masaru Hori, and Mineo HiramatsuNucleation and Vertical Growth of Nano-Graphene Sheets 10.5772/23703 岩田 義幸, 坂本 一, 乾 裕俊, 堀 勝O2/N2ガスを用いた60Hz非平衡大気圧プラズマによるソルダーレジストとドライフィルムの表面改質 10.4139/sfj.62.311